RU2010142809A - METHOD FOR PRODUCING HIGH PURITY SYNTHETIC SILICON DIOXIDE - Google Patents
METHOD FOR PRODUCING HIGH PURITY SYNTHETIC SILICON DIOXIDE Download PDFInfo
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- RU2010142809A RU2010142809A RU2010142809/05A RU2010142809A RU2010142809A RU 2010142809 A RU2010142809 A RU 2010142809A RU 2010142809/05 A RU2010142809/05 A RU 2010142809/05A RU 2010142809 A RU2010142809 A RU 2010142809A RU 2010142809 A RU2010142809 A RU 2010142809A
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- ammonium
- water
- silicon dioxide
- high purity
- purified
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Abstract
Метод получения синтетического диоксида кремния высокой чистоты, включающий взаимодействие кварцсодержащего сырья с фторидами аммония при нагревании, растворение фторсиликата аммония в воде, обработку раствора аммиачной водой с последующим отделением синтетического диоксида кремния, отличающийся тем, что взаимодействие исходного кварцсодержащего сырья проводят с фторидом, гидродифторидом аммония или их смесью, полученный кремнефторид аммония очищают от примесей металлов сублимационной перегонкой, раствор кремнефторида аммония в воде очищают от примесей неметаллов экстракцией. A method for producing synthetic silica of high purity, including the interaction of quartz-containing raw materials with ammonium fluorides when heated, dissolving ammonium fluorosilicate in water, processing a solution of ammonia water with subsequent separation of synthetic silicon dioxide, characterized in that the interaction of the starting quartz-containing raw materials is carried out with fluoride, ammonium hydrofluoride or with their mixture, the obtained ammonium silicofluoride is purified from metal impurities by sublimation distillation, a solution of ammonium silicofluoride in water is purified from impurities of non-metals by extraction.
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RU2010142809/05A RU2458006C2 (en) | 2010-10-19 | 2010-10-19 | Method of producing high-purity synthetic silicon dioxide |
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RU2010142809/05A RU2458006C2 (en) | 2010-10-19 | 2010-10-19 | Method of producing high-purity synthetic silicon dioxide |
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RU2010142809A true RU2010142809A (en) | 2012-04-27 |
RU2458006C2 RU2458006C2 (en) | 2012-08-10 |
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RU2010142809/05A RU2458006C2 (en) | 2010-10-19 | 2010-10-19 | Method of producing high-purity synthetic silicon dioxide |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107686114A (en) * | 2017-08-16 | 2018-02-13 | 张旭 | The apparatus and method for preparing white carbon or high-purity silicon dioxide |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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RU2747934C1 (en) * | 2020-10-15 | 2021-05-17 | федеральное государственное автономное образовательное учреждение высшего образования «Национальный исследовательский Томский политехнический университет» | Method for producing synthetic silicon dioxide of high purity |
WO2022124923A1 (en) | 2020-12-10 | 2022-06-16 | Замир Исакович БЕКБОЕВ | Method for producing ultra-high purity amorphous silicon dioxide |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1859998A (en) * | 1927-12-23 | 1932-05-24 | Clay Reduction Company | Hydrated silica |
US5266289A (en) * | 1989-11-16 | 1993-11-30 | Nissan Chemical Industries Ltd. | Process for producing high-purity silica by reacting crude silica with ammonium fluoride |
RU2097321C1 (en) * | 1996-02-20 | 1997-11-27 | Институт химии Дальневосточного отделения РАН | Method for producing ammonium hexafluorosilicate |
RU2357925C1 (en) * | 2007-12-07 | 2009-06-10 | Государственное образовательное учреждение высшего профессионального образования Томский политехнический университет | Silicon dioxide process |
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2010
- 2010-10-19 RU RU2010142809/05A patent/RU2458006C2/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107686114A (en) * | 2017-08-16 | 2018-02-13 | 张旭 | The apparatus and method for preparing white carbon or high-purity silicon dioxide |
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RU2458006C2 (en) | 2012-08-10 |
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MM4A | The patent is invalid due to non-payment of fees |
Effective date: 20121020 |