PT117332A - PROCESS, REACTOR AND SYSTEM FOR THE SELECTIVE PRODUCTION OF TWO-DIMENSIONAL AUTONOMOUS NANOSTRUCTURES UTILI - Google Patents
PROCESS, REACTOR AND SYSTEM FOR THE SELECTIVE PRODUCTION OF TWO-DIMENSIONAL AUTONOMOUS NANOSTRUCTURES UTILIInfo
- Publication number
- PT117332A PT117332A PT117332A PT11733216A PT117332A PT 117332 A PT117332 A PT 117332A PT 117332 A PT117332 A PT 117332A PT 11733216 A PT11733216 A PT 11733216A PT 117332 A PT117332 A PT 117332A
- Authority
- PT
- Portugal
- Prior art keywords
- reactor
- nanostructures
- zone
- microwaves
- precursors
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
A PRESENTE INVENÇÃO REFERE-SE A UM PROCESSO, REATOR E SISTEMA PARA PRODUZIR NANOESTRUTURAS BIDIMENSIONAIS AUTÓNOMAS, UTILIZANDO UM AMBIENTE DE PLASMA EXCITADO POR MICRO-ONDAS. O PROCESSO BASEIA-SE NA INJEÇÃO DE UMA MISTURA (9) DE GASES E DE PRECURSORES, EM REGIME DE ESCOAMENTO, NUM REATOR. O ESCOAMENTO É SUBMETIDO AO CAMPO ELÉTRICO DE UMA ONDA (5) DE SUPERFÍCIE, EXCITADA MEDIANTE A UTILIZAÇÃO DE POTÊNCIA (7) MICRO-ONDAS QUE É INTRODUZIDA NUM APLICADOR (6) DE CAMPO, GERANDO PLASMAS COM ALTA DENSIDADE (2,3,4) DE ENERGIA, QUE DECOMPÕEM OS PRECURSORES NOS SEUS CONSTITUINTES ATÓMICOS E/OU MOLECULARES. O SISTEMA COMPREENDE UM REATOR DE PLASMA COM UMA ZONA DE LANÇAMENTO DE ONDAS DE SUPERFÍCIE, UMA ZONA TRANSIENTE COM ÁREA DE SECÇÃO TRANSVERSAL PROGRESSIVAMENTE CRESCENTE, E UMA ZONA DE NUCLEAÇÃO. O REATOR DE PLASMA EM CONJUNTO COM UMA FONTE (11) DE RADIAÇÃO INFRAVERMELHA, PROPORCIONAM UM AJUSTE CONTROLADO DOS GRADIENTES ESPACIAIS DA TEMPERATURA E DA VELOCIDADE DE ESCOAMENTO DO GÁS. A MAIORIA DAS AMOSTRAS DE NANOESTRUTURAS BIDIMENSIONAIS OBTIDAS POSSUI UMA ÚNICA CAMADA ATÓMICA DE ESPESSURA, ALÉM DE QUE O PROCESSO E SISTEMA PERMITEM OBTER TAXAS DE PRODUÇÃO DE GRAFENO DA ORDEM DE UM GRAMA POR HORA E SUPERIOR.THE PRESENT INVENTION REFERS TO A PROCESS, REACTOR AND SYSTEM FOR PRODUCING TWO-DIMENSIONAL AUTONOMOUS NANOSTRUCTURES USING A PLASMA ENVIRONMENT EXCITED BY MICROWAVES. THE PROCESS IS BASED ON THE INJECTION OF A MIXTURE (9) OF GASES AND PRECURSORS, IN A FLOW SYSTEM, IN A REACTOR. THE DRAINAGE IS SUBMITTED TO THE ELECTRIC FIELD OF A SURFACE WAVE (5), EXCITED BY THE USE OF POWER (7) MICROWAVES THAT IS INTRODUCED IN A FIELD APPLICATOR (6), GENERATING PLASMS WITH HIGH DENSITY (2,3,4 ) OF ENERGY, WHICH BREAK THE PRECURSORS INTO THEIR ATOMIC AND/OR MOLECULAR CONSTITUENTS. THE SYSTEM COMPRISES A PLASMA REACTOR WITH A SURFACE WAVE LAUNCH ZONE, A TRANSIENT ZONE WITH A PROGRESSIVELY INCREASING CROSS-SECTION AREA, AND A NUCLEATION ZONE. THE PLASMA REACTOR TOGETHER WITH AN INFRARED RADIATION SOURCE (11) PROVIDES A CONTROLLED ADJUSTMENT OF THE SPATIAL GRADIENTS OF THE GAS TEMPERATURE AND FLOW SPEED. THE MOST OF THE TWO-DIMENSIONAL NANOSTRUCTURE SAMPLES OBTAINED HAS A SINGLE ATOMIC LAYER OF THICKNESS, IN ADDITION TO THAT THE PROCESS AND SYSTEM ALLOW TO OBTAIN GRAPHENE PRODUCTION RATES IN THE ORDER OF ONE GRAM PER HOUR AND ABOVE.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PT117332A PT117332B (en) | 2016-05-13 | 2016-05-13 | REACTOR FOR THE SELECTIVE PRODUCTION OF AUTONOMOUS TWO-DIMENSIONAL NANOSTRUCTURES USING PLASMA TECHNOLOGY |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PT117332A PT117332B (en) | 2016-05-13 | 2016-05-13 | REACTOR FOR THE SELECTIVE PRODUCTION OF AUTONOMOUS TWO-DIMENSIONAL NANOSTRUCTURES USING PLASMA TECHNOLOGY |
Publications (2)
Publication Number | Publication Date |
---|---|
PT117332A true PT117332A (en) | 2021-08-06 |
PT117332B PT117332B (en) | 2022-05-12 |
Family
ID=77554546
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT117332A PT117332B (en) | 2016-05-13 | 2016-05-13 | REACTOR FOR THE SELECTIVE PRODUCTION OF AUTONOMOUS TWO-DIMENSIONAL NANOSTRUCTURES USING PLASMA TECHNOLOGY |
Country Status (1)
Country | Link |
---|---|
PT (1) | PT117332B (en) |
-
2016
- 2016-05-13 PT PT117332A patent/PT117332B/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
PT117332B (en) | 2022-05-12 |
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Legal Events
Date | Code | Title | Description |
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BB1A | Laying open of patent application |
Effective date: 20210803 |
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FG3A | Patent granted, date of granting |
Effective date: 20220509 |