RU2743572C1 - High-brightness source of short-wave radiation (options) - Google Patents

Abstract

FIELD: physics.SUBSTANCE: invention relates to impulse high-brightness radiation sources in the wavelength range of 0.4-120 nm. Radiation source contains a vacuum chamber (1) with an impulse radiating plasma area and contamination counter-measures devices (5), including two or more housings (6) intended for the formation of contamination-free homocentric beams (7) of the short-wave radiation directed from the impulse radiating plasma area (2) to the optical collector (3). The surface of each casing (6) contains two first faces (8), oriented in radial directions to the impulse radiating plasma area and parallel to the selected direction, for example, a vertical. Permanent magnets (9) are placed outside each casing (6), creating magnetic field inside the casings (6). The optical collector (3) preferably consists of several mirrors (4) installed in the route of each of the short-wavelength radiation beams. In this option of the invention, the plasma represents laser plasma of the liquid metal target material (16) supplied to the focusing area of the laser beam using a rotating target assembly (19).EFFECT: creation of powerful high-brightness sources of short-wave radiation with highly effective contamination countermeasures in a beam of short-wave radiation, propagating in a large, preferably more than 0.25 sr (steradian), solid angle.17 cl, 3 dwg

Description

FIELD OF TECHNOLOGY

The invention relates to high-brightness radiation sources in the wavelength range from approximately 0.4 to 120 nm, in which a highly effective suppression of polluting particles in a solid angle of collection of short-wavelength radiation is provided to ensure long-term operation of the radiation source and / or equipment integrated with it.

PRIOR ART

Sources of radiation of soft X-ray, extreme ultraviolet (EUV) and vacuum ultraviolet (VUV) ranges of high intensity are used in many fields: for microscopy, biomedical and medical diagnostics, materials testing, analysis of nanostructures, in atomic physics, and lithography.

Plasma effectively emitting in the soft X-ray range (0.4 - 10 nm), EUV (10 - 20 nm), and VUV (20-120 nm) ranges can be obtained both by focusing the radiation of high-power lasers on the target and in the discharge. Along with the emission of short-wave radiation as a by-product from the region of the emitting plasma, a stream of unwanted microdroplets is generated, as well as charged and neutral particles (debris), which contaminate the optical collection system of short-wave radiation, which includes collector optics, which can consist of one or several mirrors. located near the radiation source. In addition to the fact that microdroplets and particles deposited on the collector mirror reduce its reflection coefficient, high-velocity particles can damage the collector mirror and, possibly, other parts of the optical system located behind the collector mirror.

This makes the development of clean high-brightness sources of short-wave radiation with effective suppression of the flux of polluting particles in the path of the short-wave radiation beam propagating to the top urgent.

From international patent application PCT / RU2012 / 000701, published under the number WO / 2013/122505 on August 22, 2013, a source of short-wave radiation based on a laser-initiated discharge in metal vapor is known. The laser beam is directed to the place of irradiation of one of the electrodes so that the discharge initiated by the laser beam has an asymmetric, predominantly curved, banana-like shape. The intrinsic magnetic field of such a discharge has a gradient that determines the predominant movement of the discharge plasma flow from the electrodes to the region of a weaker magnetic field in a direction that is significantly different from the direction of the radiation beam output from the plasma to the optical collector. To obtain a high radiation power, the discharge is carried out at a high pulse repetition rate. The invention provides a simple and highly effective suppression of the flow of charged particles in the radiation beam.

However, suppression of the flux of neutral particles and clusters requires the use of more sophisticated pollution suppression systems.

The most efficient and technological method for obtaining radiation in the soft X-ray, EUV and VUV ranges is the use of a pulsed laser plasma of the target material. The development of laser-plasma radiation sources in recent years has been largely stimulated by the development of projection EUV lithography for large-scale production of integrated circuits (ICs) with structures of 7 nm and less.

A method for suppressing contaminating particles based on the use of an auxiliary plasma created along the path of propagation of a short-wavelength radiation beam in a specially injected gas is disclosed in US patent 9268031, publ. 02/23/2016. Contaminants that acquire an electric charge as a result of exposure to the auxiliary plasma are then deflected by a pulsed electric field. The method is effective for protection against ion / vapor fraction of contaminants, for example, in sources using xenon as a working substance.

However, in sources using metals as a working substance, the main threat to the elements of the optical system is the micro-droplet fraction of contaminants, against which this method is powerless.

