PL4327419T3 - Urządzenie superponujące oraz układ optyczny - Google Patents

Urządzenie superponujące oraz układ optyczny

Info

Publication number
PL4327419T3
PL4327419T3 PL22725181.6T PL22725181T PL4327419T3 PL 4327419 T3 PL4327419 T3 PL 4327419T3 PL 22725181 T PL22725181 T PL 22725181T PL 4327419 T3 PL4327419 T3 PL 4327419T3
Authority
PL
Poland
Prior art keywords
optical system
superposition device
superposition
optical
Prior art date
Application number
PL22725181.6T
Other languages
English (en)
Inventor
Malte Kumkar
Original Assignee
TRUMPF Laser- und Systemtechnik SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TRUMPF Laser- und Systemtechnik SE filed Critical TRUMPF Laser- und Systemtechnik SE
Publication of PL4327419T3 publication Critical patent/PL4327419T3/pl

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • G02B27/14—Beam splitting or combining systems operating by reflection only
    • G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/281—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for attenuating light intensity, e.g. comprising rotatable polarising elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/1307—Stabilisation of the phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Lasers (AREA)
PL22725181.6T 2021-04-23 2022-04-22 Urządzenie superponujące oraz układ optyczny PL4327419T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102021204057.8A DE102021204057A1 (de) 2021-04-23 2021-04-23 Überlagerungseinrichtung und optisches System
PCT/EP2022/060657 WO2022223761A1 (de) 2021-04-23 2022-04-22 Überlagerungseinrichtung und optisches system

Publications (1)

Publication Number Publication Date
PL4327419T3 true PL4327419T3 (pl) 2026-03-23

Family

ID=81841783

Family Applications (1)

Application Number Title Priority Date Filing Date
PL22725181.6T PL4327419T3 (pl) 2021-04-23 2022-04-22 Urządzenie superponujące oraz układ optyczny

Country Status (7)

Country Link
US (1) US12585136B2 (pl)
EP (2) EP4327419B1 (pl)
CN (2) CN117178443A (pl)
DE (1) DE102021204057A1 (pl)
LT (1) LT4327419T (pl)
PL (1) PL4327419T3 (pl)
WO (2) WO2022223761A1 (pl)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102021204057A1 (de) 2021-04-23 2022-10-27 Trumpf Laser- Und Systemtechnik Gmbh Überlagerungseinrichtung und optisches System

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US7193765B2 (en) * 2005-03-31 2007-03-20 Evans & Sutherland Computer Corporation Reduction of speckle and interference patterns for laser projectors
DE102005027898A1 (de) * 2005-06-16 2006-12-21 Hitachi Via Mechanics, Ltd., Ebina Vorrichtung zum Umschalten eines Laserstrahls, Laserbearbeitungsvorrichtung
US7336363B2 (en) 2005-10-19 2008-02-26 Northrop Grumman Corporation Interferometric beam combination
US7817688B2 (en) 2008-02-19 2010-10-19 Lockheed Martin Coherent Technologies, Inc. Phase and polarization controlled beam combining devices and methods
US8248700B1 (en) 2008-10-20 2012-08-21 Lockheed Martin Corporation Systems and methods for coherent beam combining of laser arrays
FR2977989B1 (fr) 2011-07-11 2013-10-25 Ecole Polytech Dispositif et procede passif de combinaison coherente d'une pluralite d'amplificateurs optiques
JP5623675B2 (ja) 2011-07-14 2014-11-12 華為技術有限公司Ｈｕａｗｅｉ Ｔｅｃｈｎｏｌｏｇｉｅｓ Ｃｏ．，Ｌｔｄ． 光信号多重化方法および光多重化装置
WO2013039240A1 (ja) 2011-09-16 2013-03-21 株式会社ニコン 照明光学装置、光学系ユニット、照明方法、並びに露光方法及び装置
CN105988222A (zh) 2015-02-16 2016-10-05 青岛海信宽带多媒体技术有限公司 一种合波器
WO2016133707A1 (en) * 2015-02-17 2016-08-25 President And Fellows Of Harvard College Method and system for polarization state generation
DE102016100721B3 (de) * 2016-01-18 2017-03-23 Trumpf Scientific Lasers Gmbh + Co. Kg Relativphasenmessung zum kohärenten Kombinieren von Laserstrahlen
US9835800B2 (en) 2016-03-11 2017-12-05 Huawei Technologies Co., Ltd. Polarization control for a photonic platform
CN106569340A (zh) 2016-10-17 2017-04-19 上海理工大学 光束强度、相位分布和偏振态的调制装置
US9792945B1 (en) 2016-11-07 2017-10-17 Seagate Technology Llc 3D optical memory storage cells
DE102017104392A1 (de) 2017-03-02 2018-09-06 Active Fiber Systems Gmbh Schnelle Modulation von Laserstrahlung hoher Leistung
DE102017203655B4 (de) 2017-03-07 2019-08-22 Robert Bosch Gmbh Verfahren und Vorrichtung zur Formung von Strahlung für die Laserbearbeitung
US20180269648A1 (en) * 2017-03-19 2018-09-20 The Board Of Trustees Of The Leland Stanford Junior University Generation of arbitrary time-space distribution phase-coherent discretized laser beams
US10181336B1 (en) 2017-08-08 2019-01-15 Microsoft Technology Licensing, Llc Multi-beam optical system for fast writing of data on glass
US10236027B1 (en) 2018-02-12 2019-03-19 Microsoft Technology Licensing, Llc Data storage using light of spatially modulated phase and polarization
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DE102021204057A1 (de) 2021-04-23 2022-10-27 Trumpf Laser- Und Systemtechnik Gmbh Überlagerungseinrichtung und optisches System

Also Published As

Publication number Publication date
DE102021204057A1 (de) 2022-10-27
WO2022223780A3 (de) 2022-12-15
EP4327419A1 (de) 2024-02-28
US12585136B2 (en) 2026-03-24
US20240045222A1 (en) 2024-02-08
CN117178442A (zh) 2023-12-05
CN117178443A (zh) 2023-12-05
EP4327419B1 (de) 2025-10-01
WO2022223761A1 (de) 2022-10-27
WO2022223780A2 (de) 2022-10-27
EP4327420A2 (de) 2024-02-28
LT4327419T (lt) 2025-12-10
US20240045223A1 (en) 2024-02-08

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