SG10201507167UA - Co-Based Alloy Sputtering Target Having Boride and Method For Producing The Same - Google Patents

Co-Based Alloy Sputtering Target Having Boride and Method For Producing The Same

Info

Publication number
SG10201507167UA
SG10201507167UA SG10201507167UA SG10201507167UA SG10201507167UA SG 10201507167U A SG10201507167U A SG 10201507167UA SG 10201507167U A SG10201507167U A SG 10201507167UA SG 10201507167U A SG10201507167U A SG 10201507167UA SG 10201507167U A SG10201507167U A SG 10201507167UA
Authority
SG
Singapore
Prior art keywords
boride
producing
same
based alloy
sputtering target
Prior art date
Application number
SG10201507167UA
Inventor
Lee Sanghak
Xu Jinling
Kumar Karuppannagounder Arul
Kumar Suri Pavan
Olszewski James
Aparnadevi Minisankar
Original Assignee
Heraeus Materials Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Materials Singapore Pte Ltd filed Critical Heraeus Materials Singapore Pte Ltd
Priority to SG10201507167UA priority Critical patent/SG10201507167UA/en
Priority to PCT/SG2016/050407 priority patent/WO2017044042A1/en
Publication of SG10201507167UA publication Critical patent/SG10201507167UA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
    • C22C32/0047—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with carbides, nitrides, borides or silicides as the main non-metallic constituents
    • C22C32/0073—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with carbides, nitrides, borides or silicides as the main non-metallic constituents only borides
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/10—Sintering only
    • B22F3/105—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding
    • B22F2003/1051—Sintering only by using electric current other than for infrared radiant energy, laser radiation or plasma ; by ultrasonic bonding by electric discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • B22F2998/10—Processes characterised by the sequence of their steps
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
SG10201507167UA 2015-09-07 2015-09-07 Co-Based Alloy Sputtering Target Having Boride and Method For Producing The Same SG10201507167UA (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
SG10201507167UA SG10201507167UA (en) 2015-09-07 2015-09-07 Co-Based Alloy Sputtering Target Having Boride and Method For Producing The Same
PCT/SG2016/050407 WO2017044042A1 (en) 2015-09-07 2016-08-23 Co-based alloy sputtering target having boride and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG10201507167UA SG10201507167UA (en) 2015-09-07 2015-09-07 Co-Based Alloy Sputtering Target Having Boride and Method For Producing The Same

Publications (1)

Publication Number Publication Date
SG10201507167UA true SG10201507167UA (en) 2017-04-27

Family

ID=58239724

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201507167UA SG10201507167UA (en) 2015-09-07 2015-09-07 Co-Based Alloy Sputtering Target Having Boride and Method For Producing The Same

Country Status (2)

Country Link
SG (1) SG10201507167UA (en)
WO (1) WO2017044042A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018193036A1 (en) * 2017-04-21 2018-10-25 Oerlikon Surface Solutions Ag, Pfäffikon Superalloy sputtering target
CN115446313A (en) * 2022-09-28 2022-12-09 新加坡先进薄膜材料私人有限公司 Method, device and equipment for manufacturing chromium-platinum alloy target and storage medium thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4297135A (en) * 1979-11-19 1981-10-27 Marko Materials, Inc. High strength iron, nickel and cobalt base crystalline alloys with ultrafine dispersion of borides and carbides
US4400212A (en) * 1982-01-18 1983-08-23 Marko Materials, Inc. Cobalt-chromium alloys which contain carbon and have been processed by rapid solidification process and method
FR2523157A1 (en) * 1982-03-09 1983-09-16 Marko Materials Inc Boron-contg. tool steels - produced by rapid solidification process, esp. melt spinning
US4594104A (en) * 1985-04-26 1986-06-10 Allied Corporation Consolidated articles produced from heat treated amorphous bulk parts
US20070017803A1 (en) * 2005-07-22 2007-01-25 Heraeus, Inc. Enhanced sputter target manufacturing method
KR20180088491A (en) * 2013-11-28 2018-08-03 제이엑스금속주식회사 Magnetic material sputtering target and method for producing same

Also Published As

Publication number Publication date
WO2017044042A1 (en) 2017-03-16

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