SG10201503305PA - Lateral high voltage transistor - Google Patents
Lateral high voltage transistorInfo
- Publication number
- SG10201503305PA SG10201503305PA SG10201503305PA SG10201503305PA SG10201503305PA SG 10201503305P A SG10201503305P A SG 10201503305PA SG 10201503305P A SG10201503305P A SG 10201503305PA SG 10201503305P A SG10201503305P A SG 10201503305PA SG 10201503305P A SG10201503305P A SG 10201503305PA
- Authority
- SG
- Singapore
- Prior art keywords
- high voltage
- voltage transistor
- lateral high
- lateral
- transistor
- Prior art date
Links
Classifications
-
- H01L29/7816—
-
- H01L29/063—
-
- H01L29/0634—
-
- H01L29/0653—
-
- H01L29/0692—
-
- H01L29/402—
-
- H01L29/66659—
-
- H01L29/66681—
-
- H01L29/7835—
-
- H01L29/665—
Landscapes
- Chemical & Material Sciences (AREA)
- Composite Materials (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201503305PA SG10201503305PA (en) | 2015-04-27 | 2015-04-27 | Lateral high voltage transistor |
US15/137,018 US9741845B2 (en) | 2015-04-27 | 2016-04-25 | Lateral high voltage transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201503305PA SG10201503305PA (en) | 2015-04-27 | 2015-04-27 | Lateral high voltage transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201503305PA true SG10201503305PA (en) | 2016-11-29 |
Family
ID=57148045
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201503305PA SG10201503305PA (en) | 2015-04-27 | 2015-04-27 | Lateral high voltage transistor |
Country Status (2)
Country | Link |
---|---|
US (1) | US9741845B2 (en) |
SG (1) | SG10201503305PA (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108389906B (en) * | 2017-02-03 | 2023-01-10 | 联华电子股份有限公司 | High voltage metal oxide semiconductor transistor element |
US20200227544A1 (en) * | 2017-09-28 | 2020-07-16 | Intel Corporation | Gallium nitride transistors with drain field plates and their methods of fabrication |
TWI632622B (en) * | 2017-10-26 | 2018-08-11 | 立錡科技股份有限公司 | High voltage metal oxide semiconductor device and manufacturing method thereof |
DE102017130223B4 (en) | 2017-12-15 | 2020-06-04 | Infineon Technologies Ag | Semiconductor device with electrically connected planar field-effect transistor cells and associated DC-DC converter |
US10483356B2 (en) * | 2018-02-27 | 2019-11-19 | Siliconix Incorporated | Power semiconductor device with optimized field-plate design |
CN109244142A (en) * | 2018-09-29 | 2019-01-18 | 深圳市南硕明泰科技有限公司 | A kind of LDMOS and its manufacturing method |
US11195915B2 (en) * | 2019-04-15 | 2021-12-07 | Texas Instruments Incorporated | Semiconductor devices with a sloped surface |
CN112349778B (en) * | 2019-08-08 | 2022-02-22 | 天津大学 | RESURF LDMOS device with HVBN structure |
TWI739695B (en) * | 2020-06-14 | 2021-09-11 | 力旺電子股份有限公司 | Level shifter |
CN113823694B (en) * | 2021-08-19 | 2023-10-31 | 电子科技大学 | Lateral power semiconductor device integrated with submicron super junction and manufacturing method thereof |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7989890B2 (en) | 2006-10-13 | 2011-08-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lateral power MOSFET with high breakdown voltage and low on-resistance |
US7508032B2 (en) | 2007-02-20 | 2009-03-24 | Taiwan Semiconductor Manufacturing Co., Ltd. | High voltage device with low on-resistance |
US8159029B2 (en) | 2008-10-22 | 2012-04-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | High voltage device having reduced on-state resistance |
US7875930B2 (en) | 2009-02-16 | 2011-01-25 | Vanguard International Semiconductor Corporation | Semiconductor structure having an enlarged finger shaped region for reducing electric field density and method of manufacturing the same |
US8384184B2 (en) | 2010-09-15 | 2013-02-26 | Freescale Semiconductor, Inc. | Laterally diffused metal oxide semiconductor device |
US8541862B2 (en) | 2011-11-30 | 2013-09-24 | Freescale Semiconductor, Inc. | Semiconductor device with self-biased isolation |
US8686509B2 (en) | 2012-02-09 | 2014-04-01 | Macronix International Co., Ltd. | Semiconductor structure and method for manufacturing the same |
US8648416B1 (en) | 2012-07-20 | 2014-02-11 | Texas Instruments Incorporated | LDMOS sense transistor structure for current sensing at high voltage |
TWI476926B (en) | 2012-12-25 | 2015-03-11 | Richtek Technology Corp | Manufacturing method of lateral double diffused metal oxide semiconductor device |
-
2015
- 2015-04-27 SG SG10201503305PA patent/SG10201503305PA/en unknown
-
2016
- 2016-04-25 US US15/137,018 patent/US9741845B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20160315188A1 (en) | 2016-10-27 |
US9741845B2 (en) | 2017-08-22 |
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