From US patent 8519366, published on August 27, 2013, a method for suppressing contamination in EUV radiation sources based on laser plasma of droplet Sn targets is known. The method involves using a magnetic field to eliminate charged contaminants. Along with this, the system of protection against contamination includes a foil trap and ports for supplying a buffer protective gas to it, which provides a sufficiently effective trapping of neutral atoms and clusters of the liquid-metal target material.

However, additional, rather complex measures are needed to protect against micro-droplet fraction of contaminants.

All of the above approaches to the construction of plasma sources of short-wave radiation, as well as the methods of pollution suppression used in them, do not provide highly effective suppression of the micro-droplet fraction of polluting particles along the path of the wide-aperture EUV radiation beam. This limits the time of uninterrupted operation of the equipment in which the source of short-wave radiation is integrated, both due to contamination of its optical elements, and greatly increases the cost of maintaining the source.

The method of protecting against a micro-droplet fraction of contaminating particles, known from US patent 7302043, published on November 27, 2007, is partially devoid of this drawback. It provides for the use of a fast-rotating shutter capable of transmitting short wavelength radiation through at least one opening during one rotation period and preventing the passage of contaminants during another rotation period of the shutter.

However, the use of such a means of protection against pollution in a compact radiation source is technically too difficult to implement.

This drawback is largely devoid of shortwave radiation sources known from US patent 10638588, publ. 04/28/2020, US patent 10588210, published 03/10/2020, and US patent application 20200163197, publ. 05/21/2020, which are incorporated into this description by reference in their entirety. The sources disclosed in these patent documents contain a vacuum chamber with a rotating target assembly delivering a target in the form of a molten metal layer to the interaction zone with a focused laser beam. The complex of means for suppressing contamination includes the rotation of the target with a high linear velocity, more than 80 m / s, and the orientation of the laser and short-wave radiation beams, preferably at an angle of incidence of more than 45 ° to the target surface in the region of the pulsed emitting plasma. To suppress the ion / vapor fraction of contaminants, the use of foil traps, magnetic fields and directional flows of protective buffer gas is provided. A nozzle can be used to supply a high-speed gas flow directly to the region of the emitting plasma. In embodiments of the radiation source, a replaceable membrane of carbon nanotubes (CNT membrane) is installed in the path of the short-wave radiation beam. Also, as a means of suppressing contaminants near the region of the pulsed emitting plasma, a screen with two holes is fixedly installed for entering the laser beam into the region of the pulsed emitting plasma and for extracting a short-wave radiation beam from it. It is also proposed to use a laser pulse consisting of two parts: a prepulse and a main pulse, the parameters of which and the delay between them are chosen in such a way as to suppress the ionic fraction of impurities. Another proposed contamination suppression mechanism is to use a high repetition rate of laser pulses, for example, of the order of 1 MHz, to allow the evaporation of microdroplets up to 0.1 μm in size resulting from the previous laser pulse. radiation and plasma of the subsequent pulse.

These methods have a sufficiently high efficiency of suppression of contamination, however, they are intended for relatively small spatial angles of collection of short-wavelength plasma radiation, as a result, the average power in the short-wavelength radiation beam turns out to be insufficient for a number of applications.

SUMMARY OF THE INVENTION

Accordingly, there is a need to eliminate at least some of the above disadvantages. In particular, there is a need for improved light sources that are compact, powerful, collecting short wavelength plasma radiation in a large solid angle, providing effective, preferably substantially complete, attenuation of the flux of pollutants along the path of the short wavelength radiation beam.

This invention is aimed at solving a technical problem associated with a multiple increase in the average power of pure high-brightness sources of soft X-ray, EUV and VUV radiation while ensuring their commercial availability and economic operation.

The technical result of the invention is the creation of powerful high-brightness sources of short-wave radiation with highly effective suppression of contamination in the beam of short-wave radiation propagating in a large, preferably more than 0.25 sr, solid angle.

Achievement of these goals is possible with the help of a high-brightness source of short-wave radiation, which includes a vacuum chamber with a region of pulsed emitting plasma and means for suppressing contaminants along the path of short-wave radiation to the optical collector.

A high-brightness source of short-wave radiation is characterized in that the means for suppressing contamination include two or more housings designed to form pollution-free homocentric beams of short-wave plasma radiation emanating from the region of pulsed emitting plasma, the surface of each shroud contains two first faces oriented in radial directions in relation to the region of the pulsed emitting plasma and parallel to the selected direction, for example, the vertical, and outside of each casing there are permanent magnets that create a magnetic field inside the casings.

