SG10201505659VA - Operating methods of purge devices for containers - Google Patents
Operating methods of purge devices for containersInfo
- Publication number
- SG10201505659VA SG10201505659VA SG10201505659VA SG10201505659VA SG10201505659VA SG 10201505659V A SG10201505659V A SG 10201505659VA SG 10201505659V A SG10201505659V A SG 10201505659VA SG 10201505659V A SG10201505659V A SG 10201505659VA SG 10201505659V A SG10201505659V A SG 10201505659VA
- Authority
- SG
- Singapore
- Prior art keywords
- containers
- operating methods
- purge devices
- purge
- devices
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW104109047A TWI544973B (en) | 2015-03-20 | 2015-03-20 | A method for operating a semiconductor container washing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10201505659VA true SG10201505659VA (en) | 2016-10-28 |
Family
ID=56925354
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10201505659VA SG10201505659VA (en) | 2015-03-20 | 2015-07-21 | Operating methods of purge devices for containers |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US9543176B2 (en) |
| CN (1) | CN106206248A (en) |
| SG (1) | SG10201505659VA (en) |
| TW (1) | TWI544973B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113289995B (en) * | 2021-05-14 | 2022-04-22 | 无锡亚电智能装备有限公司 | Wafer containing box cleaning equipment and wafer containing box cleaning method |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5651193A (en) * | 1994-02-09 | 1997-07-29 | The Gsi Group, Inc. | Grain dryer and control system therefor |
| JP3471543B2 (en) * | 1996-11-07 | 2003-12-02 | 大日本スクリーン製造株式会社 | Rotary substrate drying equipment |
| JP2963443B1 (en) * | 1998-06-19 | 1999-10-18 | キヤノン販売株式会社 | Semiconductor device manufacturing equipment |
| JP2004507102A (en) * | 2000-07-07 | 2004-03-04 | セミトゥール・インコーポレイテッド | Semiconductor wafer container cleaning equipment |
| KR20040040790A (en) * | 2002-11-08 | 2004-05-13 | (주)케이디비테크놀러지 | Mini environment |
| US6935050B2 (en) * | 2002-12-04 | 2005-08-30 | Corning Incorporated | Method and apparatus reducing metal impurities in optical fiber soot preforms |
| US7144813B2 (en) * | 2004-11-12 | 2006-12-05 | Semitool, Inc. | Method and apparatus for thermally processing microelectronic workpieces |
| JP4519037B2 (en) * | 2005-08-31 | 2010-08-04 | 東京エレクトロン株式会社 | Heating device and coating / developing device |
| JP4527670B2 (en) * | 2006-01-25 | 2010-08-18 | 東京エレクトロン株式会社 | Heat treatment apparatus, heat treatment method, control program, and computer-readable storage medium |
| FR2920046A1 (en) * | 2007-08-13 | 2009-02-20 | Alcatel Lucent Sas | METHOD FOR POST-PROCESSING A TRANSPORT MEDIUM FOR THE CONVEYAGE AND ATMOSPHERIC STORAGE OF SEMICONDUCTOR SUBSTRATES, AND POST-PROCESSING STATION FOR IMPLEMENTING SUCH A METHOD |
| JP5482196B2 (en) * | 2009-12-25 | 2014-04-23 | 東京エレクトロン株式会社 | Film forming apparatus, film forming method, and storage medium |
| TWI450324B (en) * | 2010-01-25 | 2014-08-21 | Gudeng Prec Ind Co Ltd | Reticle clean process for a lithography tool and a clean system thereof |
| US8534079B2 (en) * | 2010-03-18 | 2013-09-17 | Chart Inc. | Freezer with liquid cryogen refrigerant and method |
| JP5761067B2 (en) * | 2012-02-13 | 2015-08-12 | 東京エレクトロン株式会社 | Gas supply device and heat treatment device |
| CN202655308U (en) * | 2012-05-12 | 2013-01-09 | 山东电力集团公司济南供电公司 | Full-automatic glass ware cleaning machine |
| TWI452423B (en) * | 2012-11-19 | 2014-09-11 | Gudeng Prec Industral Co Ltd | Method and system for cleaning photomask |
| TWM465663U (en) * | 2013-03-27 | 2013-11-11 | Gudeng Prec Ind Co Ltd | Chuck structure for substrate washing apparatus |
-
2015
- 2015-03-20 TW TW104109047A patent/TWI544973B/en not_active IP Right Cessation
- 2015-05-29 CN CN201510285065.XA patent/CN106206248A/en active Pending
- 2015-07-16 US US14/801,823 patent/US9543176B2/en active Active
- 2015-07-21 SG SG10201505659VA patent/SG10201505659VA/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US9543176B2 (en) | 2017-01-10 |
| US20160276187A1 (en) | 2016-09-22 |
| TW201634136A (en) | 2016-10-01 |
| CN106206248A (en) | 2016-12-07 |
| TWI544973B (en) | 2016-08-11 |
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