PL445503A1 - Photocurable compound and self-healing polymer composition with photocurable compound - Google Patents

Photocurable compound and self-healing polymer composition with photocurable compound

Info

Publication number
PL445503A1
PL445503A1 PL445503A PL44550323A PL445503A1 PL 445503 A1 PL445503 A1 PL 445503A1 PL 445503 A PL445503 A PL 445503A PL 44550323 A PL44550323 A PL 44550323A PL 445503 A1 PL445503 A1 PL 445503A1
Authority
PL
Poland
Prior art keywords
photocurable compound
bis
self
polymer composition
weight
Prior art date
Application number
PL445503A
Other languages
Polish (pl)
Other versions
PL247602B1 (en
Inventor
Paulina Bednarczyk
Original Assignee
Zachodniopomorski Uniwersytet Technologiczny W Szczecinie
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zachodniopomorski Uniwersytet Technologiczny W Szczecinie filed Critical Zachodniopomorski Uniwersytet Technologiczny W Szczecinie
Priority to PL445503A priority Critical patent/PL247602B1/en
Publication of PL445503A1 publication Critical patent/PL445503A1/en
Publication of PL247602B1 publication Critical patent/PL247602B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C07D491/044—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring
    • C07D491/048—Ortho-condensed systems with only one oxygen atom as ring hetero atom in the oxygen-containing ring the oxygen-containing ring being five-membered
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F18/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid
    • C08F18/02—Esters of monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F218/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid
    • C08F218/02—Esters of monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/15—Heterocyclic compounds having oxygen in the ring
    • C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
    • C08K5/1535—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415—Five-membered rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

Przedmiotem zgłoszenia jest fotoutwardzalny składnik o właściwościach samonaprawczych, według wynalazku, który charakteryzuje się tym, że stanowi difunkcyjny monomer akrylanowy z wbudowaną w cząsteczkę podwójną strukturą adduktu Dielsa-Aldera w postaci (1,3-fenylenobis(1,3-diokso-1,2,3,3a,7,7a-heksahydro-4H-4,7-epoksyizoindolo-2,4diylo))bis(metyleno)bis(2-metyloakrylanu), przy czym addukt Dielsa-Aldera otrzymywany jest w reakcji Dielsa-Aldera pomiędzy dienofilem w postaci N,N'-(1,3-fenyleno)dimaleimidu, a dienem w postaci metakrylanu furfurylu. Przedmiotem zgłoszenia jest też kompozycja polimerowa z fotoutwardzalnym składnikiem o właściwościach samonaprawczych, według wynalazku, zawierająca oligomery i monomery akrylanowe oraz fotoinicjator, która charakteryzuje się tym, że składa się z 25% - 65% wagowych oligomerów (met)akrylanowych, 10% - 50% wagowych monomerów (met)akrylanowych, 10% - 50% wagowych difunkcyjnego monomeru akrylanowego z wbudowaną w cząsteczkę podwójną strukturą adduktu Dielsa-Aldera (1,3-fenylenobis(1,3-diokso-1,2,3,3a,7,7a-heksahydro-4H-4,7-epoksyizoindolo-2,4-diylo))bis(metyleno)bis(2-metyloakrylanu), który stanowi fotoutwardzalny związek oraz 1% - 10% wagowych fotoinicjatora rodnikowego. Udział wszystkich składników kompozycji polimerowej wynosi 100%.The subject of the application is a photocurable component with self-healing properties, according to the invention, which is characterized in that it is a difunctional acrylate monomer with a double Diels-Alder adduct structure built into the molecule in the form of (1,3-phenylenebis(1,3-dioxo-1,2,3,3a,7,7a-hexahydro-4H-4,7-epoxyisoindole-2,4diyl))bis(methylene)bis(2-methylacrylate), wherein the Diels-Alder adduct is obtained in a Diels-Alder reaction between a dienophile in the form of N,N'-(1,3-phenylene)dimaleimide and a diene in the form of furfuryl methacrylate. The subject of the application is also a polymer composition with a photocurable component with self-healing properties, according to the invention, containing acrylate oligomers and monomers and a photoinitiator, which is characterized in that it consists of 25% - 65% by weight of (meth)acrylate oligomers, 10% - 50% by weight of (meth)acrylate monomers, 10% - 50% by weight of a difunctional acrylate monomer with a double Diels-Alder adduct structure built into the molecule (1,3-phenylenebis(1,3-dioxo-1,2,3,3a,7,7a-hexahydro-4H-4,7-epoxyisoindole-2,4-diyl))bis(methylene)bis(2-methylacrylate), which is a photocurable compound, and 1% - 10% by weight of a photoinitiator radical. The share of all components of the polymer composition is 100%.

PL445503A 2023-07-06 2023-07-06 Photocurable compound and self-healing polymer composition with photocurable compound PL247602B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL445503A PL247602B1 (en) 2023-07-06 2023-07-06 Photocurable compound and self-healing polymer composition with photocurable compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL445503A PL247602B1 (en) 2023-07-06 2023-07-06 Photocurable compound and self-healing polymer composition with photocurable compound

Publications (2)

Publication Number Publication Date
PL445503A1 true PL445503A1 (en) 2025-01-07
PL247602B1 PL247602B1 (en) 2025-08-04

Family

ID=94174438

Family Applications (1)

Application Number Title Priority Date Filing Date
PL445503A PL247602B1 (en) 2023-07-06 2023-07-06 Photocurable compound and self-healing polymer composition with photocurable compound

Country Status (1)

Country Link
PL (1) PL247602B1 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008056888A (en) * 2006-07-31 2008-03-13 Fujifilm Corp Laser decomposable resin composition and pattern forming material using the same
WO2022038297A1 (en) * 2020-08-21 2022-02-24 Vrije Universiteit Brussel Self-healing polymers

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008056888A (en) * 2006-07-31 2008-03-13 Fujifilm Corp Laser decomposable resin composition and pattern forming material using the same
WO2022038297A1 (en) * 2020-08-21 2022-02-24 Vrije Universiteit Brussel Self-healing polymers

Also Published As

Publication number Publication date
PL247602B1 (en) 2025-08-04

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