In a preferred embodiment of the invention, the permanent magnets located at the outermost parts of the housings are connected to each other by a magnetic circuit.

In a preferred embodiment, the angle between the two first edges of each shroud is less than 30 degrees.

In a preferred embodiment, the angle between adjacent edges of the two shrouds is 3 to 10 degrees.

In a preferred embodiment of the invention, the area of the first edges of each housing is greater than the area of the remainder of the surface of the housing, and the permanent magnets are adjacent to the first edges of each housing.

In a preferred embodiment of the invention, the optical collector comprises several mirrors installed in the path of each of the short wavelength radiation beams.

In a preferred embodiment of the invention, the reflecting surface of all mirrors belongs to an ellipsoid of revolution, in one focus of which is the region of pulsed emitting plasma, and in the other, the focal point of all mirrors of the optical collector.

In a preferred embodiment of the invention, the surface of each housing includes two second edges oriented radially with respect to the pulsed emitting plasma region and substantially perpendicular to the first two edges of the housing.

In another embodiment of the invention, the area of the first edges of each case is less than the area of the rest of the surface of the case, and permanent magnets are located on the surface of the cases outside their first edges.

Preferably, permanent magnets are located along the entire length of the housings.

Contamination suppression means may include carbon nanotube membranes (CNT membranes) installed between each enclosure and the optical collector in the path of the shortwave plasma beams.

The means for suppressing contamination may also include streams of shielding gas, preferably argon, directed inside each enclosure into the pulsed emitting plasma region, with each CNT membrane simultaneously serving as a window of the enclosure for the exit of the short wavelength radiation beam and a gas shutter to prevent the escape of protective gas through it. ...

In an embodiment, the means for suppressing contamination include plates placed in each of the housings and oriented in radial directions with respect to the region of the pulsed high-temperature plasma, mainly perpendicular to the lines of magnetic induction.

In a particular embodiment of the invention, the pulsed emitting plasma can be selected from the group consisting of: laser plasma, z-pinch plasma, plasma focus, plasma of a discharge in metal vapor initiated by a laser.

Achievement of the above goals is also possible with the help of a high-brightness source of short-wave radiation, which includes a vacuum chamber with a rotating target assembly supplying a liquid-metal target to the focusing zone of the laser beam, and means for suppressing contaminants along the path of short-wave radiation from the region of pulsed emitting plasma to the optical collector.

A high-brightness source of short-wave radiation is characterized in that the means for suppressing contamination include two or more housings designed to form pollution-free homocentric beams of short-wave plasma radiation emanating from the region of pulsed emitting plasma, the surface of each shroud contains two first faces oriented in radial directions in relation to the region of the pulsed emitting plasma and parallel to the selected direction, for example, the vertical, and outside of each casing there are permanent magnets that create a magnetic field inside the casings.

In a particular embodiment of the invention, the target is a layer of molten metal formed by centrifugal force on the surface of the annular groove of the rotating target assembly facing the axis of rotation.

The above and other objects, advantages and features of the present invention will become more apparent from the following non-limiting description of an exemplary embodiment thereof, given by way of example with reference to the accompanying drawing.

BRIEF DESCRIPTION OF THE FIGURES

The essence of the invention is illustrated by drawings, in which:

FIG. 1 is a schematic diagram of a high brightness shortwave radiation source with multi-sectional protection of the optical collector from pollutant flows in accordance with the present invention.

FIG. 2 is a diagram of the mutual arrangement of the region of pulsed emitting plasma, collector mirrors, and the focal point of the mirrors based on an ellipsoid of revolution.

FIG. 3 is a schematic diagram of a high brightness shortwave radiation source with a rotating target assembly.

These drawings do not cover and, moreover, do not limit the entire scope of the options for implementing this technical solution, but are only illustrative material of a particular case of its implementation.

MODE FOR CARRYING OUT THE INVENTION

In accordance with an exemplary embodiment of the invention shown at various scales in FIG. 1, a high-brightness short-wavelength radiation source comprises a vacuum chamber 1 with a pulsed emitting plasma region 2. The short-wavelength high-temperature pulsed plasma radiation collected by an optical collector 3, preferably consisting of several mirrors 4, is directed to an intermediate focus and then preferably to an optical system.

In addition to the short-wavelength radiation from the region of the emitting plasma 2, a stream of polluting particles (debris) is generated as a by-product to protect against which pollution suppression means 5 are placed on the path of the short-wavelength radiation to the optical collector.

