RU2528746C2 - Nanotechnological complex based on ionic and probe technologies - Google Patents

Abstract

FIELD: nanotechnology.

SUBSTANCE: use: of new products nanoelectronics for a closed cycle of production. The essence of the invention consists in that in nanotechnology complex based on ion and probe technologies, comprising a distribution chamber with pumping means, in which there is a central robot-distributor with the ability of axial rotation, comprising a grip of substrate carriers, at that the distribution chamber comprises flanges by means of which it is connected to the loading chamber and the module of ion implantation, the grip of substrate carriers has the ability of interaction with the loading chamber and the module of ion implantation, the measuring module is integrated, comprising a scanning probe microscope and a module of ion beams with a system of gas injectors, and they are connected to the flanges of the distribution chamber and have an ability to interact with the grip of substrate carriers. The technical result: providing an ability to vary the technological routes and enhance the functional capabilities of the distribution chamber and have an ability to interact with the grip of substrate carriers.

EFFECT: implementation extends the functional capabilities of the nanotechnology complex.

5 cl, 1 dwg

Description

The invention relates to nanotechnological equipment and is intended for a closed cycle of production of new nanoelectronics products.

Known nanotechnological complex, including a vacuum chamber with methods of molecular beam epitaxy, ion implantation and measurement [1].

This complex is a laboratory installation, not intended for mass production of nanoelectronics products. The mutual influence of the methods sharply limits its functionality.

Also known nanotechnological complex containing modules of molecular beam epitaxy, ion implantation and measurement, linearly located relative to each other [2].

This configuration of the module is rigidly tied to a certain sequence of operations, which limits its functionality.

Also known is an ultrahigh vacuum epitaxial lithographic complex including a loading chamber, a molecular beam epitaxy module, an ion implantation module, a transport system with capture of substrate carriers and pumping means [3].

This complex, like the previous one, has a rigid configuration. In addition, he does not have the ability to build up methods. This limits its functionality due to the lack of variation of technological routes.

A nanotechnological complex based on epitaxial and ionic technologies is also known, including a distribution chamber with pumping means, in which a central robot is located, with axial rotation, which includes gripping substrate carriers, while the distribution chamber contains flanges by which it is connected to the loading chamber, a molecular module radiation epitaxy and an ion implantation module, the capture of substrate carriers being able to interact with a loading chamber, a mole ulyarno beam epitaxy and ion implantation unit [4].

The disadvantages of this complex are a limited number of techniques, which narrows its functionality.

This complex is selected as a prototype of the proposed solution.

The technical result of the invention is to expand the functionality of the complex.

The specified technical result is achieved by the fact that in the nanotechnological complex based on ionic technologies, including a distribution chamber with pumping means, in which a central robot is located a distributor with the possibility of axial rotation, containing capture of substrate carriers, while the distribution chamber contains flanges by which it is connected to the camera loading and the ion implantation module, and the capture of substrate carriers has the ability to interact with the loading chamber and the ion implantation module, is led measuring module comprising a scanning probe microscope (SPM), and a module system with ion beams of gas injectors, while they are connected to the distribution chamber and flanges have the opportunity to interact with the capture media substrates.

There is an option in which a flip module is introduced into the device, while it is connected to the flange of the distribution chamber and has the ability to interact with the capture of substrate carriers.

There is also an option in which a local exposure module is introduced with a local exposure block made in the form of an ion modification block or a scanning probe microscope with a system of gas injectors, while they are connected to the flanges of the distribution chamber and have the ability to interact with the capture of substrate carriers.

The nanotechnological complex based on ion and probe technologies (Fig. 1) contains a distribution chamber 1 with a central robot, a distributor 2, containing a capture of 3 substrate carriers 4, and flanges 5.

In one embodiment, the distribution chamber 1 is connected via flanges 5 to the loading chamber 6, with an ion beam module with a gas injector system 7 including a first process unit 8 and a gas unit 9, with an ion implantation module 10 including a second process unit 11, and with a module for the revolution of the substrates 12. In general, ionic technological units are described in [5]. The distribution chamber 1, the loading chamber 6, the ion beam module 7, the ion implantation module 10 and the substrate overturn module 12 are connected to the pumping means and mounted on frames (not shown). Between the modules 6, 7, 10, 12 and the distribution chamber 1 is installed a vacuum shutter 13.

