RU2464106C1 - Method of producing metal high-porosity nano-sized coating - Google Patents

Abstract

FIELD: process engineering.

SUBSTANCE: invention relates to production of thin-film materials based on systems of double oxides used in evolutive electronic and illumination industries, production of catalyst materials, etc. Proposed method comprises preparing film-forming solution and applying it on article surface, drying, annealing and cooling. Fresh prepared solution is held for 8-13 days at 6-8°C, dried at 60°C for 30-40 minutes with subsequent nonlinear heating to 800-900°C in air. During first 15-20 minutes, heating rate is kept a maximum to make 22°C/min, then, during 17 minutes it is maintained at the level of 18°C/min. Then, during 12 minutes heating rate makes 12°C/min, during last 40-20 minutes it is kept equal to 0.5°C/min and holding at 800-900°C for one hour. Then, gradual cooling in natural chilling of muffle kiln is performed at the following composition of components: tetraethoxysilane, hydrochloric acid, distilled water, metal salt CoCl₂·6H₂O and ethanol.

EFFECT: new technology.

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Description

The invention relates to a technology for producing thin-film materials based on double oxide systems used in the rapidly developing fields of electronic engineering and the lighting industry, the production of catalyst materials, as functionally sensitive, decorative, filtering and redistributing radiation coatings.

A known method for producing a bactericidal oxide coating (RF Patent No. 2395548, C09D 5/14 publ. 07/27/2010), comprising preparing an acidic film-forming solution (POR), applying a film to the surface of a solid inorganic material, drying the coated material, heat treatment at temperatures above decomposition temperature of metal salts, but below the melting or softening temperature of solid inorganic material. The disadvantages of this method are the special selection of solvents in order to prevent the applied layer from dripping off the substrate, thorough cleaning of the air or gas used for atomization, the need to maintain a certain size and shape of the sprayed solution jet, as well as sophisticated equipment. In addition, in the described method for producing films, organic additives are used to improve the wettability of the surface of the coated material, and metal oxides: silicon, iron, titanium, lanthanum are used as binding components, which significantly complicates the composition of the synthesized materials and affects the properties of the obtained films. To achieve the desired pH of the film-forming solution in this method, acid treatment of natural or synthetic oxides or carbonates of magnesium, calcium or zinc is used, which does not allow precise control of the acid content in the solution and technologically complicates the process.

A known method of producing a gas-sensitive material from a film-forming solution (RF Patent No. 2310833, G01N 27/12, 11/20/2007), comprising preparing a reaction solution using tetraethoxysilane and silver nitrate, applying a film by centrifugation, drying the samples and heat treatment at 370-750 ° C. The disadvantages of this method are the absence in POR of a controlled amount of water and acid involved in the hydrolysis of tetraethoxysilane and significantly reducing the ripening time of solutions, as well as the absence of alcohol, which contributes to a uniform distribution of components in the solution and free diffusion of ions and molecules in the volume.

A known method of preparing film-forming solutions used to obtain thin-film coatings (Hernandez-Torres J. Optical properties of sol-gel Si02 films containing nickel / J. Hernandez-Torres, Mendoza-Galvan // Thin Solid Films. - 2005. - V.472 . - P.130-135.), Selected as a prototype. The method includes the preparation of POR to obtain SiO ₂ -NiO films based on tetraethoxysilane, ethyl alcohol, water with a molar ratio of components: tetraethoxysilane / alcohol / water = 1/4 / 11.7. The amount of nickel nitrate hexahydrate was varied to obtain films with an atomic ratio of Si / Ni: 1.2; 3.1; 7.1. Films were obtained on glass and quartz substrates by drawing at a speed of 20 cm / min. All samples were air dried at 180 ° C for 30 minutes. Subsequent heat treatment was carried out at 300 and 500 ° C for 30 minutes.

The disadvantages of this method are:

1) the absence of acid in the film-forming solution, which is a catalyst for the hydrolysis and condensation of tetraethoxysilane, which affects the ripening time of the solutions and the porosity of the films:

2) attention is not focused on the degree of desiccation of ethanol, which is an important parameter affecting the rheological properties of solutions;

3) upon receipt of the films by drawing, it is difficult to obtain coatings uniform in thickness, which is associated with both the rheological features of the film-forming solutions - solutions with higher concentration and viscosity can be gradually enriched with the solute in the immersion zone, leading to the coating thickness increasing from top to bottom when removing the sample, and with the features of fixing the substrate - the angle of inclination of the coated plane to the liquid level should be equal to 90 °. The objective of the present invention is to develop a simpler method of obtaining uniform in thickness highly porous nanosized coatings in order to obtain a developed surface, higher reflectance values (90-110%) in the visible wavelength range and transmittance of near-ultraviolet radiation (60-90%) s a simultaneous combination of low values of the refractive index (1.39-1.4) and thickness (170-283 nm), which will allow them to be used as redistributing radiation coatings.

