SG10201702767UA - Compact ampoule thermal management system - Google Patents
Compact ampoule thermal management systemInfo
- Publication number
- SG10201702767UA SG10201702767UA SG10201702767UA SG10201702767UA SG10201702767UA SG 10201702767U A SG10201702767U A SG 10201702767UA SG 10201702767U A SG10201702767U A SG 10201702767UA SG 10201702767U A SG10201702767U A SG 10201702767UA SG 10201702767U A SG10201702767U A SG 10201702767UA
- Authority
- SG
- Singapore
- Prior art keywords
- compact
- management system
- thermal management
- ampoule thermal
- ampoule
- Prior art date
Links
- 239000003708 ampul Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
- F25B21/00—Machines, plants or systems, using electric or magnetic effects
- F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Control Of Temperature (AREA)
- Packages (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
- Management, Administration, Business Operations System, And Electronic Commerce (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261655767P | 2012-06-05 | 2012-06-05 | |
US13/902,310 US9279604B2 (en) | 2012-06-05 | 2013-05-24 | Compact ampoule thermal management system |
US13/902,304 US9347696B2 (en) | 2012-06-05 | 2013-05-24 | Compact ampoule thermal management system |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201702767UA true SG10201702767UA (en) | 2017-05-30 |
Family
ID=49668610
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201702767UA SG10201702767UA (en) | 2012-06-05 | 2013-06-05 | Compact ampoule thermal management system |
SG11201407234QA SG11201407234QA (en) | 2012-06-05 | 2013-06-05 | Compact ampoule thermal management system |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201407234QA SG11201407234QA (en) | 2012-06-05 | 2013-06-05 | Compact ampoule thermal management system |
Country Status (6)
Country | Link |
---|---|
US (2) | US9279604B2 (en) |
KR (2) | KR101727442B1 (en) |
CN (1) | CN104335326B (en) |
SG (2) | SG10201702767UA (en) |
TW (2) | TWI579933B (en) |
WO (1) | WO2013184760A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI726944B (en) * | 2015-12-06 | 2021-05-11 | 美商應用材料股份有限公司 | Continuous liquid level measurement detector for closed metal containers |
US10619243B2 (en) * | 2016-07-22 | 2020-04-14 | Triratna P. Muneshwar | Method to improve precursor utilization in pulsed atomic layer processes |
WO2018111720A1 (en) | 2016-12-12 | 2018-06-21 | Applied Materials, Inc. | Precursor control system and process |
CN110313056B (en) * | 2017-01-17 | 2024-02-20 | 莱尔德技术股份有限公司 | Compressible foaming thermal interface material and preparation method and application method thereof |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5954911A (en) * | 1995-10-12 | 1999-09-21 | Semitool, Inc. | Semiconductor processing using vapor mixtures |
JPH11225490A (en) * | 1997-12-05 | 1999-08-17 | Seiko Instruments Inc | Thermoelectric conversion module and electronic apparatus |
US20040261703A1 (en) | 2003-06-27 | 2004-12-30 | Jeffrey D. Chinn | Apparatus and method for controlled application of reactive vapors to produce thin films and coatings |
US7261118B2 (en) | 2003-08-19 | 2007-08-28 | Air Products And Chemicals, Inc. | Method and vessel for the delivery of precursor materials |
GB2424358B (en) * | 2005-03-23 | 2008-07-30 | David Anthony Alfille | Temperature-controlled container for foodstuffs |
US7939422B2 (en) * | 2006-12-07 | 2011-05-10 | Applied Materials, Inc. | Methods of thin film process |
KR100862760B1 (en) * | 2007-04-12 | 2008-10-13 | 에스케이 텔레콤주식회사 | Record based service method by using mobile communication network and its service system, mobile communication terminal therefor |
KR100862720B1 (en) | 2007-07-31 | 2008-10-10 | 포아텍 주식회사 | Apparatus for controlling temperature in chemical container and photoresist coating apparatus using the same |
US20090084112A1 (en) * | 2007-10-02 | 2009-04-02 | Demetrius Calvin Ham | Thermoelectric vehicle engine air cooler |
KR101502415B1 (en) | 2008-09-12 | 2015-03-13 | 엠 에스피 코포레이션 | Method and apparatus for liquid precursor atomization |
US20100186423A1 (en) * | 2009-01-23 | 2010-07-29 | Prince Castle Inc. | Hot or cold food receptacle utilizing a peltier device with air flow temperature control |
KR101072471B1 (en) | 2009-05-19 | 2011-10-12 | 주식회사 마이크로이즈 | Apparatus for Supplying Precursor and System for Depositing Thin Film with the Same |
KR101132972B1 (en) * | 2009-12-29 | 2012-04-09 | (주)한동알앤씨 | Led lamp device with heat radiating structure |
-
2013
- 2013-05-24 US US13/902,310 patent/US9279604B2/en not_active Expired - Fee Related
- 2013-05-24 US US13/902,304 patent/US9347696B2/en not_active Expired - Fee Related
- 2013-05-30 TW TW105123607A patent/TWI579933B/en active
- 2013-05-30 TW TW102119156A patent/TWI563575B/en active
- 2013-06-05 WO PCT/US2013/044256 patent/WO2013184760A1/en active Application Filing
- 2013-06-05 SG SG10201702767UA patent/SG10201702767UA/en unknown
- 2013-06-05 KR KR1020167021711A patent/KR101727442B1/en active IP Right Grant
- 2013-06-05 SG SG11201407234QA patent/SG11201407234QA/en unknown
- 2013-06-05 CN CN201380029684.1A patent/CN104335326B/en active Active
- 2013-06-05 KR KR1020147036453A patent/KR101700494B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US20130319013A1 (en) | 2013-12-05 |
CN104335326A (en) | 2015-02-04 |
TW201411737A (en) | 2014-03-16 |
US9279604B2 (en) | 2016-03-08 |
TW201705312A (en) | 2017-02-01 |
TWI563575B (en) | 2016-12-21 |
US20130319015A1 (en) | 2013-12-05 |
US9347696B2 (en) | 2016-05-24 |
SG11201407234QA (en) | 2014-12-30 |
CN104335326B (en) | 2017-06-30 |
KR101700494B1 (en) | 2017-01-26 |
TWI579933B (en) | 2017-04-21 |
KR101727442B1 (en) | 2017-04-14 |
KR20150023495A (en) | 2015-03-05 |
WO2013184760A1 (en) | 2013-12-12 |
KR20160098533A (en) | 2016-08-18 |
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