SG10201500561SA - Cleaning method for coating systems - Google Patents
Cleaning method for coating systemsInfo
- Publication number
- SG10201500561SA SG10201500561SA SG10201500561SA SG10201500561SA SG10201500561SA SG 10201500561S A SG10201500561S A SG 10201500561SA SG 10201500561S A SG10201500561S A SG 10201500561SA SG 10201500561S A SG10201500561S A SG 10201500561SA SG 10201500561S A SG10201500561S A SG 10201500561SA
- Authority
- SG
- Singapore
- Prior art keywords
- cleaning method
- coating systems
- coating
- systems
- cleaning
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/003—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods using material which dissolves or changes phase after the treatment, e.g. ice, CO2
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24C—ABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
- B24C1/00—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
- B24C1/04—Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for treating only selected parts of a surface, e.g. for carving stone or glass
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010005762A DE102010005762A1 (en) | 2010-01-25 | 2010-01-25 | Cleaning process for coating systems |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201500561SA true SG10201500561SA (en) | 2015-05-28 |
Family
ID=43706705
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201500561SA SG10201500561SA (en) | 2010-01-25 | 2010-12-22 | Cleaning method for coating systems |
SG2012055216A SG182730A1 (en) | 2010-01-25 | 2010-12-22 | Cleaning method for coating systems |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG2012055216A SG182730A1 (en) | 2010-01-25 | 2010-12-22 | Cleaning method for coating systems |
Country Status (12)
Country | Link |
---|---|
US (1) | US20120298139A1 (en) |
EP (1) | EP2529040A1 (en) |
JP (1) | JP2013518177A (en) |
KR (1) | KR20120120944A (en) |
CN (1) | CN102812154B (en) |
BR (1) | BR112012018524A2 (en) |
CA (1) | CA2788448A1 (en) |
DE (1) | DE102010005762A1 (en) |
MX (1) | MX2012008661A (en) |
RU (1) | RU2554838C2 (en) |
SG (2) | SG10201500561SA (en) |
WO (1) | WO2011088884A1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012003514A1 (en) * | 2012-02-24 | 2013-08-29 | Acp-Advanced Clean Production Gmbh | Method for dry cleaning and pretreatment of surfaces, involves pairing of beam with synergistic medium by external supply, where beam is mixed with fuel gas and carbon dioxide snow |
WO2017031571A1 (en) * | 2015-08-22 | 2017-03-02 | Novena Tec Inc. | Process chamber shielding system and method |
WO2020096091A1 (en) * | 2018-11-09 | 2020-05-14 | 주식회사 그리너지 | Surface treatment method for lithium metal negative electrode, surface-treated lithium metal negative electrode, and lithium metal battery comprising same |
FR3088564B1 (en) * | 2018-11-16 | 2020-12-25 | Safran Aircraft Engines | PROCESS FOR COMPACTING AN ANTI-CORROSION PAINT OF A TURBOMACHINE PART |
CN109663790B (en) * | 2018-12-12 | 2021-02-19 | 盐城市国泰混凝土有限公司 | Cleaning method for excess material of concrete mixer truck returned to factory |
DE102019110642A1 (en) * | 2019-04-25 | 2020-10-29 | Vtd Vakuumtechnik Dresden Gmbh | Anode for PVD processes |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06170735A (en) * | 1992-12-03 | 1994-06-21 | Shin Etsu Chem Co Ltd | Manufacture of polycrystalline diamond grinding wheel |
JPH1136061A (en) * | 1997-07-17 | 1999-02-09 | Mitsubishi Materials Corp | Masking jig of physical vapor deposition device |
JP2000044843A (en) * | 1998-08-04 | 2000-02-15 | Mitsubishi Heavy Ind Ltd | Coating material and its production |
JP3030287B1 (en) * | 1998-10-09 | 2000-04-10 | 株式会社協同インターナショナル | Method for cleaning film forming apparatus, method for cleaning sputtering target, and cleaning apparatus used for these |
EP1277233A2 (en) * | 2000-04-25 | 2003-01-22 | Tokyo Electron Corporation | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
