NZ731581B2 - Photon neutralizers for neutral beam injectors - Google Patents
Photon neutralizers for neutral beam injectors Download PDFInfo
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- NZ731581B2 NZ731581B2 NZ731581A NZ73158115A NZ731581B2 NZ 731581 B2 NZ731581 B2 NZ 731581B2 NZ 731581 A NZ731581 A NZ 731581A NZ 73158115 A NZ73158115 A NZ 73158115A NZ 731581 B2 NZ731581 B2 NZ 731581B2
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- 230000001264 neutralization Effects 0.000 title claims abstract description 39
- 150000002500 ions Chemical class 0.000 claims abstract description 34
- 238000005452 bending Methods 0.000 claims description 4
- 238000009825 accumulation Methods 0.000 abstract description 3
- 230000005591 charge neutralization Effects 0.000 description 11
- 238000006386 neutralization reaction Methods 0.000 description 11
- 239000000203 mixture Substances 0.000 description 7
- 230000004927 fusion Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 210000002381 Plasma Anatomy 0.000 description 5
- 239000000835 fiber Substances 0.000 description 5
- 238000005086 pumping Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 210000004027 cells Anatomy 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical Effects 0.000 description 2
- 230000001007 puffing Effects 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- TVFDJXOCXUVLDH-UHFFFAOYSA-N Cesium Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 201000004073 acute interstitial pneumonia Diseases 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007374 clinical diagnostic method Methods 0.000 description 1
- 230000001419 dependent Effects 0.000 description 1
- YZCKVEUIGOORGS-OUBTZVSYSA-N deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 1
- 229910052805 deuterium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009114 investigational therapy Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000000306 recurrent Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/15—Particle injectors for producing thermonuclear fusion reactions, e.g. pellet injectors
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/14—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using charge exchange devices, e.g. for neutralising or changing the sign of the electrical charges of beams
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
- H05H3/02—Molecular or atomic beam generation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Abstract
non-resonance photo-neutralizer for negative ion-based neutral beam injectors. The non-resonance photo-neutralizer utilizes a nonresonant photon accumulation, wherein the path of a photon becomes tangled and trapped in a certain space region, i.e., the photon trap. The trap is preferably formed by two smooth mirror surfaces facing each other with at least one of the mirrors being concave. In its simplest form, the trap is elliptical. A confinement region is a region near a family of normals, which are common to both mirror surfaces. The photons with a sufficiently small angle of deviation from the nearest common normal are confined. Depending on specific conditions, the shape of the mirror surface may be one of spherical, elliptical, cylindrical, or toroidal geometry, or a combination thereof. two smooth mirror surfaces facing each other with at least one of the mirrors being concave. In its simplest form, the trap is elliptical. A confinement region is a region near a family of normals, which are common to both mirror surfaces. The photons with a sufficiently small angle of deviation from the nearest common normal are confined. Depending on specific conditions, the shape of the mirror surface may be one of spherical, elliptical, cylindrical, or toroidal geometry, or a combination thereof.
Description
PHOTON NEUTRALIZERS FOR NEUTRAL BEAM INJECTORS
FIELD
The subject matter described herein relates generally to neutral beam injectors and, more
particularly, to a photon neutralizer for a neutral beam injector based on negative ions.
BACKGROUND
A traditional approach to produce a neutral beam from a negative ion H-, D- beam for
plasma heating or neutral beam assisted diagnostics, is to neutralize the negative ion beam in a
gas or plasma target for detachment of the excess electrons. However, this approach has a
significant limitation on efficiency. At present, for example, for designed heating injectors with a
1 MeV beam [R.Hemsworth et al., 2009, Nucl. Fusion 49 045006], the neutralization efficiency
in the gas and plasma targets will be about 60% and 85%, respectively [G. I. Dimov et al., 1975,
Nucl. Fusion 15, 551], which considerably affects the overall efficiency of the injectors. In
addition, the application of such neutralizers is associated with complications, including the
deterioration of vacuum conditions due to gas puffing and the appearance of positive ions in the
atomic beam, which can be significant in some applications.
Photodetachment of an electron from high-energy negative ions is an attractive method of
beam neutralization. Such method does not require a gas or plasma puffing into the neutralizer
vessel, it does not produce positive ions, and it assists with beam cleaning of fractions of
impurities due to negative ions. The photodetachment of an electron corresponds to the following
process: H + h ω = H +e. Similar to most negative ions, the H- ion has a single stable state.