In accordance with the invention, the contamination suppression means 5 include two or more thin-walled (preferably not more than 1 mm thick) casings 6 designed to generate contamination-free homocentric beams 7 of short-wave plasma radiation emerging from the region of the pulsed emitting plasma 2.

The surface of each casing contains two first edges 8, oriented in radial directions with respect to the region of the pulsed emitting plasma 2 and parallel to the selected direction, for example, the vertical. In the exemplary embodiment shown in FIG. 1, the first edges 8 of each casing 6 are located in vertically oriented planes.

Outside each casing 6 are permanent magnets 9, which create a magnetic field inside the casings, the magnetic induction vectors of which are directed perpendicular to the optical axis of the casings.

In contrast to the known solutions, the means of suppression of contamination in accordance with the present invention are a multi-section system that allows you to significantly increase the solid angle of collection of short-wave plasma radiation, while maintaining the effectiveness of protection against contamination at the level of a single-section system. An increase in the solid angle of collection of short-wave radiation makes it possible to significantly (several times) increase the collected power of short-wave radiation and thereby increase the efficiency of using high-brightness sources in almost all areas of applications of such sources.

In single-section systems, a simple increase in the transverse dimensions of the housing leads to a sharp decrease in the effectiveness of the magnetic protection against charged particles. This is due to the fact that the larger the size of the casing along the lines of force of the magnetic field, the lower the values of the magnetic induction in the volume of the casing, which leads to a decrease in the transverse velocity of charged particles propagating through the casing from the region of the pulsed emitting plasma 2 to the collector mirror 4. Thus, during the flight of the section, the particles will not be able to deflect a sufficient distance to avoid getting into the mirror. Experiments have shown that for the effective operation of the magnetic protection, it is necessary that the values of the magnetic induction in the center of the casing at a distance of about 40 mm from the region of the pulsed emitting plasma were not less than 0.5 T. It has also been experimentally established that the flat angle between the sides of the casing, on which the magnets are located, should not exceed 30 degrees.

Thus, the use of a multisection system of protective equipment, in which the plane angle between the edges of the casing does not exceed 30 degrees, makes it possible to create in each casing a constant magnetic field of sufficient magnitude for effective protection against charged particles.

The orientation of the edges of the casings in the radial directions with respect to the region of the pulsed emitting plasma (2) provides high geometric transparency of the multisectional protection system of the optical collector. The same purpose is served by the fact that in embodiments of the invention the angle between adjacent edges of the two casings 6 is not more than 10 degrees, preferably from 3 to 10 degrees.

In accordance with the invention, the permanent magnets located on the most distant from each other parts of the casings 6 are connected to each other by a magnetic circuit 10. The magnetic circuit 10, preferably made of soft magnetic steel, reduces the loss of the magnetic field due to leakage, concentrating it in the magnetic circuit, and thereby increasing it in the volume of each casing, increasing the efficiency of suppressing the flows of polluting particles.

In an embodiment of the invention, the surface of each casing 6 also contains two second edges 11 oriented in radial directions with respect to the region of the pulsed emitting plasma 2 and perpendicular to the two first edges 8 or close to such.

In preferred embodiments of the invention, the area of the first edges 8 of each casing 6 is greater than the area of the rest 11 of the casing surface, and the permanent magnets 9 are adjacent to the first edges 8 of each casing 6, FIG. 1. This allows you to create the strongest magnetic field in the enclosures for a more effective impact on charged particles.

For the same purpose, in other embodiments of the invention, when the area of the first edges of each casing is less than the area of the rest of the surface of the casing, permanent magnets are located on the surface of the casings outside their first edges, for example, on the larger second faces of each casing (not shown) ...

The contamination suppression means preferably include CNT membranes 12 installed between each casing 6 and the mirror 4 of the optical collector 3 in the path of the short wavelength plasma beams 7. The CNT membranes 12 provide the output of the short wavelength radiation beam due to their high transparency in the shorter wavelength range. 20 nm. At the same time, CNT - membranes 12 prevent the passage of polluting particles through them, providing deep suppression of contaminants on the way to the collector mirrors 4.

Along with this, the means for suppressing contamination include flows of shielding gas, preferably argon, directed through the inlets of shielding gas 13 inside each casing 6 into the region of the pulsed emitting plasma 2. In this case, each CNT membrane 12 simultaneously serves as a window of the casing 6 for the exit of the short-wavelength beam radiation 7 and a gas seal preventing the escape of the protective gas through it. Providing an average vacuum in the casings at a shielding gas pressure of about 20 Pa allows an increase in the number of collisions between particles (vapors and ions) flying from the region of pulsed emitting plasma and gas molecules, thereby deflecting them from rectilinear motion. At the same time, the use of a CNT membrane as a gas seal allows the use of increased pressure only within the protection means, and not along the entire path of propagation of short-wave radiation beams to the consumer. This reduces the loss of short-wave radiation due to absorption in the gas.

