PL286021A1 - Vacuum ion etching process - Google Patents

Vacuum ion etching process

Info

Publication number
PL286021A1
PL286021A1 PL28602190A PL28602190A PL286021A1 PL 286021 A1 PL286021 A1 PL 286021A1 PL 28602190 A PL28602190 A PL 28602190A PL 28602190 A PL28602190 A PL 28602190A PL 286021 A1 PL286021 A1 PL 286021A1
Authority
PL
Poland
Prior art keywords
etching process
ion etching
vacuum ion
vacuum
ion
Prior art date
Application number
PL28602190A
Other versions
PL162543B1 (en
Inventor
Witold Posadowski
Original Assignee
Politechnika Wroclawska
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Politechnika Wroclawska filed Critical Politechnika Wroclawska
Priority to PL28602190A priority Critical patent/PL162543B1/en
Publication of PL286021A1 publication Critical patent/PL286021A1/en
Publication of PL162543B1 publication Critical patent/PL162543B1/en

Links

PL28602190A 1990-07-10 1990-07-10 Vacuum ion etching process PL162543B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL28602190A PL162543B1 (en) 1990-07-10 1990-07-10 Vacuum ion etching process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL28602190A PL162543B1 (en) 1990-07-10 1990-07-10 Vacuum ion etching process

Publications (2)

Publication Number Publication Date
PL286021A1 true PL286021A1 (en) 1992-01-13
PL162543B1 PL162543B1 (en) 1993-12-31

Family

ID=20051732

Family Applications (1)

Application Number Title Priority Date Filing Date
PL28602190A PL162543B1 (en) 1990-07-10 1990-07-10 Vacuum ion etching process

Country Status (1)

Country Link
PL (1) PL162543B1 (en)

Also Published As

Publication number Publication date
PL162543B1 (en) 1993-12-31

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