SE7612994L - KIT FOR MIGRATION OF A MELTED ZONE THROUGH A MASSIVE BODY OF SALMON MATERIAL - Google Patents

KIT FOR MIGRATION OF A MELTED ZONE THROUGH A MASSIVE BODY OF SALMON MATERIAL

Info

Publication number
SE7612994L
SE7612994L SE7612994A SE7612994A SE7612994L SE 7612994 L SE7612994 L SE 7612994L SE 7612994 A SE7612994 A SE 7612994A SE 7612994 A SE7612994 A SE 7612994A SE 7612994 L SE7612994 L SE 7612994L
Authority
SE
Sweden
Prior art keywords
migration
kit
massive body
melted zone
salmon
Prior art date
Application number
SE7612994A
Other languages
Swedish (sv)
Other versions
SE418547B (en
Inventor
M F Chang
H E Cline
T E Anthony
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of SE7612994L publication Critical patent/SE7612994L/en
Publication of SE418547B publication Critical patent/SE418547B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/06Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/08Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
    • C30B13/10Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/40Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/761PN junctions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/04Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
    • H01L29/045Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Element Separation (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
SE7612994A 1975-11-21 1976-11-19 PROCEDURE FOR MIGRATION OF A MELTED ZONE THROUGH A MASSIVE BODY OF SEMICONDUCTOR MATERIAL SE418547B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63424775A 1975-11-21 1975-11-21

Publications (2)

Publication Number Publication Date
SE7612994L true SE7612994L (en) 1977-05-22
SE418547B SE418547B (en) 1981-06-09

Family

ID=24542996

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7612994A SE418547B (en) 1975-11-21 1976-11-19 PROCEDURE FOR MIGRATION OF A MELTED ZONE THROUGH A MASSIVE BODY OF SEMICONDUCTOR MATERIAL

Country Status (6)

Country Link
JP (1) JPS5270755A (en)
DE (1) DE2652667A1 (en)
FR (1) FR2332619A1 (en)
GB (1) GB1566454A (en)
NL (1) NL7612934A (en)
SE (1) SE418547B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4180416A (en) * 1978-09-27 1979-12-25 International Business Machines Corporation Thermal migration-porous silicon technique for forming deep dielectric isolation
FR2445626A1 (en) * 1978-12-29 1980-07-25 Radiotechnique Compelec Power transistor for monolithic integrated circuit - has low collector resistance achieved by using two extra domains of opposite conduction type
US4713680A (en) * 1986-06-30 1987-12-15 Motorola, Inc. Series resistive network
US6720632B2 (en) * 2000-06-20 2004-04-13 Matsushita Electric Industrial Co., Ltd. Semiconductor device having diffusion layer formed using dopant of large mass number

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2450809A1 (en) * 1973-10-30 1975-05-07 Gen Electric DEEPLY EMBEDDED LAYERS FOR SEMI-CONDUCTOR FACILITIES

Also Published As

Publication number Publication date
SE418547B (en) 1981-06-09
FR2332619B1 (en) 1980-09-26
NL7612934A (en) 1977-05-24
DE2652667A1 (en) 1977-06-02
GB1566454A (en) 1980-04-30
JPS5270755A (en) 1977-06-13
FR2332619A1 (en) 1977-06-17

Similar Documents

Publication Publication Date Title
IT1073923B (en) PHOTOSENSITIVE COPYING MATERIAL
SE7609968L (en) METHOD OF MANUFACTURING CARTRIDGE SLEEVES
GB1553696A (en) Material for electrophotographic reproduction
JPS5240253A (en) Form of sprocket part
JPS5236028A (en) Photosensitive photographic material
SE409529B (en) KIT FOR MIGRATION OF A MELT OF METAL-RICH SEMICONDUCTOR MATERIAL THROUGH A MASSIVE BODY OF THE SEMICONDUCTOR MATERIAL
SE7614706L (en) PROCEDURE FOR MIGRATION OF A MELTED ZONE THROUGH A MASSIVE BODY OF SALMON MATERIAL
SE7612994L (en) KIT FOR MIGRATION OF A MELTED ZONE THROUGH A MASSIVE BODY OF SALMON MATERIAL
JPS5265433A (en) Photographic photosensitive material
DK278076A (en) DAYLIGHT DEVELOPER MACHINE
KE3037A (en) Detoxification of oil seed material
SE409981B (en) APPLIANCE FOR DISCHARGE OF GRAIN-MATERIAL
SE7800365L (en) KIT FOR CONTINUOUS FERRYING OF TEXTILE MATERIAL
SE411523B (en) DESCRIPTION OF MELT IRON
JPS524409A (en) Controlling of piggiron refining
SE7710979L (en) SEWING-RESISTANT MACHINE ELEMENT OF SEGJERN FOR TREATMENT OF MINERALS
DK366176A (en) APPLIANCE FOR DICE-FREE ZONE MELTING
SE7800364L (en) KIT FOR CONTINUOUS FERRYING OF TEXTILE MATERIAL
GB1507829A (en) Heat-processable photosensitive material
GB1540725A (en) Photographic copying machine
JPS51140335A (en) Muddy water control device of shield excavator
SE7607990L (en) APPLIANCE FOR REALIZATION OF HYDRAULIC CIRCUITS
JPS5218011A (en) Additioning material for stabilizing soil
ZA764441B (en) Chlorine leaching of nickel-containing sulphide material
JPS5237039A (en) Method of stabilizing exposed free radical photosensitive material