PL86395B1 - - Google Patents

Info

Publication number
PL86395B1
PL86395B1 PL16325773A PL16325773A PL86395B1 PL 86395 B1 PL86395 B1 PL 86395B1 PL 16325773 A PL16325773 A PL 16325773A PL 16325773 A PL16325773 A PL 16325773A PL 86395 B1 PL86395 B1 PL 86395B1
Authority
PL
Poland
Application number
PL16325773A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of PL86395B1 publication Critical patent/PL86395B1/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
PL16325773A 1972-06-12 1973-06-09 PL86395B1 (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD16360672A DD96984A1 (fi) 1972-06-12 1972-06-12

Publications (1)

Publication Number Publication Date
PL86395B1 true PL86395B1 (fi) 1976-05-31

Family

ID=5486942

Family Applications (1)

Application Number Title Priority Date Filing Date
PL16325773A PL86395B1 (fi) 1972-06-12 1973-06-09

Country Status (4)

Country Link
CS (1) CS166979B1 (fi)
DD (1) DD96984A1 (fi)
DE (1) DE2312774A1 (fi)
PL (1) PL86395B1 (fi)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2371524A1 (fr) * 1976-11-18 1978-06-16 Alsthom Atlantique Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma
DE3206421A1 (de) * 1982-02-23 1983-09-01 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von schichten aus hochschmelzenden metallen bzw. metallverbindungen durch abscheidung aus der dampfphase
DE3841730C2 (de) * 1988-12-10 1997-06-19 Widia Gmbh Verfahren zum Beschichten eines metallischen Grundkörpers mit einem nichtleitenden Beschichtungsmaterial

Also Published As

Publication number Publication date
DE2312774A1 (de) 1974-01-03
CS166979B1 (fi) 1976-03-29
DD96984A1 (fi) 1973-04-12

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