JP3984833B2 (en) * | 2001-01-16 | 2007-10-03 | キヤノン株式会社 | Method for regenerating developer carrier |
JP4200662B2 (en) * | 2001-02-19 | 2008-12-24 | 富士ゼロックス株式会社 | Manufacturing method of image display medium |
DE10111235A1 (en) | 2001-03-08 | 2002-09-19 | Linde Ag | Process for blasting treatment with blasting media |
ITMI20010134U1 (en) | 2001-03-12 | 2002-09-12 | Valentini Guido | SUBSTANTIALLY CIRCULAR OPERATING PLATE FOR PORTABLE TOOL |
JP2002339059A (en) * | 2001-05-16 | 2002-11-27 | Mitsubishi Heavy Ind Ltd | Vacuum vapor deposition apparatus |
US20030037879A1 (en) * | 2001-08-24 | 2003-02-27 | Applied Materials, Inc. | Top gas feed lid for semiconductor processing chamber |
JP3876167B2 (en) * | 2002-02-13 | 2007-01-31 | 川崎マイクロエレクトロニクス株式会社 | Cleaning method and semiconductor device manufacturing method |
US7002790B2 (en) * | 2002-09-30 | 2006-02-21 | Medtronic, Inc. | Capacitor in an implantable medical device |
US6902628B2 (en) * | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Method of cleaning a coated process chamber component |
JP4653406B2 (en) * | 2004-03-10 | 2011-03-16 | 株式会社アルバック | Water-disintegrating Al composite material, water-disintegrating Al sprayed film, method for producing water-disintegrating Al powder, film forming chamber component, and method for recovering film forming material |
US7384486B2 (en) * | 2004-03-26 | 2008-06-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chamber cleaning method |
EP1598444B1 (en) * | 2004-05-06 | 2006-11-15 | Siemens Aktiengesellschaft | Process to adjust the electric conductivity of a coating on a machine component by dry ice blasting, the electric conductivity being variable by pressure |
DE102006002653B4 (en) | 2005-01-27 | 2009-10-08 | Luderer Schweißtechnik GmbH | Dry Ice Blasting |
EP1772529A1 (en) * | 2005-10-07 | 2007-04-11 | Siemens Aktiengesellschaft | Dry chemical composition, use thereof to form a layer system and method for coating |
WO2008040819A1 (en) | 2006-10-06 | 2008-04-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method of decontamination by means of dry ice |
DE102007033788A1 (en) * | 2007-07-09 | 2009-01-15 | Gerd Wurster | Pretreatment plant for special- or burnished tire rims, includes high pressure carbon dioxide jet cleaning equipment, with guidance provided by camera and robot |
RU2510664C2 (en) * | 2008-11-20 | 2014-04-10 | Эрликон Трейдинг Аг, Трюббах | Method of cleaning for coating applicators |
-
2010
- 2010-01-25 DE DE102010005762A patent/DE102010005762A1/en not_active Withdrawn
- 2010-12-22 KR KR1020127021306A patent/KR20120120944A/en not_active Application Discontinuation
- 2010-12-22 CA CA2788448A patent/CA2788448A1/en not_active Abandoned
- 2010-12-22 MX MX2012008661A patent/MX2012008661A/en unknown
- 2010-12-22 US US13/574,817 patent/US20120298139A1/en not_active Abandoned
- 2010-12-22 SG SG10201500561SA patent/SG10201500561SA/en unknown
- 2010-12-22 WO PCT/EP2010/007971 patent/WO2011088884A1/en active Application Filing
- 2010-12-22 BR BR112012018524A patent/BR112012018524A2/en not_active IP Right Cessation
- 2010-12-22 RU RU2012136472/02A patent/RU2554838C2/en not_active IP Right Cessation
- 2010-12-22 SG SG2012055216A patent/SG182730A1/en unknown
- 2010-12-22 JP JP2012549264A patent/JP2013518177A/en active Pending
- 2010-12-22 CN CN201080062436.3A patent/CN102812154B/en not_active Expired - Fee Related
- 2010-12-22 EP EP10800894A patent/EP2529040A1/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
DE102010005762A1 (en) | 2011-07-28 |
CN102812154A (en) | 2012-12-05 |
BR112012018524A2 (en) | 2016-08-23 |
CN102812154B (en) | 2015-07-15 |
RU2554838C2 (en) | 2015-06-27 |
MX2012008661A (en) | 2012-10-15 |
EP2529040A1 (en) | 2012-12-05 |
RU2012136472A (en) | 2014-03-10 |
SG182730A1 (en) | 2012-08-30 |
WO2011088884A1 (en) | 2011-07-28 |
CA2788448A1 (en) | 2011-07-28 |
US20120298139A1 (en) | 2012-11-29 |
JP2013518177A (en) | 2013-05-20 |
KR20120120944A (en) | 2012-11-02 |
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