Nevertheless, photodetachment is possible from an excited state. The photodetachment cross
section is well known [see, e.g., L.M.Branscomb et al., Phys. Rev. Lett. 98, 1028 (1955)]. The
photodetachment cross section is large enough in a broad photon energy range which practically
overlaps all visible and near IR spectrums.
Such photons cannot knock out an electron from H0 or all electrons from H- and produce
positive ions. This approach was proposed in 1975 by J.H. Fink and A.M. Frank [J.H. Fink et al.,
Photodetachment of electrons from negative ions in a 200 keV deuterium beam source, Lawrence
Livermore Natl. Lab. (1975), UCRL-16844]. Since that time a number of projects for photon
neutralizers have been proposed. As a rule, the photon neutralizer projects have been based on an
optic resonator similar to Fabri-Perot cells. Such an optic resonator needs mirrors with very high
reflectance and a powerful light source with a thin line, and all of the optic elements need to be
tuned very precisely. For example, in a scheme considered by Kovari [M. Kovari et al., Fusion
Engineering and Design 85 (2010) 745–751], the reflectance of the mirrors is required to be not
less than 99.96%, the total laser output power is required to be about 800 kW with output
intensity of about 300W/cm , and the laser bandwidth is required to be less than 100 Hz. It is
unlikely that such parameters could be realized together.
Therefore, it is desirable to provide a non-resonance photo-neutralizer.
In this specification where reference has been made to patent specifications, other
external documents, or other sources of information, this is generally for the purpose of
providing a context for discussing the features of the invention. Unless specifically stated
otherwise, reference to such external documents is not to be construed as an admission that such
documents, or such sources of information, in any jurisdiction, are prior art, or form part of the
common general knowledge in the art.
SUMMARY OF INVENTION
In accordance with a first aspect of the invention, there is provided a non-resonance
photo-neutralizer for neutral beam injectors comprising
first and second mirrors having opposing mirror surfaces, the first and second mirrors being
positioned in spaced relation and extending longitudinally in a first direction, the first mirror
having a central portion and opposing first and second ends spaced apart from the central portion
in the first direction, the first mirror extending in the first direction from the first end along the
central portion to the second end and bending along the first direction toward the second mirror
with the first and second ends of the first mirror being positioned closer to the second mirror than
the central portion of the first mirror,
wherein the mirror surface of the first mirror is concave in a second direction transverse to the
first direction.
In accordance with a second aspect of the invention, there is provided a negative ion
based neutral beam injector comprising
a negative ion source, and
a non-resonance photo-neutralizer co-axially positioned with the negative ion source, wherein
the photo-neutralizer including first and second mirrors having opposing mirror surfaces, the first
and second mirrors being positioned in spaced relation and extending longitudinally in a first
direction, the first mirror having a central portion and opposing first and second ends spaced
apart from the central portion in the first direction, the first mirror extending in the first direction
from the first end along the central portion to the second end and bending along the first
direction toward the second mirror with the first and second ends of the first mirror being
positioned closer to the second mirror than the central portion of the first mirror, wherein the
mirror surface of the first mirror is concave in a second direction transverse to the first direction.
Embodiments provided herein are directed to systems and methods for a non-
resonance photo-neutralizer for negative ion-based neutral beam injectors. The non-resonance
photo-neutralizer described herein is based on the principle of nonresonant photon accumulation,
wherein the path of the photon becomes tangled and trapped in a certain space region, i.e., the
photon trap. The trap is preferably formed as two smooth mirror surfaces facing each other with
at least one surface being concave. In the simplest form, the trap is preferably elliptical in shape.
A confinement region of the trap is a region near a family of normals that are common to both
mirror surfaces of the trap. The photons with a sufficiently small angle of deviation from the
nearest common normal are confined. Depending on specific conditions, the shape of the trap
may be one of spherical, elliptical, cylindrical, toroidal, or a combination thereof.
In operation, photon beams with a given angular spread along and across the trap are
injected through one or more small holes in one or more of the mirrors. The photon beams can
be from standard industrial power fiber lasers. The photo neutralizer does not require high
quality laser radiation sources pumping a photon target, nor does it require very high precision
adjustment and alignment of the optic elements
Other systems, methods, features and advantages of the example embodiments will be or
will become apparent to one with skill in the art upon examination of the following figures and
detailed description.
The term ‘comprising’ as used in this specification and claims means ‘consisting at least
in part of’. When interpreting statements in this specification and claims which include the term
‘comprising’, other features besides the features prefaced by this term in each statement can also
be present. Related terms such as ‘comprise’ and ‘comprised’ are to be interpreted in a similar
manner.
