RU2545559C1 - Gas treatment centrifuge - Google Patents

Abstract

FIELD: technological processes.

SUBSTANCE: invention relates to centrifugal devices for treatment of gas from drop liquid and mechanical admixtures and may find application in systems of gas compression, treatment and drying. A gas treatment centrifuge comprises a sediment collection chamber, a hollow jacket communicated with it having a deposition surface, nozzles of gas inlet and outlet, and the following components placed in the jacket: a fixed vertical axis, guide vanes with tangential channels of gas supply and a rotor with tangential channels of gas discharge installed on the axis by means of bearing supports. The rotor is equipped with a coaxial porous partition placed between the guide vanes and gas discharge channels. The guide vanes are installed in the upper part of the jacket, and gas discharge channels are placed in the lower part of the rotor with provision of the possibility for gas flow moving up and down. At the same time gas supply channels are communicated with the cavity between the jacket and the porous partition, and gas discharge channels - with the cavity between the partition and the rotor.

EFFECT: higher efficiency of gas treatment from drop fluid.

4 cl, 1 dwg

Description

The invention relates to centrifugal devices for gas purification from a dropping liquid and mechanical impurities and may find application in gas compression, purification and drying systems.

Known centrifuge for gas purification, including a casing with a sludge collection chamber, a rotor with gas removal channels, a guiding apparatus, a deposition bed in communication with the sludge collection chamber (EP 1021249 B1, publ. 26.07.2000). Rotation of the rotor in a known centrifuge is ensured by friction of the swirling flow relative to the peripheral surface of the rotor, which serves simultaneously as a deposition bed. The linear velocity of rotation of the stream differs from the linear velocity of rotation of the surface of the bed of deposition, which causes intense disturbance of the flow and worsens the conditions for the deposition of contaminants on the surface of the bed.

Closest to the proposed invention is a centrifuge for gas purification, including gas inlet and outlet pipes, a base with a sediment collection chamber mounted on the base of the hollow casing, and a fixed vertical axis, a guiding apparatus with tangential gas supply channels, a rotor with tangential gas removal channels, placed on the axis by means of bearing bearings, the deposition bed, in communication with the sediment collection chamber (RU 2301114 C1, B04B 5/08, publ. 06/20/2006). In the known centrifuge for the deposition of contaminants from a gas stream, the particles of the dispersed phase need to overcome a relatively long distance from the central zone of the rotor to the deposition bed, which imposes restrictions on the completeness of screening of especially small particles of contaminants. The sediment bed in a known centrifuge is placed on the inclined outer surface of the rotor. The axial gas flow directed to the side opposite to the direction of movement of the particles prevents the removal of deposited particles from the rotor, which creates conditions for capture by the gas flow of already deposited particles and their entry into the exhaust channels.

An object of the invention is to increase the cleaning efficiency. The technical result provided by the invention and allowing to solve the problem is to prevent entrainment of particles by the gas flow into the exhaust channels by ensuring their deposition in the porous septum and reducing the distance that the particles must overcome to precipitate.

The technical result is ensured by the fact that in a centrifuge for gas purification containing a sediment collection chamber, a hollow casing with a deposition surface, a gas inlet and outlet pipes connected to it and a stationary vertical axis placed in the casing, a guiding apparatus with tangential gas supply channels, a rotor with tangential gas exhaust channels, located on the axis by means of bearing bearings, a feature is that the rotor is equipped with a coaxial porous partition placed between the guide apparatus and the channels the gas supply, a guiding apparatus is located in the upper part of the casing, and the gas exhaust channels are located in the lower part of the rotor to allow gas flow from top to bottom, while the gas supply channels are in communication with the cavity between the casing and the porous partition, and the gas exhaust channels with the cavity between the baffle and the rotor.

The supply of the rotor with a porous septum located between the guiding apparatus and the tangential channels for removing gas from the rotor allows the process of deposition of particles in the pore channels of the septum and significantly reduce the distance that the particles must overcome to precipitate.

Preferably, the deposition surface was formed by the deposition bed, which is made of porous material and placed on the inside of the casing.

