SE109143C1SE88042ASE88042ASE109143C1SE 109143 C1SE109143 C1SE 109143C1SE 88042 ASE88042 ASE 88042ASE 88042 ASE88042 ASE 88042ASE 109143 C1SE109143 C1SE 109143C1
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SE
Sweden
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SE88042A
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Priority to SE88042ApriorityCriticalpatent/SE109143C1/xx
Publication of SE109143C1publicationCriticalpatent/SE109143C1/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F1/92—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces