SG11201607251XA - System for and method of fast pulse gas delivery - Google Patents

System for and method of fast pulse gas delivery

Info

Publication number
SG11201607251XA
SG11201607251XA SG11201607251XA SG11201607251XA SG11201607251XA SG 11201607251X A SG11201607251X A SG 11201607251XA SG 11201607251X A SG11201607251X A SG 11201607251XA SG 11201607251X A SG11201607251X A SG 11201607251XA SG 11201607251X A SG11201607251X A SG 11201607251XA
Authority
SG
Singapore
Prior art keywords
gas delivery
pulse gas
fast pulse
fast
delivery
Prior art date
Application number
SG11201607251XA
Inventor
Junhua Ding
Bassi Michael L
Tseng-Chung Lee
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/209,216 external-priority patent/US10126760B2/en
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG11201607251XA publication Critical patent/SG11201607251XA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561—Gas plumbing upstream of the reaction chamber
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0647—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged in series
SG11201607251XA 2014-03-13 2015-02-11 System for and method of fast pulse gas delivery SG11201607251XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/209,216 US10126760B2 (en) 2011-02-25 2014-03-13 System for and method of fast pulse gas delivery
PCT/US2015/015363 WO2015138073A1 (en) 2014-03-13 2015-02-11 System for and method of fast pulse gas delivery

Publications (1)

Publication Number Publication Date
SG11201607251XA true SG11201607251XA (en) 2016-09-29

Family

ID=54072260

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201607251XA SG11201607251XA (en) 2014-03-13 2015-02-11 System for and method of fast pulse gas delivery

Country Status (7)

Country Link
EP (2) EP3117023B1 (en)
JP (2) JP6672160B2 (en)
KR (2) KR102446557B1 (en)
CN (1) CN106103796B (en)
SG (1) SG11201607251XA (en)
TW (2) TWI615698B (en)
WO (1) WO2015138073A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6978865B2 (en) 2017-07-05 2021-12-08 株式会社堀場エステック Fluid control device, fluid control method, and program for fluid control device
JP7107648B2 (en) 2017-07-11 2022-07-27 株式会社堀場エステック FLUID CONTROL DEVICE, FLUID CONTROL SYSTEM, FLUID CONTROL METHOD, AND FLUID CONTROL DEVICE PROGRAM
JP6896682B2 (en) * 2018-09-04 2021-06-30 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ Manufacturing method of substrate processing equipment and semiconductor equipment
US10725484B2 (en) * 2018-09-07 2020-07-28 Mks Instruments, Inc. Method and apparatus for pulse gas delivery using an external pressure trigger
JP7243960B2 (en) * 2019-01-11 2023-03-22 Smc株式会社 solenoid valve system
US11487304B2 (en) 2021-01-08 2022-11-01 Applied Materials, Inc. Process fluid path switching in recipe operations

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012464A (en) * 1998-06-23 2000-01-14 Kokusai Electric Co Ltd Controller of processor
US6389364B1 (en) * 1999-07-10 2002-05-14 Mykrolis Corporation System and method for a digital mass flow controller
US6405745B1 (en) * 2000-03-22 2002-06-18 Delphi Technologies, Inc. Ultra accurate gas injection system
US6766260B2 (en) * 2002-01-04 2004-07-20 Mks Instruments, Inc. Mass flow ratio system and method
US6973508B2 (en) * 2002-02-12 2005-12-06 Fisher-Rosemount Systems, Inc. Highly versatile process control system controller
AU2003253991A1 (en) * 2002-07-19 2004-02-09 Celerity Group, Inc. Methods and apparatus for pressure compensation in a mass flow controller
US7369959B2 (en) * 2002-11-26 2008-05-06 Intercat Equipment, Inc. Fluid catalytic cracking catalyst injection system and method for communicating with same
US7628861B2 (en) * 2004-12-17 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7628860B2 (en) * 2004-04-12 2009-12-08 Mks Instruments, Inc. Pulsed mass flow delivery system and method
US7706925B2 (en) * 2007-01-10 2010-04-27 Mks Instruments, Inc. Integrated pressure and flow ratio control system
US10054444B2 (en) * 2009-05-29 2018-08-21 Qualcomm Incorporated Method and apparatus for accurate acquisition of inertial sensor data
CN102804354B (en) * 2010-03-05 2015-07-08 应用材料公司 Measuring flow properties of multiple gas nozzles of a gas distributor
EP2609402B1 (en) * 2010-08-24 2021-02-17 Schneider Electric Systems USA, Inc. Multiphase flow metering
KR101933234B1 (en) * 2011-01-20 2018-12-27 히타치 긴조쿠 가부시키가이샤 Mass flow controller with onboard diagnostics, prognostics, and data logging
US10353408B2 (en) * 2011-02-25 2019-07-16 Mks Instruments, Inc. System for and method of fast pulse gas delivery
JP5824372B2 (en) * 2012-01-25 2015-11-25 東京エレクトロン株式会社 Processing apparatus and process status confirmation method
CN202677205U (en) * 2012-04-23 2013-01-16 江苏迈拓智能仪表有限公司 Ultrasound metering and flow control system
JP6094994B2 (en) 2013-02-04 2017-03-15 大陽日酸株式会社 Raw material gas generation and supply method

Also Published As

Publication number Publication date
TW201719313A (en) 2017-06-01
EP3556903B1 (en) 2021-09-22
TW201604670A (en) 2016-02-01
EP3117023A4 (en) 2017-11-29
KR102446557B1 (en) 2022-09-23
TWI569121B (en) 2017-02-01
JP2017509793A (en) 2017-04-06
CN106103796A (en) 2016-11-09
KR20160132835A (en) 2016-11-21
TWI615698B (en) 2018-02-21
JP6923693B2 (en) 2021-08-25
EP3556903A1 (en) 2019-10-23
EP3117023A1 (en) 2017-01-18
KR102363639B1 (en) 2022-02-16
EP3117023B1 (en) 2019-04-10
WO2015138073A1 (en) 2015-09-17
JP6672160B2 (en) 2020-03-25
CN106103796B (en) 2019-10-22
KR20210158405A (en) 2021-12-30
JP2020109853A (en) 2020-07-16

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