To obtain radiation in the wavelength range of more than 20 nm, CNT membranes 12 are not used, since their transparency in the indicated range decreases sharply with increasing radiation wavelength.

In the embodiment shown in FIG. 2, the optical collector 3 contains several mirrors 4, while the reflecting surface of all mirrors belongs to the ellipsoid of revolution 14, in one focus of which is the region of pulsed emitting plasma 2, and in the other - the focusing point 15 of the mirrors 4 of the optical collector 3. In this case, the mirrors 4 have the same parameters, which significantly reduces the cost of the optical collector. The production of such mirrors is very expensive, since the roughness of the collector mirror substrates is only 0.2-0.3 nm, and the cost of such mirrors, especially those with an aspherical profile, grows with an increase in their size according to a law 2-3 times stronger than an increase in area.

The pulsed emitting plasma can be selected from the group, which includes: laser plasma, z-pinch plasma, plasma focus, and laser-initiated metal vapor discharge plasma.

In a preferred embodiment of the invention, the pulsed high-temperature plasma is the laser plasma of a liquid-metal target material supplied by a rotating target assembly to the focusing region of the laser beam.

In accordance with an exemplary embodiment of the invention shown schematically in FIG. 3, the target 16 is a molten metal layer formed by centrifugal force on the surface of the annular groove 18 of the rotating target assembly 19 facing the axis of rotation 17.

The operation of a high-brightness shortwave radiation source, for example, using a laser plasma of a liquid-metal target material, is performed as follows, illustrated in FIG. 3. Vacuum chamber 1 is pumped out by an oil-free pumping system to a pressure below 10 ^-5 -10 ^-8 mbar, removing gaseous components such as nitrogen, oxygen, carbon, etc. that can interact with the material of the liquid metal target.

Target 16, the material of which belongs to the group of non-toxic low-melting metals, including Sn, Li, In, Ga, Pb, Bi, Zn and their alloys, is fed by a rotating target assembly into the interaction zone with a focused laser beam. The target is exposed to a focused pulsed laser beam 20 with a high pulse repetition rate in the range from 1 kHz to 1 MHz. Depending on the target material and the laser power density on the target, short-wavelength radiation of the laser plasma is generated in the soft X-ray and / or EUV and / or VUV ranges.

From the region of the pulsed emitting plasma 2, beams of short-wave radiation 7 are extracted through the casings 6 and preferably through the CNT-membranes 12 to the collector mirrors 4. Permanent magnets (not shown in Fig. 3) create a constant magnetic field, preferably directed perpendicular to the axis of the beams 7 of short-wave radiation (in Fig. 3 - perpendicular to the plane of the drawing). Under the action of the Lorentz force, charged polluting particles (mainly ions) deviate from rectilinear motion along the axes of the short-wavelength radiation beams 7, colliding either with the faces of the casings 6 or with plates 21 specially placed in the casings, deposited on them. Plates 21, mounted in casings 6, are directed radially to the region of pulsed emitting plasma 2 and mainly perpendicular to the lines of magnetic induction created by magnets 9. Plates 21 allow more efficient capture of high-speed charged particles, because the higher the speed of the particles, the smaller the transverse distance they deflect under the influence of the magnetic field. Along with this, streams of protective gas prevent the movement of the ion / vapor fraction of impurities, depositing them on the walls of the casings 6 and plates 21, protecting the CNT membranes 12 from impurities. Due to their high transparency in the wavelength range shorter than 20 nm, CNT membranes provide the output of a short-wave radiation beam to the mirrors 4 of the optical collector 3. At the same time, the CNT membranes 12 prevent the passage of polluting particles through them, providing reliable protection of each mirror 4. Additionally, effective suppression polluting particles in casings 6 are provided by organizing directed flows of shielding gas supplied through gas inlets 13. Shielding gas streams protect CNT membranes 12 from ionic / vapor fraction of contaminants, increasing their service life.

Thus, the present invention makes it possible to create clean, powerful, high-brightness sources of soft X-ray EUV and VUV radiation with a long service life and ease of use.

