SG11201509884RA - Forming a substrate web track in an atomic layer deposition reactor - Google Patents

Forming a substrate web track in an atomic layer deposition reactor

Info

Publication number
SG11201509884RA
SG11201509884RA SG11201509884RA SG11201509884RA SG11201509884RA SG 11201509884R A SG11201509884R A SG 11201509884RA SG 11201509884R A SG11201509884R A SG 11201509884RA SG 11201509884R A SG11201509884R A SG 11201509884RA SG 11201509884R A SG11201509884R A SG 11201509884RA
Authority
SG
Singapore
Prior art keywords
forming
atomic layer
layer deposition
substrate web
deposition reactor
Prior art date
Application number
SG11201509884RA
Inventor
Timo Malinen
Väinö Kilpi
Original Assignee
Picosun Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Picosun Oy filed Critical Picosun Oy
Publication of SG11201509884RA publication Critical patent/SG11201509884RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG11201509884RA 2013-06-27 2013-06-27 Forming a substrate web track in an atomic layer deposition reactor SG11201509884RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/FI2013/050713 WO2014207289A1 (en) 2013-06-27 2013-06-27 Forming a substrate web track in an atomic layer deposition reactor

Publications (1)

Publication Number Publication Date
SG11201509884RA true SG11201509884RA (en) 2016-01-28

Family

ID=52141143

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201509884RA SG11201509884RA (en) 2013-06-27 2013-06-27 Forming a substrate web track in an atomic layer deposition reactor

Country Status (9)

Country Link
US (1) US9745661B2 (en)
EP (1) EP3013998A4 (en)
JP (1) JP6243526B2 (en)
KR (1) KR20160024882A (en)
CN (1) CN105555998A (en)
RU (1) RU2015155191A (en)
SG (1) SG11201509884RA (en)
TW (1) TW201504471A (en)
WO (1) WO2014207289A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5975135B1 (en) * 2015-03-31 2016-08-23 ダイキン工業株式会社 Control system
JP7300527B2 (en) * 2019-06-25 2023-06-29 ピコサン オーワイ PCB backside protection

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3453847A (en) * 1966-02-18 1969-07-08 Chase Brass & Copper Co Sheet guiding and tensioning device
JP2552356B2 (en) 1989-04-26 1996-11-13 日本たばこ産業株式会社 Dancer roll device
DE4208577A1 (en) 1992-03-13 1993-09-16 Mannesmann Ag METHOD FOR THE MULTI-LAYER COATING OF STRAND-SHAPED GOODS
US7060132B2 (en) * 2000-04-14 2006-06-13 Asm International N.V. Method and apparatus of growing a thin film
EP1479789A1 (en) 2003-05-23 2004-11-24 Recherche Et Developpement Du Groupe Cockerill Sambre Sealing lock for an in-line vaccum deposition apparatus
US8304019B1 (en) * 2004-02-19 2012-11-06 Nanosolar Inc. Roll-to-roll atomic layer deposition method and system
KR101314708B1 (en) * 2006-03-26 2013-10-10 로터스 어플라이드 테크놀로지, 엘엘씨 Atomic layer deposition system and method for coating flexible substrates
US20070281089A1 (en) * 2006-06-05 2007-12-06 General Electric Company Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
JP5543203B2 (en) * 2006-06-16 2014-07-09 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． Method and apparatus for atomic layer deposition using atmospheric pressure glow discharge plasma
DE602007002782D1 (en) * 2007-02-28 2009-11-26 Applied Materials Inc Access lock system, network processing system and application method therefor
CN101284608A (en) * 2007-02-28 2008-10-15 应用材料公司 Entry lock system, web processing installation, and method for using the same
EP2232576A2 (en) * 2007-12-06 2010-09-29 Craig Leidholm Methods and devices for processing a precursor layer in a group via environment
US20110076421A1 (en) * 2009-09-30 2011-03-31 Synos Technology, Inc. Vapor deposition reactor for forming thin film on curved surface
KR101788348B1 (en) * 2010-04-09 2017-10-19 가부시키가이샤 니콘 Substrate cartridge, substrate storage device, and substrate processing system
TWI541378B (en) * 2010-10-16 2016-07-11 奧特科技公司 Ald coating system and method
JP5803488B2 (en) * 2011-09-22 2015-11-04 凸版印刷株式会社 Film forming method and film forming apparatus on flexible substrate by atomic layer deposition method
JP2013082959A (en) * 2011-10-07 2013-05-09 Sony Corp Self-limiting reaction deposition apparatus and self-limiting reaction deposition method
JP6119745B2 (en) * 2012-05-31 2017-04-26 凸版印刷株式会社 Winding film forming system
KR20150023016A (en) 2012-06-15 2015-03-04 피코순 오와이 Coating a substrate web by atomic layer deposition
US20150107510A1 (en) * 2012-06-15 2015-04-23 Picosun Oy Coating a substrate web by atomic layer deposition
TWI627305B (en) * 2013-03-15 2018-06-21 應用材料股份有限公司 Atmospheric lid with rigid plate for carousel processing chambers
KR101507557B1 (en) * 2013-04-25 2015-04-07 주식회사 엔씨디 The horizontal type apparatus for depositing a atomic layer on the large substrate

Also Published As

Publication number Publication date
RU2015155191A (en) 2017-07-28
JP2016529390A (en) 2016-09-23
US20160138163A1 (en) 2016-05-19
CN105555998A (en) 2016-05-04
KR20160024882A (en) 2016-03-07
EP3013998A4 (en) 2017-03-01
TW201504471A (en) 2015-02-01
JP6243526B2 (en) 2017-12-06
EP3013998A1 (en) 2016-05-04
WO2014207289A1 (en) 2014-12-31
US9745661B2 (en) 2017-08-29

Similar Documents

Publication Publication Date Title
SG11201407816WA (en) Coating a substrate web by atomic layer deposition
GB2511443B (en) Atomic layer deposition
SG10201408801QA (en) Plasma enhanced atomic layer deposition with pulsed plasma exposure
SG11201405417YA (en) Atomic layer deposition method and apparatuses
EP2861780A4 (en) Coating a substrate web by atomic layer deposition
HK1219439A1 (en) Coating for a surface
HK1222893A1 (en) Diamond coating and method for depositing such a coating
EP2567938A4 (en) Method for producing multilayer graphene coated substrate
AP2016009202A0 (en) Processes for producing effects layers
SG11201405416UA (en) Atomic layer deposition with plasma source
EP2842989A4 (en) Method for manufacturing hard coating film
EP2917382A4 (en) Method for depositing a conductive coating on a surface
HK1198752A1 (en) Method for producing a multilayer data carrier and data carrier produced using the said method
PL3036352T3 (en) Method for obtaining a substrate provided with a coating comprising a discontinuous thin metal layer
PL2839054T3 (en) Method for producing a coated substrate
EP2678105A4 (en) Method of forming a catalyst with an atomic layer of platinum atoms
EP2946031A4 (en) Method for producing a chromium coating on a metal substrate
EP3048639A4 (en) Atomic layer deposition device and atomic layer deposition method
ZA201400953B (en) Process for providing a surface with a barrier and a substrate being produced according to the process
GB2518772B (en) Method for preparing a semiconducting layer
PL3083078T3 (en) Method for producing a multilayer coating
PL3083077T3 (en) Method for producing a multilayer coating
GB2579491B (en) Protective coating for a substrate
SG11201509884RA (en) Forming a substrate web track in an atomic layer deposition reactor
SG11201602297RA (en) Method for manufacturing nonmagnetic substrate