BRIEF DESCRIPTION OF FIGURES
The details of the example embodiments, including structure and operation, may be
gleaned in part by study of the accompanying figures, in which like reference numerals refer to
like parts. The components in the figures are not necessarily to scale, emphasis instead being
placed upon illustrating the principles of the invention. Moreover, all illustrations are intended
to convey concepts, where relative sizes, shapes and other detailed attributes may be illustrated
schematically rather than literally or precisely.
FIGURE 1 is a schematic of a non-resonance photon trap.
FIGURE 2 is a schematic of a quasiplanar adiabatic optical trap.
FIGURE 3 is a perspective view schematic of the quasiplanar adiabatic optical trap
shown in Figure 2.
FIGURE 4 is a trace of a single ray in the photon trap with a random angle from -3° to
° in the XY plane, and -5° to 5° along the trap, the number of reflections is 4000. The cone
angle of end mirrors is about 3°.
FIGURE 5 illustrates an example of the surface intensity distribution and its cross profile
in the middle of the trap.
FIGURE 6 is a chart showing the degree of neutralization (dotted line) and overall
neutralizer efficiency (continuous curve) vs laser injection power.
FIGURE 7 is a plan view of a negative ion-based neutral beam injector layout.
FIGURE 8 is a sectional isometric view of the negative ion-based neutral beam injector
shown in Figure 7.
It should be noted that elements of similar structures or functions are generally
represented by like reference numerals for illustrative purpose throughout the figures. It should
also be noted that the figures are only intended to facilitate the description of the preferred
embodiments.
DETAILED DESCRIPTION
Each of the additional features and teachings disclosed below can be utilized separately
or in conjunction with other features and teachings to provide a non-resonance photo-neutralizer
for negative ion-based neutral beam injectors. Representative examples of the embodiments
described herein, which examples utilize many of these additional features and teachings both
separately and in combination, will now be described in further detail with reference to the
attached drawings. This detailed description is merely intended to teach a person of skill in the
art further details for practicing preferred aspects of the present teachings and is not intended to
limit the scope of the invention. Therefore, combinations of features and steps disclosed in the
following detail description may not be necessary to practice the invention in the broadest sense,
and are instead taught merely to particularly describe representative examples of the present
teachings.
Moreover, the various features of the representative examples and the dependent claims
may be combined in ways that are not specifically and explicitly enumerated in order to provide
additional useful embodiments of the present teachings. In addition, it is expressly noted that all
features disclosed in the description and/or the claims are intended to be disclosed separately and
independently from each other for the purpose of original disclosure, as well as for the purpose
of restricting the claimed subject matter independent of the compositions of the features in the
embodiments and/or the claims. It is also expressly noted that all value ranges or indications of
groups of entities disclose every possible intermediate value or intermediate entity for the
purpose of original disclosure, as well as for the purpose of restricting the claimed subject
matter.
Embodiments provided herein are directed to a new non-resonance photo-neutralizer
for negative ion-based neutral beam injectors. A detailed discussion of a negative ion-based
neutral beam injector is provided in Russian Patent Application No. 2012137795 and PCT
application No. , which are incorporated herein by reference.
The non-resonance photo-neutralizer described herein is based on the principle of
nonresonant photon accumulation, wherein the path of the photon becomes tangled and trapped
in a certain space region, i.e., the photon trap. The trap is preferably formed as two smooth
mirror surfaces facing each other with at least one surface being concave. In the simplest form,
the trap is preferably elliptical in shape. A confinement region of the trap is a region near a
family of normals that are common to both mirror surfaces of the trap. The photons with a
sufficiently small angle of deviation from the nearest common normal are confined. Depending
on specific conditions, the shape of the trap may be one of spherical, elliptical, cylindrical,
toroidal, or a combination thereof.
In operation, photon beams with a given angular spread along and across the trap are
injected through one or more small holes in one or more of the mirrors. The photon beams can
be from standard industrial power fiber lasers. The photo neutralizer does not require high
quality laser radiation sources pumping a photon target, nor does it require very high precision
adjustment and alignment of the optic elements.