INDUSTRIAL APPLICATIONS

The proposed devices are intended for a number of applications, including microscopy, materials science, X-ray diagnostics of materials, biomedical and medical diagnostics, inspection of nano- and microstructures, including actinic control of lithographic EUV masks.

Claims (23)

1. High-brightness source of short-wave radiation, including a vacuum chamber (1) with a region of pulsed emitting plasma (2) and means for suppressing contamination (5) on the path of the short-wave radiation to the optical collector (3), characterized in that contamination suppression means (5) include two or more housings (6) designed to form contamination-free homocentric beams (7) of short-wave plasma radiation emerging from the region of pulsed emitting plasma (2), the surface of each casing contains two first faces (8) oriented in radial directions with respect to the region of pulsed emitting plasma (5) and parallel to the selected direction, for example, vertical, and permanent magnets (9) are placed outside each casing (6), creating a magnetic field inside the casings (6). 2. The device according to claim. 1, in which the permanent magnets (9) located on the most distant from each other parts of the casings (6) are connected to each other by a magnetic circuit (10). 3. A device according to any of the preceding claims, in which the angle between the two first edges (8) of each casing (6) is less than 30 degrees. 4. A device according to any of the preceding claims, wherein the angle between adjacent edges of the two casings (6) is 3 to 10 degrees. 5. A device according to any of the previous claims, in which the area of the first edges (8) of each casing (6) is greater than the area of the rest of the surface of the casing (6), and permanent magnets (9) are adjacent to the first edges (8) of each casing (6) ... 6. A device according to any one of the preceding claims, in which the optical collector (3) comprises a plurality of mirrors (4) mounted in the path of each of the short wavelength radiation beams. 7. A device according to claim 6, in which the reflecting surface of all mirrors (4) belongs to an ellipsoid of revolution (14), in one focus of which is the region of pulsed emitting plasma (2), and in the other - the focal point of all mirrors of the optical collector (15) ... 8. The device according to claim 1, in which the surface of each casing includes two second faces (11) oriented in radial directions with respect to the region of the pulsed emitting plasma (2) and substantially perpendicular to the first two faces (8) of the casing (6 ). 9. Device according to any one of paragraphs. 1-4, 6-8, in which the area of the first edges (8) of each casing (6) is less than the area of the rest of the surface of the casing (6), and permanent magnets (9) are located on the surface of the casings (6) outside their first edges (8 ). 10. A device according to any one of the preceding claims, in which permanent magnets (9) are located along the entire length of the housings. 11. A device according to any one of the preceding claims, in which the means for suppressing contamination (5) include membranes (12) based on carbon nanotubes (CNT-membranes) installed between each casing (6) and the optical collector (3) along the path beams of short-wave plasma radiation. 12. The device according to claim. 11, in which the means for suppressing contamination (5) include streams of protective gas, preferably argon, directed inside each casing (6) into the region of the pulsed emitting plasma, while each CNT membrane (12) simultaneously serves the window of the casing for the exit of the short-wave radiation beam; and the gas shutter preventing the escape of the shielding gas through it. 13. A device according to any one of the preceding claims, in which the means for suppressing contamination (5) include plates (21) placed in each of the casings (6) and oriented in radial directions with respect to the region of the pulsed high-temperature plasma (2), preferably perpendicularly lines of magnetic induction. 14. A device according to any one of the preceding claims, wherein the pulsed emitting plasma can be selected from the group consisting of: laser plasma, z-pinch plasma, plasma focus, laser-initiated metal vapor discharge plasma. 15. A device according to any one of the preceding claims, wherein the pulsed high-temperature plasma is a laser plasma of a liquid metal target material (16) supplied by a rotating target assembly (19) to the focusing region of the laser beam (20). 16. An apparatus according to claim 15, wherein the target is a molten metal layer formed by centrifugal force on the surface of the annular groove (18) of the rotating target assembly (19) facing the axis of rotation (17). 17. High-brightness source of short-wave radiation, including a vacuum chamber with a rotating target unit (19), supplying a liquid-metal target (16) to the focusing zone of the laser beam (20), and means for suppressing contaminants in the path of short-wave radiation from the region of pulsed emitting plasma to optical collector, characterized in that contamination suppression means (5) include two or more housings (6) designed to form contamination-free homocentric beams (7) of short-wave plasma radiation emerging from the region of pulsed emitting plasma (2), the surface of each casing contains two first faces (8) oriented in radial directions with respect to the region of pulsed emitting plasma (2) and parallel to the selected direction, for example, vertical, and permanent magnets (9) are placed outside each casing (6), creating a magnetic field inside the casings (6).

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