RU2001121681A - DEVICE FOR ELEMENT ANALYSIS BY SPECTROMETRY OF OPTICAL EMISSION ON A PLASMA OBTAINED WITH THE USE OF A LASER - Google Patents

DEVICE FOR ELEMENT ANALYSIS BY SPECTROMETRY OF OPTICAL EMISSION ON A PLASMA OBTAINED WITH THE USE OF A LASER

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Publication number
RU2001121681A
RU2001121681A RU2001121681/28A RU2001121681A RU2001121681A RU 2001121681 A RU2001121681 A RU 2001121681A RU 2001121681/28 A RU2001121681/28 A RU 2001121681/28A RU 2001121681 A RU2001121681 A RU 2001121681A RU 2001121681 A RU2001121681 A RU 2001121681A
Authority
RU
Russia
Prior art keywords
optical means
diaphragm
laser
laser beam
image
Prior art date
Application number
RU2001121681/28A
Other languages
Russian (ru)
Other versions
RU2249813C2 (en
Inventor
Жан-Люк ЛАКУР
Жан-Франсуа ВАГНЕР
Винсент ДЕТАЛЛЬ
Патрик МОШЬЕН
Original Assignee
Коммиссариат А Л'Энержи Атомик
Компани Женераль де Матьер Нюклеэр
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority claimed from FR9913717A external-priority patent/FR2800466B1/en
Application filed by Коммиссариат А Л'Энержи Атомик, Компани Женераль де Матьер Нюклеэр filed Critical Коммиссариат А Л'Энержи Атомик
Publication of RU2001121681A publication Critical patent/RU2001121681A/en
Application granted granted Critical
Publication of RU2249813C2 publication Critical patent/RU2249813C2/en

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Claims (10)

