SG10202004038RA - Framework for a replication device, replication device as well as method for producing nanostructured and/or microstructured components by means of a replication device - Google Patents

Framework for a replication device, replication device as well as method for producing nanostructured and/or microstructured components by means of a replication device

Info

Publication number
SG10202004038RA
SG10202004038RA SG10202004038RA SG10202004038RA SG10202004038RA SG 10202004038R A SG10202004038R A SG 10202004038RA SG 10202004038R A SG10202004038R A SG 10202004038RA SG 10202004038R A SG10202004038R A SG 10202004038RA SG 10202004038R A SG10202004038R A SG 10202004038RA
Authority
SG
Singapore
Prior art keywords
replication device
framework
well
replication
microstructured components
Prior art date
Application number
SG10202004038RA
Inventor
Raoul Kirner
Wilfried Noell
Andreas Nagy
Original Assignee
Suss Microtec Lithography Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suss Microtec Lithography Gmbh filed Critical Suss Microtec Lithography Gmbh
Publication of SG10202004038RA publication Critical patent/SG10202004038RA/en

Links

SG10202004038RA 2019-05-02 2020-04-30 Framework for a replication device, replication device as well as method for producing nanostructured and/or microstructured components by means of a replication device SG10202004038RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL2023051A NL2023051B1 (en) 2019-05-02 2019-05-02 Framework for a replication device, replication device as well as method for producing nanostructured and/or microstructured components by means of a 5 replication device

Publications (1)

Publication Number Publication Date
SG10202004038RA true SG10202004038RA (en) 2020-12-30

Family

ID=67352553

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202004038RA SG10202004038RA (en) 2019-05-02 2020-04-30 Framework for a replication device, replication device as well as method for producing nanostructured and/or microstructured components by means of a replication device

Country Status (9)

Country Link
US (1) US20200348588A1 (en)
JP (1) JP2020184631A (en)
KR (1) KR20200128370A (en)
CN (1) CN111880370A (en)
AT (1) AT522599A3 (en)
DE (1) DE102020111830A1 (en)
NL (1) NL2023051B1 (en)
SG (1) SG10202004038RA (en)
TW (1) TW202109182A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017207698B4 (en) * 2017-05-08 2019-06-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Neuronal inductive culture matrix
KR102603192B1 (en) * 2021-06-01 2023-11-17 한국기계연구원 Pressurizing device having tilt structure and control method thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6873087B1 (en) * 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
KR20030040378A (en) * 2000-08-01 2003-05-22 보드 오브 리전츠, 더 유니버시티 오브 텍사스 시스템 Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography
US20060005657A1 (en) * 2004-06-01 2006-01-12 Molecular Imprints, Inc. Method and system to control movement of a body for nano-scale manufacturing
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
KR100688866B1 (en) * 2005-04-07 2007-03-02 삼성전기주식회사 Apparatus, system and method of imprint
JP4996488B2 (en) * 2007-03-08 2012-08-08 東芝機械株式会社 Fine pattern forming method
KR100814264B1 (en) * 2007-05-18 2008-03-18 주식회사 아바코 Separation method for stamp and imprinted substrate lithography process

Also Published As

Publication number Publication date
CN111880370A (en) 2020-11-03
DE102020111830A1 (en) 2020-11-05
AT522599A3 (en) 2021-05-15
KR20200128370A (en) 2020-11-12
TW202109182A (en) 2021-03-01
JP2020184631A (en) 2020-11-12
NL2023051B1 (en) 2020-11-23
US20200348588A1 (en) 2020-11-05
AT522599A2 (en) 2020-11-15

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