RU2219529C1 - Device testing orientation of shear plane of monocrystalline wafer - Google Patents

Device testing orientation of shear plane of monocrystalline wafer Download PDF

Info

Publication number
RU2219529C1
RU2219529C1 RU2002109718A RU2002109718A RU2219529C1 RU 2219529 C1 RU2219529 C1 RU 2219529C1 RU 2002109718 A RU2002109718 A RU 2002109718A RU 2002109718 A RU2002109718 A RU 2002109718A RU 2219529 C1 RU2219529 C1 RU 2219529C1
Authority
RU
Russia
Prior art keywords
holder
monocrystalline wafer
ray tube
monocrystalline
tested
Prior art date
Application number
RU2002109718A
Other languages
Russian (ru)
Other versions
RU2002109718A (en
Inventor
М.А. Кумахов
Н.С. Ибраимов
С.В. Никитина
Е.В. Лихушина
А.Д. Звонков
Original Assignee
Общество с ограниченной ответственностью "Институт рентгеновской оптики"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Общество с ограниченной ответственностью "Институт рентгеновской оптики" filed Critical Общество с ограниченной ответственностью "Институт рентгеновской оптики"
Priority to RU2002109718A priority Critical patent/RU2219529C1/en
Application granted granted Critical
Publication of RU2219529C1 publication Critical patent/RU2219529C1/en
Publication of RU2002109718A publication Critical patent/RU2002109718A/en

Links

Images

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

FIELD: manufacture of active solid substrates and piezoelectric resonators. SUBSTANCE: device intended for control over orientation of shear plane of monocrystalline wafers while manufacturing active solid substrates and piezoelectric resonators has X-ray tube, focusing X-ray lens, holder of tested monocrystalline wafer, position-sensitive detector and means to process and to analyze output signals of detector. The latter is mounted for recording of radiation diffracted on tested monocrystalline wafer. Lens is set between output window of X-ray tube and holder so that its output focus is located on surface of shear of tested monocrystalline wafer or under this surface. EFFECT: raised precision. 1 cl, 6 dwg

Description

Текст описания в факсимильном виде (см. графическую часть)е Description text in facsimile form (see graphic part) e

Claims (2)

1. Устройство для контроля ориентации плоскости среза монокристаллических пластин, содержащее рентгеновскую трубку, держатель контролируемой монокристаллической пластины, позиционно-чувствительный детектор, установленный с возможностью регистрации излучения, дифрагированного на контролируемой монокристаллической пластине, и подключенное к выходу позиционно-чувствительного детектора средство для обработки и анализа, отличающееся тем, что оно снабжено рентгеновской фокусирующей линзой, установленной между выходным окном рентгеновской трубки и держателем контролируемой монокристаллической пластины с возможностью фокусирования излучения рентгеновской трубки на поверхности среза контролируемой монокристаллической пластины или под этой поверхностью.1. A device for controlling the orientation of the cut plane of single-crystal plates, containing an x-ray tube, a holder of a controlled single-crystal plate, a position-sensitive detector mounted to detect radiation diffracted on a controlled single-crystal plate, and means for processing and analysis connected to the output of the position-sensitive detector characterized in that it is provided with an x-ray focusing lens mounted between the output window of the x-ray tube and the holder of a controlled single crystal plate with the ability to focus the radiation of the x-ray tube on the cut surface of a controlled single crystal plate or under this surface. 2. Устройство по п.1, отличающееся тем, что оно выполнено с возможностью регулирования взаимного расположения рентгеновской фокусирующей линзы, держателя контролируемой монокристаллической пластины и позиционно-чувствительного детектора.2. The device according to claim 1, characterized in that it is made with the possibility of regulating the relative position of the x-ray focusing lens, the holder of a monocrystalline wafer and a position-sensitive detector.
RU2002109718A 2002-04-15 2002-04-15 Device testing orientation of shear plane of monocrystalline wafer RU2219529C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU2002109718A RU2219529C1 (en) 2002-04-15 2002-04-15 Device testing orientation of shear plane of monocrystalline wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU2002109718A RU2219529C1 (en) 2002-04-15 2002-04-15 Device testing orientation of shear plane of monocrystalline wafer

Publications (2)

Publication Number Publication Date
RU2219529C1 true RU2219529C1 (en) 2003-12-20
RU2002109718A RU2002109718A (en) 2004-04-20

Family

ID=32066282

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2002109718A RU2219529C1 (en) 2002-04-15 2002-04-15 Device testing orientation of shear plane of monocrystalline wafer

Country Status (1)

Country Link
RU (1) RU2219529C1 (en)

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
СТАСЕВИЧ В.Н. Технология монокристаллов. - М.: Радио и связь, 1990, с.174-177. *

Similar Documents

Publication Publication Date Title
US10406635B2 (en) Wafer producing method and processing feed direction detecting method
US11152246B2 (en) Chuck table and inspection apparatus
US20120292297A1 (en) Laser processing method and laser processing apparatus
JPH08110292A (en) Optical trap system and method thereof
US6833918B2 (en) Light scattering particle size distribution measuring apparatus and method of use
TW201827151A (en) Laser processing apparatus
US3999866A (en) Wafer test system with integrated calibration
KR102232092B1 (en) Processing method of a wafer
RU2219529C1 (en) Device testing orientation of shear plane of monocrystalline wafer
TWI773821B (en) Laser irradiation mechanism
US5199058A (en) X-ray monochromator and spectral measurement apparatus using the x-ray monochromator
TW201913049A (en) Laser beam splitter unit and laser processing device
JPH09229879A (en) X-ray apparatus
EP0241061A2 (en) Device for the measurement of the orientation of bulky monocrystalline materials using the Laue method
CN113945591A (en) Half-peak-width automatic test tool
US4002410A (en) Apparatus and method for orienting monocrystalline material for sawing
JP5090449B2 (en) Terahertz band device element and method for manufacturing terahertz band device element
JP2000074648A (en) Surface evaluating device for substrate
JPH06122119A (en) Seed rod cutting method
JPH0347730B2 (en)
JP3711265B2 (en) Position displacement mechanism
RU2002109718A (en) DEVICE FOR CONTROL OF ORIENTATION OF A PLANE OF A CUT OF MONOCRYSTAL PLATES
JP2001099753A (en) Method and device for evaluating optical element laser durability and exposing device
JPS60166857A (en) Acoustic microscope
JP2616452B2 (en) X-ray diffractometer

Legal Events

Date Code Title Description
PC4A Invention patent assignment

Effective date: 20090812

MM4A The patent is invalid due to non-payment of fees

Effective date: 20140416