It should be noted that the flanges 5 can be arranged in pairs opposite each other. There may be another arrangement of flanges 5 (not shown). These flanges may also be larger than indicated in figure 1.

A fundamentally distinctive module from the prototype is a measuring module 16. As a measuring module 16, a module containing a scanning probe microscope 17, as well as, for example, a scanning electron microscope (SEM) 18, a secondary electrode sensor 19, and an optical microscope 20 are used. Module 16 may include and interchangeable probe chamber (not shown). Module 16 should be equipped with pumping facilities (not shown).

In modules 7, 10 and 16, a two- or three-coordinate table 21 can be located for placing substrates on it. In modules 7 and 9, table 21 is not shown. Modules 7, 9 and 16 can be installed on active vibration protection systems (not shown).

The SPM with vibration protection system and interchangeable probe camera are described in detail in [6, 7, 8, 9, 10, 11, 12].

A variant is possible in which the nanotechnological complex is equipped with a local exposure module 25 with a local exposure block 26. As this block, an ion modification (cutting) block or a scanning probe microscope with a system of gas injectors can be used. Module 25 can be installed on an active vibration protection system and contain a two- or three-coordinate table (not shown).

It should be noted that the complex may contain additional flanges 5 (not shown), to which additional equipment can be connected. The location of the modules 6, 7, 10, 12, 16 and 25 relative to each other may be different than in figure 1. All modules may contain vacuum manipulators (not shown).

The loading chamber 6 may include a quick loading flange and a cassette for storing substrates.

In the ion beam module with a system of gas injectors 7, the Canton 31 plus ion column [13] with a resolution of no worse than 10 nm can be used as the first process unit 8. As the gas block 9, you can use the Gas Injection System V4 / 0 with 5 reservoirs [13], which forms streams of H20, XeF2, phenanthrene, W (CO) 6, platinum compounds, R2SiO. In addition, block 8 can consist of a Canion 31 plus ion column, an ECLIPSE scanning electron microscope [13] with a resolution of at least 15 nm and an EQS300 secondary ion mass spectrometry (SIMS) system [14].

In the ion implantation module 10, a Canion 31 XU ion column [13] with a resolution of at least 15 nm can be used as the second process unit 11. The column contains a Wine filter, which allows you to select the desired type of ions from the mixed source of the column. In addition, block 11 may consist of a Canion 31 XU ion column, an ECLIPSE scanning electron microscope [13] with a resolution of at least 15 nm and an EQS300 secondary ion mass spectrometry (SIMS) system [14].

The flip module 12 may include a manipulator having the ability to capture the substrate carrier and rotate it.

In the measuring module 16, an ECLIPSE microscope [13] can be used as an SEM 18.

When using SPM as a block 26 with a system of gas injectors, SPM from module 16 is used as a scanning probe microscope, and a block from module 7 is used as a gas block.

When used as a block 26 of the ion modification (cutting) block, it may contain a Canion 31 plus column, an ECLIPSE column and SIMS EQS3000.

Nanotechnological complex works as follows.

The substrates are fixed in the carriers 4 and installed, for example, in a cassette (not shown) located in the loading chamber 6. After this, the loading chamber 6 is closed and the cassette is moved by the manipulator to the position that the media 4 is coupled to the capture 3 of the distribution robot 2. Next, pump loading chamber 6, opening the shutter 13 and feeding the capture 3 of the robot 2 into the chamber 6.

The process of docking the capture 3 with the carrier 4 is controlled through an optically transparent window in the chamber 6, after which the carrier 4 is transferred to the distribution chamber 1, the shutter 13 is closed and the robot 2 is turned in the desired direction.

It should be noted that the sequence of operations may be slightly different. For example, the movement of the cartridge in the loading chamber 6 can be carried out after pumping it out, etc. For details on the implementation of robots, cartridges, movement mechanisms, substrate carriers, and processes for their capture, see [6, 7, 8, 9, 10, 11, 12, 15].

The further sequence of operations depends on the technological route of production.

To coordinate the location of the surfaces of the substrates in various modules, it is possible to flip the substrates in the module 12.

An option to create new products may consist in the formation in the module 10 of the catalytic zones, for example, Nickel on the substrate using local ionic decomposition of organometallics. After that, in module 7, at certain places on the substrate, nanotubes can be formed (see, for example, [16, 17]).

Using the coordinate-related zones of nanotubes, it is possible to produce nanotransistors, monitor screens, radiators with high heat transfer, etc.

