PL3910662T3 - Zespół magnetronowy - Google Patents

Zespół magnetronowy

Info

Publication number
PL3910662T3
PL3910662T3 PL21163946.3T PL21163946T PL3910662T3 PL 3910662 T3 PL3910662 T3 PL 3910662T3 PL 21163946 T PL21163946 T PL 21163946T PL 3910662 T3 PL3910662 T3 PL 3910662T3
Authority
PL
Poland
Prior art keywords
magnetron assembly
magnetron
assembly
Prior art date
Application number
PL21163946.3T
Other languages
English (en)
Inventor
Steffen Mosshammer
Rolf Rank
Original Assignee
VON ARDENNE Asset GmbH & Co. KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by VON ARDENNE Asset GmbH & Co. KG filed Critical VON ARDENNE Asset GmbH & Co. KG
Publication of PL3910662T3 publication Critical patent/PL3910662T3/pl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3455—Movable magnets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/347—Thickness uniformity of coated layers or desired profile of target erosion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
PL21163946.3T 2020-05-13 2021-03-22 Zespół magnetronowy PL3910662T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102020112979.3A DE102020112979B4 (de) 2020-05-13 2020-05-13 Magnetronanordnung

Publications (1)

Publication Number Publication Date
PL3910662T3 true PL3910662T3 (pl) 2024-02-19

Family

ID=75143509

Family Applications (1)

Application Number Title Priority Date Filing Date
PL21163946.3T PL3910662T3 (pl) 2020-05-13 2021-03-22 Zespół magnetronowy

Country Status (3)

Country Link
EP (1) EP3910662B1 (pl)
DE (1) DE102020112979B4 (pl)
PL (1) PL3910662T3 (pl)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070125303A1 (en) 2005-12-02 2007-06-07 Ward Ruby High-throughput deposition system for oxide thin film growth by reactive coevaportation
US20110155568A1 (en) * 2009-12-29 2011-06-30 Sputtering Components, Inc. Indexing magnet assembly for rotary sputtering cathode
DE102012109424A1 (de) * 2012-10-04 2014-04-10 Von Ardenne Anlagentechnik Gmbh Sputtermagnetron und Verfahren zur dynamischen Magnetfeldbeeinflussung
US9312108B2 (en) 2013-03-01 2016-04-12 Sputtering Components, Inc. Sputtering apparatus
CN106795621B (zh) * 2014-04-28 2020-05-22 零件喷涂公司 磁控管组件和旋转靶阴极组件
DE102014109991A1 (de) 2014-07-16 2016-01-21 Von Ardenne Gmbh Magnetron-Anordnung, Prozessieranordnung, Verfahren und Verwendung einer Magnetron-Anordnung

Also Published As

Publication number Publication date
DE102020112979A1 (de) 2021-11-18
DE102020112979B4 (de) 2021-12-23
EP3910662B1 (de) 2023-08-09
EP3910662A1 (de) 2021-11-17

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