RU2001029C1 - Film-forming solution for glass oxide layer coating - Google Patents

Abstract

Use: for decorative coatings on glass. SUMMARY OF THE INVENTION The film-forming solution has the following composition, wt.%: Basic copper carbonate 4-12; monoethanolamine 15-20; silicon dioxide 0.16-3.1; Surfactant 0.01 - 0.1; water is the rest. Mohs coating hardness 4.5 - 5.0, reflection coefficient 42 - 45% 1 taba

Description

The invention relates to glassmaking. namely, technology for producing decorative glass.

A solution is known for applying oxide coatings to glass by dipping. In this case, solutions of metal salts, for example, acetates, chlorides or nitrates in organic solvents, are used as film-forming solutions.

The main disadvantage of coatings obtained from film-forming solutions prepared on the basis of salts is the low hardness of oxide films, which leads to insufficient abrasion hardness.

The closest technical solution to the proposed one is a solution for producing oxide coatings on glass 2 of the following composition, g / l: CuSOi2-5: HCHO 15-40; Segetova salt 1-5; NaOH DOH 12.9. The hardness of the resulting oxide film is 3-4 on the Mohs scale. film reflectance 10-40%.

The purpose of the invention is to increase the hardness of the coating and the reflection coefficient of glass in the wavelength region of visible light. This goal is achieved in that the film-forming solution has the following composition, wt.

CuCO3 Si (OH) 24-12

SI020.16-3.1

Monoethanolamine 15-20

SAW0.01-0.1

Water Else

In the film-forming solution, copper oxide and silicon dioxide are contained at an atomic state of Si / Cu from 0.025 to 0.5, and the film-forming solution is an aqueous-ethanolamine solution of an ethanolamine complex of copper carbonate-silicate

(Cu (Н2М02М40НзХОН) x (СОу (5Юз) х. Where х 0-0.45, у 0.5 and z 0.25-0.5.

The role of copper oxide in the coating is to obscure the effect associated with increased absorption of electromagnetic radiation in the visible light region. The role of silicon dioxide is to increase the hardness and wear resistance of the coating due to its denser structure, which is associated with a decrease in the high-temperature internal friction of copper oxide when silicon dioxide is introduced into it. With an increase in the density of the coating, an increase in the reflection coefficient and an increase in metallic luster are also associated. A ratio below 0.025 does not provide sufficient hardness of the coating, and above 0.5 it leads to a weakening of the dimming effect

The role of ethanolamine in the film-forming solution is, firstly, to stabilize it due to the excessive concentration of the ligand compound, and secondly, to improve the wettability of the glass surface by the solution. A decrease in the total ethanolamine content of the solution below 15% leads to a loss of solution stability, and an increase above 20% leads to an excessive increase in the viscosity of the solution and a decrease in the quality of the coating.

An important feature of the invention is the use of an aqueous film-forming solution. Along with reducing the cost of the solution and greatly simplifying the technology for working with it at all stages of the coating process, this also gives the process such an important advantage as the insensitivity of the coating to water vapor during drying and heat treatment. The solution is non-combustible, and its vapors are not toxic at room temperature due to the very low volatility of ethanolzmin.

To improve the uniformity of the coating, the solution contains 0.01-0.1% by weight of a water-soluble surfactant, preferably non-ionic. The preparation of a film-forming solution involves the mixing of water-ethanolamine solutions of basic copper carbonate and silicon dioxide in the required proportions.

The proposed solution allows to significantly simplify the technology of applying oxide coatings on glass, since due to the absolute stability of the solutions, the processes of their preparation and application can be separated in both spatial, temporal and temporal terms. It may find application in processes for producing flat or embossed flat glass to impart light-shielding or decorative properties to it.

The specific compositions of the film-forming solution and the properties of coated glasses are shown in the table.

Film-forming solutions were applied to the glass surface (previously thoroughly washed with an aqueous solution of synthetic detergent and rinsed with distilled water) by dipping at room temperature. The rate of extraction of glass from the solution was 1-6 cm / min. Then drying was carried out (15 min at 130-180 ° С) and heat treatment (15 min at 500-550 ° С).

The proposed solution (see table) provides high values of hardness of the coating and its reflection coefficient while maintaining light-shielding properties.

(56) Japanese Patent No. 58-6695, CL. C 03 C 17/25, 1983.

U.S. Patent Mr 4170461, cl. 65/00, (C 03 C 17/00). 1979.

Claims (1)

The claims A FILM FORMING SOLUTION FOR OBTAINING AN OXIDE COATING ON GLASS, INCLUDING an inorganic salt of divalent copper and an organic solvent, characterized in that. that the solution additionally contains SI02, surfactant and water, as an inorganic salt of divalent copper CuSiOz Cu (OH) z. organic solvent - monoethanolamine in the following ratio of components, wt.%: CuCO3 Cu (OH4 - 2 Monoethanolamine 15 -20 SI020.16-3.1 Surfactant 0.01 - 0.1 Water Else