Turning to the figures, an embodiment of a non-resonance photon trap 10 is shown in
Figure 1. As depicted in a two-dimensional case, the trap 10 comprises a bottom flat mirror 20
and a top concave mirror 30. A photon γ with a small angle to vertical axes within the trap 10,
will develop with each reflection from the upper mirror 30 some horizontal momentum
difference to central axes of trap 10. The position of the photon γ after an n-th reflection is
defined by the abscissa of a reflection point, x , with a height, F(x ), an angle φ from a vertical
and a photon speed, β . The horizontal motion is described by the following system of
equations:
x −= x Fx +Fx tg β
() () ( )
nn++ 11n n n
dF (x )
n +1
ββ−= 2
nn +1
For stability investigation, linearize versions of equations (1)and (2) are combined
and the following equations are obtained:
xx−=20F β
nn +1 n
dF() 0
ββ−= 2 x (4)
nn++ 11 2 n
By combining equations (3) and (4), the following linear recurrence relation is
obtained:
dF (0 )
xx−+24x=F0 x
nn ++ 21 n n+1
n +1
=−40 F
where R is the curvature radius of top mirror 30. Equation (5) is a type of finite-difference
scheme for an oscillation system with unit time step and with Eigen frequency ω = 2 . The
solution is representable in the form xA =⋅q , where q is a complex number. Then for q
defined as:
20FF 20
() ()
q =−11 ± − −1
(6)
q ≤1
The stability condition is , from which photons confinement in a geometric optic, when
taking into account non-negativity of value , is determined as
FR 0,<< ω 4
The curvature radius of the upper mirror 30 impacts photon confinement. Recurrent systems (1)
and (2) allow the production of the integral of motion:
tgββ −= β
nn +1 n
2xx − dFx
() ()
nn++ 11n
Fx +Fx dx
() ( )
nn +1
In the case of a sufficiently small curvature of the upper mirror 30 and small steps, such as
Δ<FF <,1 <<, Δ β<<1,
the integral sums (8) is approximately transformed into
cos β ( )
ln = ln
cos β F x
or into standard adiabatic invariant
Fx ()cos( β) =const
(10)
Relation (10) determines the region filled by photons.
These estimations enable the design of an effective photon neutralizer for negative
ion beams. Turning to Figures 2 and 3, a reasonable three-dimensional geometry of the trap 10
is a long arch assembly of four components. As depicted in Figure 2, the trap 10 preferably
comprises a bottom or lower mirror 20 at the bottom of the trap 10 that is planar or flat in shape,
and an upper mirror assembly 30 comprising a central mirror 32 that is cylindrical in shape, and
a pair of outer mirrors 34 that are conical in shape and coupled to the ends of the central mirror
32. As shown, an ion beam H‾ is passed along the photon trap. The sizes are taken from the
characteristic scales of a single neutralizer channel of a beam injector for the International
Thermonuclear Experimental Reactor (ITER).
The following provides results of a numerical simulation of a photon neutralizer for
ITER NBI. This simulation has been carried out by using ZEMAX code. Figure 4 shows a one
ray trace in the trap system 10 given in Figure 2 with a random angle from -3° to 3° in the XY
plane, and -5° to 5° along the trap 10.
The trajectory presented in Figure 4 contains 4000 reflections, after which the ray
remained in the trap system. In a resonance device [M. Kovari, B. Crowley. Fusion Eng. Des.
2010, v.85 p. 745–751], the storage efficiency under a mirror reflectance r =0.9996 is about
≈ 500. In the case noted herein, with a lower mirror reflectance of r =0.999, the determined
storage efficiency is
≈≈ 1000
(11)
in 1 −r
Losses will tend to be associated chiefly with a large number of surfaces inside the
cavity and diffraction. [J.H. Fink, Production and Neutralization of Negative Ions and Beams:
3rd Int. Symposium, Brookhaven 1983, AIP, New York, 1984, pp. 547–560]
The distribution of the radiant energy flux through a horizontal plane inside the trap
is shown in Figure 5, where the reflection coefficient of all surfaces is equal to 0.999 and the
input radiant power is equal to 1 W. The calculated accumulated power in the cavity of the trap
is equal to 722 watts. Taking into account calculation losses (Zemax code monitors and
evaluates such losses) the accumulated power value should be increased by 248 watts. Therefore
the storing efficiency reaches almost a maximum possible value (11). Thus, quasi-planar systems
allow within the geometrical optics the creation of a confinement region with a given size.
Note, that the end cone mirrors 34 and main cylindrical mirrors 32 and 20 form
broken surface as shown in Figures 2 and 3. The broken surfaces tend to have a negative effect
on the longitudinal confinement of photons because this forms an instability region (see (7)).
However, the number of crossings of these borders by a ray during the photon lifetime is not
large in comparison with the total number of reflections, and, thus, the photon does not have time
to significantly increase longitudinal angle and leave the trap through the ends of the trap 10.
