SG10201600629QA - Element substrate and liquid ejection head - Google Patents

Element substrate and liquid ejection head

Info

Publication number
SG10201600629QA
SG10201600629QA SG10201600629QA SG10201600629QA SG10201600629QA SG 10201600629Q A SG10201600629Q A SG 10201600629QA SG 10201600629Q A SG10201600629Q A SG 10201600629QA SG 10201600629Q A SG10201600629Q A SG 10201600629QA SG 10201600629Q A SG10201600629Q A SG 10201600629QA
Authority
SG
Singapore
Prior art keywords
element substrate
liquid ejection
ejection head
head
substrate
Prior art date
Application number
SG10201600629QA
Inventor
Kasai Ryo
Hirayama Nobuyuki
Sakurai Masataka
Umeda Kengo
Yamato Hidenori
Takagi Makoto
Goden Tatsuhito
Sakuma Sadayoshi
Suzuki Nobuyuki
Eto Toru
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG10201600629QA publication Critical patent/SG10201600629QA/en

Links

SG10201600629QA 2015-01-27 2016-01-27 Element substrate and liquid ejection head SG10201600629QA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015013197 2015-01-27
JP2015233689A JP6598658B2 (en) 2015-01-27 2015-11-30 Element substrate for liquid discharge head and liquid discharge head

Publications (1)

Publication Number Publication Date
SG10201600629QA true SG10201600629QA (en) 2016-08-30

Family

ID=56559802

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201600629QA SG10201600629QA (en) 2015-01-27 2016-01-27 Element substrate and liquid ejection head

Country Status (5)

Country Link
JP (1) JP6598658B2 (en)
CN (2) CN108372722B (en)
RU (1) RU2645565C2 (en)
SG (1) SG10201600629QA (en)
TW (1) TWI610820B (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018130942A (en) * 2017-02-17 2018-08-23 キヤノン株式会社 Manufacturing method of substrate for liquid discharge head
WO2018150830A1 (en) * 2017-02-17 2018-08-23 Canon Kabushiki Kaisha Liquid discharge head substrate, method of manufacturing the same, liquid discharge head, and liquid discharge apparatus
JP7037334B2 (en) * 2017-02-17 2022-03-16 キヤノン株式会社 Substrate for liquid discharge head, its manufacturing method, liquid discharge head and liquid discharge device
US10300698B2 (en) 2017-06-05 2019-05-28 Canon Kabushiki Kaisha Liquid ejection head
JP6625158B2 (en) * 2017-06-05 2019-12-25 キヤノン株式会社 Liquid ejection head
JP6942537B2 (en) * 2017-06-29 2021-09-29 キヤノン株式会社 Liquid discharge head
EP3470228B1 (en) * 2017-10-11 2021-06-30 Canon Kabushiki Kaisha Element substrate, manufacturing method thereof, printhead, and printing apparatus
JP7005376B2 (en) * 2018-02-15 2022-01-21 キヤノン株式会社 Device substrate, recording head, and recording device
JP6701255B2 (en) 2018-04-12 2020-05-27 キヤノン株式会社 Liquid ejection head substrate, liquid ejection head, liquid ejection device, and method for manufacturing liquid ejection head substrate
JP7114380B2 (en) * 2018-07-20 2022-08-08 キヤノン株式会社 Element substrate and liquid ejection head
US11827512B2 (en) * 2018-09-24 2023-11-28 Hewlett-Packard Development Company, L.P. Connected field effect transistors
JP7171426B2 (en) * 2018-12-27 2022-11-15 キヤノン株式会社 Liquid ejection head, manufacturing method thereof, and liquid ejection apparatus
JP7328787B2 (en) 2019-04-23 2023-08-17 キヤノン株式会社 ELEMENT SUBSTRATE, LIQUID EJECTION HEAD, AND RECORDING APPARATUS
JP7344669B2 (en) * 2019-04-23 2023-09-14 キヤノン株式会社 Element substrate, liquid ejection head, and recording device
JP7465096B2 (en) * 2020-01-20 2024-04-10 キヤノン株式会社 Element substrate, liquid ejection head, and recording apparatus
JP2021187121A (en) 2020-06-03 2021-12-13 キヤノン株式会社 Element substrate, liquid discharge head, and recording device
JP7543096B2 (en) * 2020-11-13 2024-09-02 キヤノン株式会社 Substrate for liquid ejection head, and liquid ejection head
JP2022078883A (en) 2020-11-13 2022-05-25 キヤノン株式会社 Substrate for liquid discharge head, and liquid discharge head
JP2023037261A (en) 2021-09-03 2023-03-15 キヤノン株式会社 Element substrate and recording head

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
JP2708557B2 (en) * 1988-07-26 1998-02-04 キヤノン株式会社 Element substrate for liquid jet recording head, liquid jet recording head, head cartridge and recording apparatus
US6142606A (en) * 1997-12-22 2000-11-07 Canon Kabushiki Kaisha Ink jet recording head, substrate for use of such head, ink jet cartridge, and ink jet recording apparatus
US6382782B1 (en) * 2000-12-29 2002-05-07 Eastman Kodak Company CMOS/MEMS integrated ink jet print head with oxide based lateral flow nozzle architecture and method of forming same
JP2005067164A (en) * 2003-08-28 2005-03-17 Sony Corp Liquid ejection head, liquid ejector, and process for manufacturing liquid ejection head
JP2005205891A (en) * 2003-12-26 2005-08-04 Canon Inc Base body for inkjet head, inkjet head, driving method of inkjet head, and inkjet recording apparatus
KR100553914B1 (en) * 2004-01-29 2006-02-24 삼성전자주식회사 Inkjet printhead and method for manufacturing the same
KR100717023B1 (en) * 2005-08-27 2007-05-10 삼성전자주식회사 Inkjet printhead and method of manufacturing the same
JP2008307828A (en) * 2007-06-15 2008-12-25 Canon Inc Recording head
JP2010023397A (en) * 2008-07-23 2010-02-04 Canon Finetech Inc Liquid ejection head
JP5328608B2 (en) * 2008-12-15 2013-10-30 キヤノン株式会社 Substrate for liquid discharge head, liquid discharge head and manufacturing method thereof
JP5404121B2 (en) * 2009-03-25 2014-01-29 キヤノン株式会社 Recording substrate, method for manufacturing the recording substrate, and liquid discharge head
JP5606213B2 (en) * 2009-09-04 2014-10-15 キヤノン株式会社 Manufacturing method of substrate for liquid discharge head
JP6222968B2 (en) * 2013-04-09 2017-11-01 キヤノン株式会社 Liquid discharge head, liquid discharge head cleaning method, and liquid discharge apparatus
JP6289234B2 (en) * 2014-04-15 2018-03-07 キヤノン株式会社 Recording element substrate and liquid ejection apparatus

Also Published As

Publication number Publication date
CN105818537B (en) 2018-03-06
RU2645565C2 (en) 2018-02-21
CN108372722A (en) 2018-08-07
JP6598658B2 (en) 2019-10-30
JP2016137705A (en) 2016-08-04
CN105818537A (en) 2016-08-03
TWI610820B (en) 2018-01-11
TW201632362A (en) 2016-09-16
RU2016102322A (en) 2017-08-01
CN108372722B (en) 2020-04-21

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