SE310727B - - Google Patents

Info

Publication number
SE310727B
SE310727B SE7506/61A SE750661A SE310727B SE 310727 B SE310727 B SE 310727B SE 7506/61 A SE7506/61 A SE 7506/61A SE 750661 A SE750661 A SE 750661A SE 310727 B SE310727 B SE 310727B
Authority
SE
Sweden
Application number
SE7506/61A
Inventor
K Kohler
W Dietrich
W Proebster
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of SE310727B publication Critical patent/SE310727B/xx

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R23/00Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
    • G01R23/02Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage
    • G01R23/10Arrangements for measuring frequency, e.g. pulse repetition rate; Arrangements for measuring period of current or voltage by converting frequency into a train of pulses, which are then counted, i.e. converting the signal into a square wave
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/542Controlling the film thickness or evaporation rate
    • C23C14/545Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/546Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B1/00Comparing elements, i.e. elements for effecting comparison directly or indirectly between a desired value and existing or anticipated values
    • G05B1/01Comparing elements, i.e. elements for effecting comparison directly or indirectly between a desired value and existing or anticipated values electric
    • G05B1/04Comparing elements, i.e. elements for effecting comparison directly or indirectly between a desired value and existing or anticipated values electric with sensing of the position of the pointer of a measuring instrument
    • G05B1/08Comparing elements, i.e. elements for effecting comparison directly or indirectly between a desired value and existing or anticipated values electric with sensing of the position of the pointer of a measuring instrument stepwise sensing
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D5/00Control of dimensions of material
    • G05D5/02Control of dimensions of material of thickness, e.g. of rolled material
    • G05D5/03Control of dimensions of material of thickness, e.g. of rolled material characterised by the use of electric means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
  • Physical Vapour Deposition (AREA)
  • Feedback Control In General (AREA)
SE7506/61A 1960-07-21 1961-07-20 SE310727B (forum.php)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH837060A CH387752A (de) 1960-07-21 1960-07-21 Verfahren und Einrichtung zur Regelung einer durch elektrische Schwingungen veränderliche Frequenz dargestellten Grösse eines Vorganges

Publications (1)

Publication Number Publication Date
SE310727B true SE310727B (forum.php) 1969-05-12

Family

ID=4339264

Family Applications (1)

Application Number Title Priority Date Filing Date
SE7506/61A SE310727B (forum.php) 1960-07-21 1961-07-20

Country Status (4)

Country Link
US (1) US3227952A (forum.php)
CH (1) CH387752A (forum.php)
GB (1) GB964343A (forum.php)
SE (1) SE310727B (forum.php)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1020756A (en) * 1961-11-07 1966-02-23 Nihon Genshiryoku Kenkyu Sho System for measuring the period of a nuclear reactor using frequency conversion or period conversion
GB1073293A (en) * 1963-10-16 1967-06-21 Edwards High Vacuum Int Ltd Apparatus for controlling vapour deposition in a vacuum
US3400331A (en) * 1965-01-18 1968-09-03 Pratt & Whitney Inc Gaging device including a probe having a plurality of concentric and coextensive electrodes
US3383604A (en) * 1966-05-09 1968-05-14 Navy Usa Double threshold detection system
US3488758A (en) * 1966-09-14 1970-01-06 Kingsbury Technology Inc Apparatus for measuring a property of a material while processing it between movable members containing electrodes coupled to an oscillatory circuit
DE2112063A1 (de) * 1970-03-13 1971-11-11 Gen Eng Radcliffe Verfahren und Vorrichtung zur digitalen Messung und Darstellung eine AEnderung oder AEnderungsgeschwindigkeit der Frequenz eines Impulszuges
US3689747A (en) * 1970-12-09 1972-09-05 Ibm Digital evaporation monitor system
US3704414A (en) * 1971-01-18 1972-11-28 Bogue Elec Mfg Co Frequency meter
DE2158320B2 (de) * 1971-11-24 1980-04-10 Ferdy Dr. Grenoble Mayer (Frankreich) Vorrichtung zur berührungsfreien relativen Abstandsmessung
US3939413A (en) * 1974-09-13 1976-02-17 General Electric Company Low cutoff digital pulse filter especially useful in electronic energy consumption meters
JPS5233558A (en) * 1975-09-10 1977-03-14 Hiromi Ogasawara Detector for minute variations
JPS54141657A (en) * 1978-04-26 1979-11-05 Hiromi Ogasawara Device for measuring displacement of moving body
JPS5575614A (en) * 1978-12-04 1980-06-07 Hiromi Ogasawara Amount of movement measuring unit for straight movement mobile body
JPS5537958A (en) * 1978-09-11 1980-03-17 Hiromi Ogasawara Rotation angle detector
JPS5562310A (en) * 1978-10-20 1980-05-10 Hiromi Ogasawara Direct-acting type displacement detector
US4287470A (en) * 1979-02-12 1981-09-01 Mem Muszaki Intezet Digital humidimeter
US4300093A (en) * 1979-12-03 1981-11-10 Ogasawara Hiromi Device for measuring the amount of rotation of a rotating object
US6161420A (en) * 1997-11-12 2000-12-19 Fisher Controls International, Inc. High frequency measuring circuit
JP2009250807A (ja) * 2008-04-07 2009-10-29 Seiko Epson Corp 周波数測定装置及び測定方法
JP2010271091A (ja) * 2009-05-20 2010-12-02 Seiko Epson Corp 周波数測定装置
JP5440999B2 (ja) * 2009-05-22 2014-03-12 セイコーエプソン株式会社 周波数測定装置
JP5517033B2 (ja) * 2009-05-22 2014-06-11 セイコーエプソン株式会社 周波数測定装置
JP5582447B2 (ja) * 2009-08-27 2014-09-03 セイコーエプソン株式会社 電気回路、同電気回路を備えたセンサーシステム、及び同電気回路を備えたセンサーデバイス
JP5815918B2 (ja) * 2009-10-06 2015-11-17 セイコーエプソン株式会社 周波数測定方法、周波数測定装置及び周波数測定装置を備えた装置
JP5876975B2 (ja) * 2009-10-08 2016-03-02 セイコーエプソン株式会社 周波数測定装置及び周波数測定装置における変速分周信号の生成方法
JP5883558B2 (ja) 2010-08-31 2016-03-15 セイコーエプソン株式会社 周波数測定装置及び電子機器

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2414479A (en) * 1942-11-05 1947-01-21 Bell Telephone Labor Inc Impulse generator
US2411298A (en) * 1945-02-12 1946-11-19 Philips Corp Piezoelectric crystal
US2768629A (en) * 1953-09-24 1956-10-30 American Mach & Foundry Moisture measuring method and apparatus
US2880612A (en) * 1955-04-21 1959-04-07 Coyne Andre Measurement of physical quantities with the aid of apparatus which converts the saidquantities into variations of oscillation frequency
US2902765A (en) * 1956-07-02 1959-09-08 Hughes Aircraft Co Bridge circuit for position measuring device
US3006547A (en) * 1957-02-27 1961-10-31 Jean Faure Herman Frequency dividing circuits
US2991416A (en) * 1958-05-06 1961-07-04 Herbert O Ramp Frequency shift measuring device

Also Published As

Publication number Publication date
CH387752A (de) 1965-02-15
US3227952A (en) 1966-01-04
GB964343A (en) 1964-07-22

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