SE363173B - - Google Patents

Info

Publication number
SE363173B
SE363173B SE06813/72A SE681372A SE363173B SE 363173 B SE363173 B SE 363173B SE 06813/72 A SE06813/72 A SE 06813/72A SE 681372 A SE681372 A SE 681372A SE 363173 B SE363173 B SE 363173B
Authority
SE
Sweden
Application number
SE06813/72A
Inventor
G Talts
Original Assignee
Misomex Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Misomex Ab filed Critical Misomex Ab
Priority to SE06813/72A priority Critical patent/SE363173B/xx
Priority to GB2354473A priority patent/GB1437817A/en
Priority to US361057A priority patent/US3876303A/en
Priority to DE2326445A priority patent/DE2326445A1/de
Priority to FR7319060A priority patent/FR2186145A5/fr
Priority to JP48057918A priority patent/JPS4951932A/ja
Publication of SE363173B publication Critical patent/SE363173B/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G03B27/14—Details
    • G03B27/16—Illumination arrangements, e.g. positioning of lamps, positioning of reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/02—Sensitometric processes, e.g. determining sensitivity, colour sensitivity, gradation, graininess, density; Making sensitometric wedges
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Control Of Exposure In Printing And Copying (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SE06813/72A 1972-05-25 1972-05-25 SE363173B (xx)

Priority Applications (6)

Application Number Priority Date Filing Date Title
SE06813/72A SE363173B (xx) 1972-05-25 1972-05-25
GB2354473A GB1437817A (xx) 1972-05-25 1973-05-17
US361057A US3876303A (en) 1972-05-25 1973-05-17 Method and apparatus for continuous, successive or stepwise exposure of a light-sensitive material
DE2326445A DE2326445A1 (de) 1972-05-25 1973-05-24 Verfahren und vorrichtung zur fortwaehrenden, aufeinanderfolgenden oder stufenweisen belichtung eines lichtempfindlichen materials
FR7319060A FR2186145A5 (xx) 1972-05-25 1973-05-25
JP48057918A JPS4951932A (xx) 1972-05-25 1973-05-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE06813/72A SE363173B (xx) 1972-05-25 1972-05-25

Publications (1)

Publication Number Publication Date
SE363173B true SE363173B (xx) 1974-01-07

Family

ID=20269674

Family Applications (1)

Application Number Title Priority Date Filing Date
SE06813/72A SE363173B (xx) 1972-05-25 1972-05-25

Country Status (6)

Country Link
US (1) US3876303A (xx)
JP (1) JPS4951932A (xx)
DE (1) DE2326445A1 (xx)
FR (1) FR2186145A5 (xx)
GB (1) GB1437817A (xx)
SE (1) SE363173B (xx)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4508452A (en) * 1975-08-27 1985-04-02 Robotic Vision Systems, Inc. Arrangement for sensing the characteristics of a surface and determining the position of points thereon
US4185918A (en) * 1975-08-27 1980-01-29 Solid Photography Inc. Arrangement for sensing the characteristics of a surface and determining the position of points thereon
DE3124693C2 (de) * 1980-06-27 1987-02-19 Dainippon Screen Seizo K.K., Kyoto Verfahren zur Einstellung der Belichtungszeiten in einer Reprokamera
FR2603712A1 (fr) * 1986-09-08 1988-03-11 Forhom Arts Graphiques Sarl Generateur de trames mecaniques degradees
FR2642861B1 (fr) * 1989-02-06 1991-05-24 Laine Philippe Procede et dispositif pour la fabrication de supports presentant un aspect degrade
JPH03155112A (ja) * 1989-11-13 1991-07-03 Nikon Corp 露光条件測定方法
EP0627666B1 (en) * 1993-05-24 2003-02-05 Holtronic Technologies Plc Apparatus and method for changing the scale of a printed pattern
JPH10229038A (ja) * 1997-02-14 1998-08-25 Nikon Corp 露光量制御方法
DE102004022329B3 (de) * 2004-05-06 2005-12-29 Infineon Technologies Ag Verfahren zur dynamischen Dosisanpassung in einem lithographischen Projektionsapparat und Projektionsapparat

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3588247A (en) * 1967-05-17 1971-06-28 Minolta Camera Kk Automatic exposure control device for copying machine
NL6909654A (xx) * 1969-06-24 1970-12-29
GB1361392A (en) * 1970-09-24 1974-07-24 Hansard C Photographic explosure controller

Also Published As

Publication number Publication date
FR2186145A5 (xx) 1974-01-04
DE2326445A1 (de) 1973-12-06
GB1437817A (xx) 1976-06-03
US3876303A (en) 1975-04-08
JPS4951932A (xx) 1974-05-20

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