The problem is solved in that the method of producing a highly porous nanosized coating involves preparing a film-forming solution, followed by applying it to the surface of the product, drying, annealing and cooling, but unlike the prototype, a freshly prepared film-forming solution is kept for 8-13 days at a temperature of 6-8 ° C, drying is carried out at a temperature of 60 ° C for 30-40 minutes, followed by non-linear heating to 800-900 ° C in an atmosphere of air - in the first 15-20 minutes, the heating rate is maximum and is 22 ° C / in, in the next 17 minutes, the heating rate is maintained at 18 ° C / min, then for 12 minutes the heating rate is 12 ° C / min, for the last 40-20 minutes of heating, the heating rate is maintained at 0.5 ° C / min - and exposure at 800-900 ° C for 1 hour, gradual cooling under conditions of natural cooling of the muffle furnace. To obtain a highly porous nanosized coating used film-forming solutions prepared in the following ratio of components, wt.%:

tetraethoxysilane 22.4-21.5;

hydrochloric acid 4.4 · 10 ^-4 -1.2 · 10 ^-4 ;

distilled water 3.1-0;

metal salt of CoCl ₂ · 6H ₂ O 1-7.8;

ethyl alcohol (98 vol.%) - the rest.

The presence of a large phase interface due to the formation of pores in nanostructured films allows one to substantially change their properties, both by modifying the nanostructure and by doping with various elements and filling the pores with other compositions, which makes it possible to control target functionally sensitive properties that are closely related to technological parameters synthesis.

The hydrolysis of tetraethoxysilane (TEOS) is exothermic. With the creation of appropriate conditions for heat removal from the system, it is possible to control the crosslinking of siloxanes by the products of TEOS hydrolysis in the first minutes of solution maturation, thereby determining the structure and properties of the synthesized films.

The addition of a d-metal salt in POR leads to an increase in the ionic strength of the solution, which contributes to a change in the solvation shell of the reacting fragments and a decrease in the energy of reorganization of the medium, and, accordingly, to a decrease in the activation energy of ongoing processes. The hydrolysis rate of TEOS in such systems depends on the lability of metal aquacomplexes and their stability.

During the first days of solution maturation, the processes of hydrolysis and condensation of hydroxyl derivatives of tetraethoxysilane actively occur, as a result of which molecularly connected single formations with constantly increasing sizes appear. In the second and third steps, the process of hydrolysis of TEOS in film-forming solutions containing metal salts proceeds much faster, which is explained by the steric factor, the violation of the symmetry of the molecules of the hydroxy derivatives of the tetraether and the participation of metal hydroxocomplexes in the processes of substitution of ethoxy groups for -OH groups.

As a result, solutions containing cobalt (II) ions already after 10 minutes of maturation contain a high concentration of di- and trihydroxo derivatives of tetraethoxysilane, which contributes not only to an increase in the concentration of the corresponding condensation products, but also to crosslinking of the siloxane chains, leading to the early formation of the network structure of the growing polymer , increase the viscosity of the solution and the concentration of free water.

Maturation of film-forming solutions at a temperature of 6-8 ° C increases the degree of hydrolysis of tetraethoxysilane, leading to the early formation of the network structure of a growing polymer matrix. The high heating rate of the coatings in the first minutes of annealing leads to pore formation due to boiling of water evenly distributed in the film. The stretching and deformation vibrations of Н – О – Н bonds are recorded in the IR spectra of films up to 300 ° С. A gradual decrease in the heating rate contributes to the deep occurrence of oxidation processes of metal hydroxychlorides and the formation of oxides.

The aging of the films at a temperature of 800-900 ° C for one hour leads to the completion of the processes and an increase in the degree of crystallinity of the obtained samples. Uniform cooling contributes to the formation of stable film structures.

As a result, the obtained porous coatings (Fig. 1) are characterized by high values of the reflection coefficient (90-110%) in the visible wavelength range and the transmittance of near-ultraviolet radiation (60-90%) with a simultaneous combination of low values of the refractive index (1.39 -1.4) and thickness (170-283 nm). The porosity of the films is 28-40%, the pore size is from 200 nm to 850 nm.