In addition to the described technological operations in module 7, gas-phase chemical deposition and gas etching of substrates initiated by an ion beam can be carried out. Moreover, the sizes of the modified zones may correspond to the sizes of focused ion beams.

In addition to the described, in module 10 can carry out local implantation of ions: AuSi, AuGe, CoNd, CoGe, ErNi, NiB, BPt, etc. This is carried out by isolating the desired type of ions by a Wien filter.

In module 7, under the influence of an ion beam, local etching of carbon can occur in the presence of water vapor: * "local etching of Si, SiO2, Si3N4, as well as the deposition of carbon, tungsten, platinum and dielectrics.

In the measuring module 16, certification of the formed structures can take place, as well as their modification by SPM 17 with the simultaneous observation of this process by a scanning electron microscope 18. The initial installation of the substrates can be controlled by an optical microscope 20.

Block 26, made in the form of an ion modification block, can carry out direct cutting of materials for the manufacture of nanoelectromechanical systems. Block 26, made in the form of an SPM with a system of gas injectors, allows the formation of nanoelements under the probe when the gas mixture is fed into the zone of its interaction with the substrate.

In addition to the indicated, using this complex it is possible to produce integrated circuits of nanoelectronics on diamond crystals, quantum devices based on the Josephson effect on self-organized periodic structures, etc.

The introduction into the nanotechnological complex of a measuring module, including a scanning probe microscope, and an ion beam module with a system of gas injectors, as well as a flip module and a local exposure module, which are connected to the flanges of the distribution chamber and have the ability to interact with the capture of substrate carriers, expands the functionality complex.

LITERATURE

1. Patent JP 5203406, G01B 7/34, 1993

2. Patent RU 2308782, H01J 37/26, 2006.

3. Ultrahigh vacuum epitaxial - lithographic complex. V.D. Belov et al. Third All-Union Seminar "Microlithography", Chernogolovka, 1990, pp. 131 - 132.

4. Patent RU 2390070, H01L 21/20, 2010.

5. O.S. Moryakov. "Elion processing." - M.: Higher School, 125 p., 1990.

6. Information ofOmicron. Multi - mode UHV Scanning Probe Microscope, p. 1,2.

7. Patent RU 2158454, H01J 37/26, 2000.

8. Patent EP 0899561, G01N 27 / 00.1999.

9. Vibration protection table MOD-1. Halsyonics catalog.

10. Information of Park Scientific Instr. Auto Probe UHV. Scanning probe

Microscope, 1994. 11.3 Probe Microscopy for Biology and Medicine. V.A. Bykov et al.,

Sensor systems, vol. 12, No. 1, pp. 99 - 121, 1998

12. Scanning tunneling and atomic force microscopy in surface electrochemistry. Danilov A.I. Advances in Chemistry, 64 (8), 1995, p. 818-833.

13. The catalog of the company Orsay Physics.

14. Catalog of the company Hiden Analitical Ltd.

15. Patent RU2163343, H01J 37/28. 2000 year

16. Carbon nanotubes have overtaken the best prototypes of silicon transistors, http://itnens.com.na.

17. I.V. Zolotukhin, Carbon Nanotubes., 1999, www.pereplet.ru.

Claims (5)

1. Nanotechnological complex based on ion and probe technologies, including a distribution chamber with pumping means, in which there is a central robot, an axial rotation distributor containing a capture of substrate carriers, wherein the distribution chamber contains flanges by which it is connected to the loading chamber and the ion module implantation, and the capture of substrate carriers has the ability to interact with the loading chamber and the ion implantation module, characterized in that it measures flax module comprising a scanning probe microscope, and a module system with ion beams of gas injectors, while they are connected to the distribution chamber and flanges have the opportunity to interact with the capture media substrates. 2. The device according to claim 1, characterized in that a flip module is inserted into it, while it is connected to the flange of the distribution chamber and has the ability to interact with the capture of substrate carriers. 3. The device according to claim 1, characterized in that a local exposure module with a local exposure block is inserted in it, while it is connected to the flange of the distribution chamber and has the ability to interact with the capture of substrate carriers. 4. The device according to claim 3, characterized in that the local exposure unit is made in the form of an ion modification unit. 5. The device according to claim 3, characterized in that the local exposure unit is made in the form of a scanning probe microscope with a system of gas injectors.