SE362665B - - Google Patents

Info

Publication number
SE362665B
SE362665B SE05689/72A SE568972A SE362665B SE 362665 B SE362665 B SE 362665B SE 05689/72 A SE05689/72 A SE 05689/72A SE 568972 A SE568972 A SE 568972A SE 362665 B SE362665 B SE 362665B
Authority
SE
Sweden
Application number
SE05689/72A
Inventor
G N Jackson
R G Pickard
G Brackley
D W Satchell
Original Assignee
Era Patents Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Era Patents Ltd filed Critical Era Patents Ltd
Priority to SE05689/72A priority Critical patent/SE362665B/xx
Publication of SE362665B publication Critical patent/SE362665B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/345Magnet arrangements in particular for cathodic sputtering apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
SE05689/72A 1972-04-28 1972-04-28 SE362665B (cs)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SE05689/72A SE362665B (cs) 1972-04-28 1972-04-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE05689/72A SE362665B (cs) 1972-04-28 1972-04-28

Publications (1)

Publication Number Publication Date
SE362665B true SE362665B (cs) 1973-12-17

Family

ID=20267002

Family Applications (1)

Application Number Title Priority Date Filing Date
SE05689/72A SE362665B (cs) 1972-04-28 1972-04-28

Country Status (1)

Country Link
SE (1) SE362665B (cs)

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