SG10202012510VA - Output signal processing circuit for eddy current sensor and output signal processing method for eddy current sensor - Google Patents

Output signal processing circuit for eddy current sensor and output signal processing method for eddy current sensor

Info

Publication number
SG10202012510VA
SG10202012510VA SG10202012510VA SG10202012510VA SG10202012510VA SG 10202012510V A SG10202012510V A SG 10202012510VA SG 10202012510V A SG10202012510V A SG 10202012510VA SG 10202012510V A SG10202012510V A SG 10202012510VA SG 10202012510V A SG10202012510V A SG 10202012510VA
Authority
SG
Singapore
Prior art keywords
output signal
signal processing
current sensor
eddy current
processing method
Prior art date
Application number
SG10202012510VA
Inventor
Yamada Hiroto
Takahashi Taro
Shibue Hiroaki
Abe Atsushi
TOKUNAGA Shinpei
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2019226549A external-priority patent/JP7269871B2/en
Priority claimed from JP2019226547A external-priority patent/JP7257945B2/en
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG10202012510VA publication Critical patent/SG10202012510VA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • G01B7/06Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
    • G01B7/10Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance
    • G01B7/105Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using magnetic means, e.g. by measuring change of reluctance for measuring thickness of coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/013Devices or means for detecting lapping completion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • B24B37/105Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
    • B24B37/107Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • B24B49/105Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analyzing Materials By The Use Of Magnetic Means (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG10202012510VA 2019-12-16 2020-12-14 Output signal processing circuit for eddy current sensor and output signal processing method for eddy current sensor SG10202012510VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019226549A JP7269871B2 (en) 2019-12-16 2019-12-16 Eddy current sensor output signal processing circuit and output signal processing method
JP2019226547A JP7257945B2 (en) 2019-12-16 2019-12-16 Eddy current sensor output signal processing circuit and output signal processing method

Publications (1)

Publication Number Publication Date
SG10202012510VA true SG10202012510VA (en) 2021-07-29

Family

ID=76546040

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202012510VA SG10202012510VA (en) 2019-12-16 2020-12-14 Output signal processing circuit for eddy current sensor and output signal processing method for eddy current sensor

Country Status (2)

Country Link
US (2) US11852472B2 (en)
SG (1) SG10202012510VA (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11199151B2 (en) * 2019-06-26 2021-12-14 Cummins Inc. Vehicle controller with complementary capacitance for analog-to-digital converter (A/D) low pass filter
JP7291558B2 (en) * 2019-07-03 2023-06-15 株式会社荏原製作所 Eddy current sensor
CN114473844B (en) * 2021-12-31 2023-09-29 华海清科股份有限公司 Film thickness measuring device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6433541B1 (en) * 1999-12-23 2002-08-13 Kla-Tencor Corporation In-situ metalization monitoring using eddy current measurements during the process for removing the film
US7112960B2 (en) 2003-07-31 2006-09-26 Applied Materials, Inc. Eddy current system for in-situ profile measurement
US7276897B2 (en) 2004-04-09 2007-10-02 Ksr International Co. Inductive position sensor
US7599675B2 (en) * 2006-12-12 2009-10-06 Telefonaktiebolaget Lm Ericsson (Publ) Method and apparatus for receiving radio frequency signals
US8454407B2 (en) 2008-08-05 2013-06-04 Ebara Corporation Polishing method and apparatus
JP5513795B2 (en) 2009-07-16 2014-06-04 株式会社荏原製作所 Polishing method and apparatus
JP2010175530A (en) 2009-02-02 2010-08-12 Marktec Corp Device and method for eddy-current flaw detection
JP2013068465A (en) 2011-09-21 2013-04-18 Kureyon Co Ltd Eddy current detector and phase control circuit
US10324141B2 (en) * 2017-05-26 2019-06-18 Allegro Microsystems, Llc Packages for coil actuated position sensors
DE102017223695B4 (en) * 2017-12-22 2019-10-31 Life Science Inkubator Betriebs Gmbh & Co. Kg Passive transponder system and pressure wave measuring device
US11759912B2 (en) 2017-12-26 2023-09-19 Ebara Corporation Magnetic element and eddy current sensor using the same
TWI682649B (en) * 2018-09-28 2020-01-11 國立中山大學 Signal demodulation device with iq mixer and demodulated method thereof

Also Published As

Publication number Publication date
US11852472B2 (en) 2023-12-26
US20240077297A1 (en) 2024-03-07
US20210199415A1 (en) 2021-07-01

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