1. Устройство для элементного анализа путем спектрометрии оптической эмиссии плазмы, производимой с помощью лазера, отличающееся тем, что оно содержит1. Device for elemental analysis by spectrometry of optical plasma emission produced by a laser, characterized in that it contains импульсный лазерный источник (6);pulsed laser source (6); диафрагму (8), используемую для выбора части луча лазера, излучаемого источником, и возможного ограничения формы воздействия луча лазера на объект (2), подвергаемый анализу, этот луч лазера не фокусируется в плоскости диафрагмы;the diaphragm (8) used to select a portion of the laser beam emitted by the source and the possible limitation of the shape of the laser beam on the object (2) being analyzed, this laser beam does not focus in the plane of the diaphragm; первое оптическое средство (10), способное проецировать изображение диафрагмы в бесконечность;the first optical means (10) capable of projecting the image of the diaphragm to infinity; второе оптическое средство (12) сконструированное для приема изображения диафрагмы, спроецированного в бесконечность с помощью первого оптического средства и фокусирующее его на объект, анализ которого производится, для получения плазмы (28) на поверхности этого объекта, причем узел, сформированный из диафрагмы и первого и второго оптических средств, также удовлетворяет следующим условиям:the second optical means (12) designed to receive an image of a diaphragm projected to infinity using the first optical means and focusing it on the object being analyzed to obtain plasma (28) on the surface of this object, the assembly formed from the diaphragm and the first and the second optical means also satisfies the following conditions: изображение диафрагмы, сфокусированное на объект, равно требуемым на этом объекте размерам;the image of the aperture focused on the object is equal to the size required on this object; точка фокуса луча лазера после прохождения через диафрагму и первое и второе оптические средства, находится за пределами плоскости изображения диафрагмы;the focal point of the laser beam after passing through the diaphragm and the first and second optical means is located outside the plane of the image of the diaphragm; средство (16, 18) анализа спектра излучения света, излучаемого плазмой; иmeans (16, 18) for analyzing the emission spectrum of light emitted by the plasma; and средство (20) определения элементного состава объекта, на основе результатов этого спектрального анализа.means (20) for determining the elemental composition of the object, based on the results of this spectral analysis. 2. Устройство по п.1, в котором второе оптическое средство (12) имеет цифровую апертуру, равную приблизительно 0,1 или больше.2. The device according to claim 1, in which the second optical means (12) has a digital aperture equal to approximately 0.1 or more. 3. Устройство по любому из пп.1 или 2, в котором размер воздействия луча лазера на объект больше или равен 1 мкм.3. The device according to any one of claims 1 or 2, in which the size of the laser beam on the object is greater than or equal to 1 μm. 4. Устройство по любому из пп.1-3, в котором частота смещения объекта (2) между двумя импульсами лазера источника (6) выбирается большей или равной 15 Гц.4. The device according to any one of claims 1 to 3, in which the displacement frequency of the object (2) between two pulses of the source laser (6) is selected to be greater than or equal to 15 Hz. 5. Устройство по любому из пп.1-4, в котором источник (6) позволяет излучать ультрафиолетовый свет.5. The device according to any one of claims 1 to 4, in which the source (6) allows you to emit ultraviolet light. 6. Устройство по любому из пп.1-5, в котором относительная вариация энергии между одним лазерным импульсом и следующим импульсом не превышает 5%.6. The device according to any one of claims 1 to 5, in which the relative variation in energy between one laser pulse and the next pulse does not exceed 5%. 7. Устройство по любому из пп.1-6, в котором диафрагма (8) имеет круглое отверстие, которое позволяет выбирать центральную часть выходного лазерного луча из лазерного источника, причем первое оптическое средство представляет собой преломляющее оптическое средство, и второе оптическое средство представляет собой преломляющее оптическое средство, содержащее микроскопный объектив (12).7. The device according to any one of claims 1 to 6, in which the diaphragm (8) has a circular hole that allows you to select the Central part of the output laser beam from a laser source, the first optical means is a refractive optical means, and the second optical means is a refractive optical device containing a microscopic lens (12). 8. Устройство по п.7, в котором первое и второе оптические средства (10, 12) проходят обработку для создания противоотражающих свойств на длине волны света, излучаемого источником (6) лазера.8. The device according to claim 7, in which the first and second optical means (10, 12) are processed to create antireflection properties at the wavelength of the light emitted from the laser source (6). 9. Устройство по любому из пп.1-8, дополнительно содержащее средство (38) выдувания газовой струи на объект (2).9. The device according to any one of claims 1 to 8, further comprising means (38) for blowing the gas jet onto the object (2). 10. Устройство по любому из пп.1-9, дополнительно содержащее10. The device according to any one of claims 1 to 9, further comprising средство (32) наблюдения объекта, с помощью которого объект может помещаться в плоскости изображения диафрагмы;means (32) for observing the object, with which the object can be placed in the image plane of the diaphragm; иand зеркало (26), отражающее на длине волны источника лазера, и являющееся прозрачным на других длинах волн, причем это зеркало помещается на пути света между первым и вторым оптическим средством и сконструировано так, что оно отражает почти весь лазерный луч на второе оптическое средство и передает изображение объекта на средство наблюдения.a mirror (26) reflecting at the wavelength of the laser source and being transparent at other wavelengths, this mirror being placed in the path of light between the first and second optical means and designed so that it reflects almost the entire laser beam to the second optical means and transmits image of an object on a surveillance tool.
RU2001121681/28A 1999-11-03 2000-11-02 Device for taking elementary analysis by means of spectrometry of optical emission on laser-generated plasma RU2249813C2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9913717A FR2800466B1 (en) 1999-11-03 1999-11-03 ELEMENT ANALYSIS DEVICE BY OPTICAL EMISSION SPECTROMETRY ON LASER-PRODUCED PLASMA
FR99/13717 1999-11-03

Publications (2)

Publication Number Publication Date
RU2001121681A true RU2001121681A (en) 2003-07-20
RU2249813C2 RU2249813C2 (en) 2005-04-10

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RU2001121681/28A RU2249813C2 (en) 1999-11-03 2000-11-02 Device for taking elementary analysis by means of spectrometry of optical emission on laser-generated plasma

Country Status (9)

Country Link
US (1) US7106439B2 (en)
EP (1) EP1147403B1 (en)
JP (1) JP3914052B2 (en)
CA (1) CA2359010C (en)
DE (1) DE60042397D1 (en)
ES (1) ES2327813T3 (en)
FR (1) FR2800466B1 (en)
RU (1) RU2249813C2 (en)
WO (1) WO2001033202A1 (en)

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CN108982072A (en) * 2018-09-07 2018-12-11 中国工程物理研究院上海激光等离子体研究所 A kind of test macro and test method of optical thin film defect laser damage threshold
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