Example 1

To prepare 100 ml of a film-forming solution, it is necessary to combine 2.6 ml of distilled water (3.1 wt.%), 0.06 ml of a solution of hydrochloric acid with a concentration of 2 mol / l (4.4 · 10 ^-4 wt.%), 0 , 84 g of salt of CoCl ₂ · 6H ₂ O (1 wt.%) And bring to a volume of 80 ml with ethyl alcohol (98 vol.%). The resulting homogeneous solution is cooled to 6-8 ° C. At the final stage of the preparation, POR is poured into a prepared solution of 20 ml (22.4 wt.%) Tetraethoxysilane pre-cooled to 6-8 ° C. After the solution has matured for 8 days at a temperature of 6-8 ° C, POR is applied to the silicon substrate by centrifugation and subjected to stepwise heat treatment: at a temperature of 60 ° C for 30-40 minutes, followed by non-linear heating to 800 ° C in an air atmosphere - in the first 15 minutes the heating rate is maximum and is 22 ° C / min, in the next 17 minutes the heating rate is maintained at 18 ° C / min, then for 12 minutes the heating rate is 12 ° C / min, the last 40 minutes of heating the heating rate maintain at a level of 0.5 ° C / m n - and holding at 800 ° C for 1 hour gradual cooling under natural cooling muffle furnace. This results in a thin film coating of 5 wt.% Co ₃ O ₄ , 95 wt.% SiO ₂ with a thickness of 170 nm, a refractive index of 1.4. The porosity of the film is 28%, the pore size is 200-600 nm.

Example 2

To prepare 100 ml of a film-forming solution, it is necessary to combine 0.06 ml of a solution of hydrochloric acid with a concentration of 2 mol / L (1.2 · 10 ^-4 wt.%), 6.79 g of CoCl ₂ · 6H ₂ O salt (7.8 wt. .%) and bring to a volume of 80 ml with ethyl alcohol (98 vol.%). The resulting homogeneous solution is cooled to 6-8 ° C. At the final stage of the preparation, POR is poured into a prepared solution of 20 ml (21.5 wt.%) Tetraethoxysilane pre-cooled to 6-8 ° C. After the solution has matured for 13 days at a temperature of 6-8 ° C, POR is applied to the silicon substrate by centrifugation and subjected to stepwise heat treatment: at a temperature of 60 ° C for 30-40 minutes, followed by non-linear heating to 900 ° C in an air atmosphere - in the first 20 minutes, the heating rate is maximum and is 22 ° C / min, in the next 17 minutes the heating rate is maintained at 18 ° C / min, then for 12 minutes the heating rate is 12 ° C / min, the last 20 minutes of heating the heating rate maintain at a level of 0.5 ° C / m in - and exposure at 900 ° C for 1 hour, gradual cooling under conditions of natural cooling of the muffle furnace. This results in a thin film coating of 30 wt.% Co ₃ O ₄ , 70 wt.% SiO ₂ with a thickness of 283 nm and a refractive index of 1.39. The film porosity is 40%, pore size 250-850 nm.

Unlike the prototype, the described method monitors the processes of hydrolysis and condensation of tetraethoxysilane in a film-forming solution by introducing the required amount of acid and water, which allows to expand the time domain of suitability of film-forming solutions for applying uniform coatings. Appropriate synthesis conditions make it possible to control surface morphology. In addition, films are applied in a simpler way.

The coatings obtained by the described method are characterized by a highly developed porous structure, high reflectance in the visible spectrum and transmittance of near-ultraviolet radiation with a simultaneous combination of low refractive index and thickness, which opens up the possibility of using films in the production of catalyst materials as function-sensitive decorative, filtering and redistributing radiation coatings.

Claims (1)

A method of obtaining a highly porous nanosized coating, comprising preparing a film-forming solution, followed by applying it to the surface of the product, drying, annealing and cooling, characterized in that the freshly prepared film-forming solution is kept for 8-13 days at a temperature of 6-8 ° C, drying is carried out at a temperature 60 ° C for 30-40 minutes, followed by non-linear heating to 800-900 ° C in the atmosphere of air in the first 15-20 minutes, the heating rate is maximum and is 22 ° C / min, in the next 17 minutes the heating rate is supported live at a level of 18 ° C / min, then for 12 minutes the heating rate is 12 ° C / min, the last 40-20 minutes the heating rate is maintained at 0.5 ° C / min and holding at 800-900 ° C for 1 h, gradual cooling under conditions of natural cooling of the muffle furnace in the following ratio of components in a film-forming solution, wt.%:
tetraethoxysilane 22.4-21.5 hydrochloric acid 4.4 · 10 ^-4 -1.2 · 10 ^-4 distilled water 3.1-0 metal salt of CoCl ₂ · 6H ₂ O 1-7.8 ethyl alcohol 98 vol.% rest