SE8402497L - - Google Patents

Info

Publication number
SE8402497L
SE8402497L SE8402497A SE8402497A SE8402497L SE 8402497 L SE8402497 L SE 8402497L SE 8402497 A SE8402497 A SE 8402497A SE 8402497 A SE8402497 A SE 8402497A SE 8402497 L SE8402497 L SE 8402497L
Authority
SE
Sweden
Application number
SE8402497A
Other versions
SE442306B (sv
SE8402497D0 (sv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to SE8402497A priority Critical patent/SE442306B/sv
Publication of SE8402497D0 publication Critical patent/SE8402497D0/xx
Priority to AU41585/85A priority patent/AU4158585A/en
Priority to US06/834,238 priority patent/US4672019A/en
Priority to PCT/SE1985/000144 priority patent/WO1985005130A1/en
Priority to DE8585901655T priority patent/DE3567485D1/de
Priority to EP85901655A priority patent/EP0181343B1/en
Priority to AT85901655T priority patent/ATE39950T1/de
Publication of SE8402497L publication Critical patent/SE8402497L/xx
Publication of SE442306B publication Critical patent/SE442306B/sv
Priority to DK009986A priority patent/DK165417C/da
Priority to FI860100A priority patent/FI77058C/fi

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Decoration By Transfer Pictures (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Printing Plates And Materials Therefor (AREA)
SE8402497A 1984-05-09 1984-05-09 Saett att anbringa skyddsskikt paa yta som skall utsaettas foer etsning SE442306B (sv)

Priority Applications (9)

Application Number Priority Date Filing Date Title
SE8402497A SE442306B (sv) 1984-05-09 1984-05-09 Saett att anbringa skyddsskikt paa yta som skall utsaettas foer etsning
AT85901655T ATE39950T1 (de) 1984-05-09 1985-03-29 Verfahren zum aufbringen einer schutzschicht auf eine einer saeure ausgesetzten flaeche.
DE8585901655T DE3567485D1 (en) 1984-05-09 1985-03-29 Method of applying a protective layer on a surface to be subjected to etching
US06/834,238 US4672019A (en) 1984-05-09 1985-03-29 Method of applying a protective layer on a surface to be subjected to etching
PCT/SE1985/000144 WO1985005130A1 (en) 1984-05-09 1985-03-29 Method of applying a protective layer on a surface to be subjected to etching
AU41585/85A AU4158585A (en) 1984-05-09 1985-03-29 Method of applying a protective layer on a surface to be subjected to etching
EP85901655A EP0181343B1 (en) 1984-05-09 1985-03-29 Method of applying a protective layer on a surface to be subjected to etching
DK009986A DK165417C (da) 1984-05-09 1986-01-09 Fremgangsmaade til anbringelse af et beskyttelseslag paa en overflade, der skal udsaettes for aetsning
FI860100A FI77058C (fi) 1984-05-09 1986-01-09 Saett att anbringa skyddsskikt pao yta som skall utsaettas foer etsning.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE8402497A SE442306B (sv) 1984-05-09 1984-05-09 Saett att anbringa skyddsskikt paa yta som skall utsaettas foer etsning

Publications (3)

Publication Number Publication Date
SE8402497D0 SE8402497D0 (sv) 1984-05-09
SE8402497L true SE8402497L (da) 1985-11-10
SE442306B SE442306B (sv) 1985-12-16

Family

ID=20355807

Family Applications (1)

Application Number Title Priority Date Filing Date
SE8402497A SE442306B (sv) 1984-05-09 1984-05-09 Saett att anbringa skyddsskikt paa yta som skall utsaettas foer etsning

Country Status (8)

Country Link
US (1) US4672019A (da)
EP (1) EP0181343B1 (da)
AU (1) AU4158585A (da)
DE (1) DE3567485D1 (da)
DK (1) DK165417C (da)
FI (1) FI77058C (da)
SE (1) SE442306B (da)
WO (1) WO1985005130A1 (da)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE406284C (de) * 1922-12-08 1924-11-21 Maurice Andre Bombois Verfahren zum schnellen Gravieren von Gold- und Silberwaren
DE1203569B (de) * 1956-03-22 1965-10-21 Louis Noel Verfahren zum stellenweisen AEtzen von Metallgegenstaenden
DE1109226B (de) * 1958-12-17 1961-06-22 Siemens Ag Verfahren zur Herstellung gedruckter Schaltungen und/oder gedruckter Schaltungselemente
DE1253009B (de) * 1963-11-20 1967-10-26 Siemens Ag Verfahren zum Herstellen von Stuetzschablonen fuer Bedampfungsmasken
US3476561A (en) * 1965-08-30 1969-11-04 Ibm Photoetch method
US3507653A (en) * 1966-12-29 1970-04-21 Corning Glass Works Stencil screen and method
US3737314A (en) * 1972-02-29 1973-06-05 Ncr Co Manufacture of printing elements by a photoresist chemical etching system
US4388388A (en) * 1981-06-04 1983-06-14 General Dynamics Electronics Division Method of forming metallic patterns on curved surfaces

Also Published As

Publication number Publication date
EP0181343A1 (en) 1986-05-21
FI860100A0 (fi) 1986-01-09
DE3567485D1 (en) 1989-02-16
SE442306B (sv) 1985-12-16
FI77058C (fi) 1989-01-10
EP0181343B1 (en) 1989-01-11
FI77058B (fi) 1988-09-30
SE8402497D0 (sv) 1984-05-09
DK9986A (da) 1986-01-09
FI860100L (fi) 1986-01-09
DK165417C (da) 1993-04-13
DK165417B (da) 1992-11-23
US4672019A (en) 1987-06-09
DK9986D0 (da) 1986-01-09
AU4158585A (en) 1985-11-28
WO1985005130A1 (en) 1985-11-21

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