SG10201709268UA - Multiple control modes - Google Patents
Multiple control modesInfo
- Publication number
- SG10201709268UA SG10201709268UA SG10201709268UA SG10201709268UA SG10201709268UA SG 10201709268U A SG10201709268U A SG 10201709268UA SG 10201709268U A SG10201709268U A SG 10201709268UA SG 10201709268U A SG10201709268U A SG 10201709268UA SG 10201709268U A SG10201709268U A SG 10201709268UA
- Authority
- SG
- Singapore
- Prior art keywords
- state
- variable
- determining
- method includes
- control modes
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
MULTIPLECONTROL MODES Systems and methods for using variables based on multiple states associated with a plasma system are described. A method includes determining whether the state associated with the plasma system is a first, second, or third state and determining a first variable upon determining that the state is the first state. The method further includes determining a second variable upon determining that the state is the second state and determining a third variable upon determining that the state is the third state. The method includes determining whether each of the first variable, the second variable, and the third variable is within a corresponding range from a corresponding threshold. The method includes providing an instruction to change power supplied to a plasma chamber upon determining that the first, second, or third variable is outside the corresponding range from the corresponding threshold. FIG.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/369,110 US10325759B2 (en) | 2012-02-22 | 2016-12-05 | Multiple control modes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201709268UA true SG10201709268UA (en) | 2018-07-30 |
Family
ID=62629457
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201709268UA SG10201709268UA (en) | 2016-12-05 | 2017-11-10 | Multiple control modes |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR102452835B1 (en) |
| SG (1) | SG10201709268UA (en) |
| TW (2) | TW202307913A (en) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9320126B2 (en) * | 2012-12-17 | 2016-04-19 | Lam Research Corporation | Determining a value of a variable on an RF transmission model |
| US9197196B2 (en) * | 2012-02-22 | 2015-11-24 | Lam Research Corporation | State-based adjustment of power and frequency |
| US9390893B2 (en) * | 2012-02-22 | 2016-07-12 | Lam Research Corporation | Sub-pulsing during a state |
| US9295148B2 (en) * | 2012-12-14 | 2016-03-22 | Lam Research Corporation | Computation of statistics for statistical data decimation |
| US9462672B2 (en) * | 2012-02-22 | 2016-10-04 | Lam Research Corporation | Adjustment of power and frequency based on three or more states |
| US9408288B2 (en) * | 2012-09-14 | 2016-08-02 | Lam Research Corporation | Edge ramping |
| US9779196B2 (en) * | 2013-01-31 | 2017-10-03 | Lam Research Corporation | Segmenting a model within a plasma system |
| US9620337B2 (en) * | 2013-01-31 | 2017-04-11 | Lam Research Corporation | Determining a malfunctioning device in a plasma system |
| JP6374647B2 (en) * | 2013-11-05 | 2018-08-15 | 東京エレクトロン株式会社 | Plasma processing equipment |
-
2017
- 2017-11-08 KR KR1020170148108A patent/KR102452835B1/en active IP Right Grant
- 2017-11-10 SG SG10201709268UA patent/SG10201709268UA/en unknown
- 2017-12-04 TW TW111141739A patent/TW202307913A/en unknown
- 2017-12-04 TW TW106142312A patent/TWI784989B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| KR102452835B1 (en) | 2022-10-07 |
| TW202307913A (en) | 2023-02-16 |
| TW201833984A (en) | 2018-09-16 |
| TWI784989B (en) | 2022-12-01 |
| KR20180064280A (en) | 2018-06-14 |
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