RU2002127839A - DEVICE FOR MICROWAVE VACUUM-PLASMA WITH ELECTRON-CYCLOTRON SURFACE PROCESSING RESONANCE - Google Patents

DEVICE FOR MICROWAVE VACUUM-PLASMA WITH ELECTRON-CYCLOTRON SURFACE PROCESSING RESONANCE

Info

Publication number
RU2002127839A
RU2002127839A RU2002127839/15A RU2002127839A RU2002127839A RU 2002127839 A RU2002127839 A RU 2002127839A RU 2002127839/15 A RU2002127839/15 A RU 2002127839/15A RU 2002127839 A RU2002127839 A RU 2002127839A RU 2002127839 A RU2002127839 A RU 2002127839A
Authority
RU
Russia
Prior art keywords
plasma
microwave
magnetic
electron
resonator
Prior art date
Application number
RU2002127839/15A
Other languages
Russian (ru)
Other versions
RU2223570C1 (en
Inventor
Валерий Викторович Кошкин
Original Assignee
Валерий Викторович Кошкин
Filing date
Publication date
Application filed by Валерий Викторович Кошкин filed Critical Валерий Викторович Кошкин
Priority to RU2002127839/15A priority Critical patent/RU2223570C1/en
Priority claimed from RU2002127839/15A external-priority patent/RU2223570C1/en
Priority to PCT/RU2003/000425 priority patent/WO2004039132A2/en
Application granted granted Critical
Publication of RU2223570C1 publication Critical patent/RU2223570C1/en
Publication of RU2002127839A publication Critical patent/RU2002127839A/en

Links

Claims (2)

1. Устройство для микроволновой вакуумно-плазменной с электрон-циклотронным резонансом обработки поверхности твердого тела, включающее микроволновой генератор, вакуумную камеру, резонатор, устройство создающие магнитное поле, отличающееся тем, что открытый низкодобротный СВЧ резонатор, выполненный в виде усеченного конуса, автоматически согласует импедансы плазмы-нагрузки и СВЧ генератора, формирует рабочую моду Е010 и направляет излучение СВЧ в область плазмообразования.1. A device for microwave vacuum plasma with electron-cyclotron resonance processing of a solid surface, including a microwave generator, a vacuum chamber, a resonator, a device that creates a magnetic field, characterized in that the open low-Q microwave resonator made in the form of a truncated cone automatically matches the impedances plasma-load and microwave generator, forms the operating mode E 010 and directs the microwave radiation in the region of plasma formation. 2. Устройство по п.1, отличающееся тем, что для создания направленного потока ионов высокой плотности на обрабатываемую поверхность используется магнитная система, магнитные полюса которой разной полярности, замкнутые магнитопроводом с наружной стороны реактора, создают магнитное поле внутри реактора, контур силовых линий которого формируется за счет незамкнутых полюсов магнитной системы, причем используется только нижняя составляющая магнитного поля образованного верхним кольцом магнитов прилегающих к резонатору.2. The device according to claim 1, characterized in that to create a directed flow of high-density ions onto the surface to be treated, a magnetic system is used, the magnetic poles of which are of different polarity, closed by a magnetic circuit on the outside of the reactor, create a magnetic field inside the reactor, the line of force lines of which is formed due to the open poles of the magnetic system, and only the lower component of the magnetic field formed by the upper ring of magnets adjacent to the resonator is used.
RU2002127839/15A 2002-10-18 2002-10-18 Device for microwave vacuum-plasma surface treatment with electron cyclotron resonance RU2223570C1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
RU2002127839/15A RU2223570C1 (en) 2002-10-18 2002-10-18 Device for microwave vacuum-plasma surface treatment with electron cyclotron resonance
PCT/RU2003/000425 WO2004039132A2 (en) 2002-10-18 2003-10-01 Method for surface processing by means of a microwave vacuum-plasma associated with electron-cyclotron resonance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU2002127839/15A RU2223570C1 (en) 2002-10-18 2002-10-18 Device for microwave vacuum-plasma surface treatment with electron cyclotron resonance

Publications (2)

Publication Number Publication Date
RU2223570C1 RU2223570C1 (en) 2004-02-10
RU2002127839A true RU2002127839A (en) 2004-04-20

Family

ID=32173370

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2002127839/15A RU2223570C1 (en) 2002-10-18 2002-10-18 Device for microwave vacuum-plasma surface treatment with electron cyclotron resonance

Country Status (2)

Country Link
RU (1) RU2223570C1 (en)
WO (1) WO2004039132A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9136794B2 (en) 2011-06-22 2015-09-15 Research Triangle Institute, International Bipolar microelectronic device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0216731A (en) * 1988-07-05 1990-01-19 Mitsubishi Electric Corp Plasma reactor
RU2106716C1 (en) * 1992-04-27 1998-03-10 Равиль Кяшшафович Яфаров Plant for microwave vacuum-plasma treatment of condensed media
JPH06224154A (en) * 1993-01-25 1994-08-12 Mitsubishi Electric Corp Plasma processing apparatus
RU2120681C1 (en) * 1996-04-16 1998-10-20 Равиль Кяшшафович Яфаров Electron-cyclone resonance tuned device for microwave vacuum-plasma treatment of condensed media

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