The porous septum is preferably made of coalescing material, which creates the possibility of coarsening (coalescence) of small particles of the liquid phase deposited in the channels of the septum, enhances the action of the centrifugal factor and provides a more complete screening of the liquid phase.

The porous partition has a tapered outer and inner surface and with a smaller base facing the tangential gas supply channels, which expands the centrifuge's scaling capabilities.

The essence of the invention is illustrated using the drawings. In FIG. 1 shows a centrifuge in axial section.

The centrifuge includes a base 1 with a sediment collection chamber 2, connected to the base 1 and connected to the chamber 2, a hollow casing 3, to which are connected the upper pipe 4 of the gas inlet and the lower pipe 5 of the gas outlet. A fixed vertical axis 6 is installed in the casing 3. In the upper part of the casing 3 there is a guide apparatus 7 with tangential gas supply channels 8.

The rotor 9, mounted on the axis 6 by means of bearing bearings 10, has tangential gas exhaust channels 11 located at the bottom and is provided with a porous partition 12 coaxially surrounding it, preferably made of coalescing non-woven material. The gas supply channels 8 are connected with the cavity between the partition 12 and the casing 3, and the gas removal channels 11 are connected with the cavity between the partition 12 and the rotor 6.

The porous septum 12 may have a cylindrical or conical shape. In a preferred embodiment, it has a tapered outer and inner surface and with a smaller base facing the tangential channels 8 of the gas supply, which extends the scaling of the centrifuge.

On the inner wall of the casing 3 is located the bed 13 of the deposition, made of non-woven porous material.

The proposed centrifuge operates as follows.

Gas with liquid and solid impurities contained in it enters through the upper pipe 4 into a guiding apparatus 7, which creates a swirl of flow due to the tangential channels 8. The rotating flow, interacting with the rotor 9 and then passing through the tangential channels 11 of the gas outlet, creates a torque that causes the rotor 9 to rotate. Due to the action of the centrifugal field created in the rotating flow, relatively large particles of contaminants move radially towards the bed 13 of the deposition, where they are firmly fixed in the pores and subsequently, as they accumulate under the influence of gravity, they enter the sediment collection chamber 2. The movement of the sediment in the direction of the collection chamber 2 is facilitated by a gas flow directed from top to bottom. Small particles of impurities are deposited and held in the pores of the septum 12 due to the adhesion forces. While in the pores, the particles are enlarged due to the coalescing properties of the material of the partition 12. As the enlargement, the particles under the influence of a centrifugal field are also discarded to the periphery to the bed 13 of the deposition. Thus, the porous septum 12 prevents the entrainment of particles by the gas flow and reduces the distances that the particles travel before settling. The purified gas passes through the pores of the baffle 12 and is discharged from the centrifuge through the gas exhaust ducts 11 and through the lower nozzle 5. The guide apparatus 7 is placed in the upper part of the rotor 6, and the gas exhaust ducts 11 are in the lower part of the rotor 6, allowing gas flow from above down creates the conditions for reliable fixation of the deposited particles on the bed 13 and allows you to completely exclude the capture of a stream of deposited particles and their transfer to the tangential channels 11 of the gas outlet.

Claims (4)

1. A centrifuge for gas purification, containing a sediment collection chamber, a hollow casing connected to it with a deposition surface, gas inlet and outlet pipes and a fixed vertical axis located in the casing, a guiding apparatus with tangential gas supply channels and a rotor with tangential gas removal channels, located on the axis by means of bearing bearings, characterized in that the rotor is equipped with a coaxial porous partition located between the guide apparatus and the gas exhaust channels, the guide apparatus is located in the upper part STI casing and gas discharge channels arranged in the lower part of the rotor to enable the gas flow from top to bottom, with the gas inlet channels communicated with the cavity between the casing and the porous septum, and gas discharge channels - with the cavity between the partition and the rotor. 2. The centrifuge according to claim 1, characterized in that the deposition surface is formed by a deposition bed of porous material placed on the inside of the casing. 3. The centrifuge according to claim 1, characterized in that the porous partition is made of coalescing material. 4. The centrifuge according to claim 1, characterized in that the porous partition has a conical outer and inner surface and with a smaller base facing the tangential gas supply channels.