Radiation injection into trap and sources
To pump the optic cell, photons beams with a given angular spread along and across
the trap 10 can be injected through one or more small holes in one or more mirrors. For example,
it is possible by using a ytterbium fiber laser ( λ=1070nm, total power above 50 kW)
[http://www.ipgphotonics.com/Collateral/Documents/English-US/HP_Brochure.pdf]. These
serial lasers have sufficient power and their emission line is near optimal.
The radiation beam with necessary angular spread can be prepared from fiber laser
radiation by special adiabatic conical or parabolic shapers. For example, radiation with a spread
of 15 from fiber and ∅300 μ may be transformed to 5 and ∅1 mm, which is sufficient for the
neutralizer trap 10 described herein.
Efficiency of photon neutralization
The degree of neutralization is representable as
KP =− 1exp
(12)
E dV
0
where d is the width of the neutralization region, E is the photon energy, V is the velocity of the
ions. P is the total accumulated power defined asP = , where P is the optic pumping power.
1 −r
The neutralization efficiency of D- flux by the laser with overall efficiency η may be determined
KP()P
η() P =
(13)
where P is the negative ion beam power. The efficiency increases with growth of D- beam
power. The efficiency (13) and degree of neutralization (12) are shown in Figure 6. This curve
has been calculated for a single channel gas neutralizer in ITER injectors, in which 10 MW part
is passed. Thus, in such an approach nearly 100% neutralization can be achieved with very high
energetic efficiency of about 90%. For comparison, ITER neutral beam injector has a 58%
neutralization [R. Hemsworth et al.// Nucl. Fusion. 2009, v.49, 045006] and correspondently the
same efficiency. The overall injector efficiency while taking into account accelerator supply and
transport losses has been estimated by Krylov [A. Krylov, R.S. Hemsworth. Fusion Eng. Des.
2006, v.81, p. 2239–2248].
A preferred arrangement of an example embodiment of a negative ion-based neutral
beam injector 100 is illustrated in Figures 7 and 8. As depicted, the injector 100 includes an ion
source 110, a gate valve 120, deflecting magnets 130 for deflecting a low energy beam line, an
insulator–support 140, a high energy accelerator 150, a gate valve 160, a neutralizer tube (shown
schematically) 170, a separating magnet (shown schematically) 180, a gate valve 190, pumping
panels 200 and 202, a vacuum tank 210 (which is part of a vacuum vessel 250 discussed below),
cryosorption pumps 220, and a triplet of quadrupole lenses 230. The injector 100, as noted,
comprises an ion source 110, an accelerator 150 and a neutralizer 170 to produce about a 5 MW
neutral beam with energy of about 0.50 to 1.0 MeV. The ion source 110 is located inside the
vacuum tank 210 and produces a 9 A negative ion beam. The vacuum tank 210 is biased to -880
kV which is relative to ground and installed on insulating supports 140 inside a larger diameter
tank 240 filled with SF6 gas. The ions produced by the ion source are pre-accelerated to 120 keV
before injection into the high-energy accelerator 150 by an electrostatic multi aperture grid pre-
accelerator 111 in the ion source 110, which is used to extract ion beams from the plasma and
accelerate to some fraction of the required beam energy. The 120 keV beam from the ion source
110 passes through a pair of deflecting magnets 130, which enable the beam to shift off axis
before entering the high energy accelerator 150. The pumping panels 202 shown between the
deflecting magnets 130 include a partition and cesium trap.
A more detailed discussion of the negative ion-based neutral beam injector is
provided in Russian Patent Application No. 2012137795 and PCT application No.
, which are incorporated herein by reference.
The example embodiments provided herein, however, are merely intended as
illustrative examples and not to be limiting in any way.
In the foregoing specification, the invention has been described with reference to
specific embodiments thereof. It will, however, be evident that various modifications and
changes may be made thereto without departing from the broader spirit and scope of the
invention. For example, the reader is to understand that the specific ordering and combination of
process actions shown in the process flow diagrams described herein is merely illustrative, unless
otherwise stated, and the invention can be performed using different or additional process
actions, or a different combination or ordering of process actions. As another example, each
feature of one embodiment can be mixed and matched with other features shown in other
embodiments. Features and processes known to those of ordinary skill may similarly be
incorporated as desired. Additionally and obviously, features may be added or subtracted as
desired. Accordingly, the invention is not to be restricted except in light of the attached claims
and their equivalents.
Claims (16)
1. A non-resonance photo-neutralizer for neutral beam injectors comprising first and second mirrors having opposing mirror surfaces, the first and second mirrors being positioned in spaced relation and extending longitudinally in a first direction, the first mirror having a central portion and opposing first and second ends spaced apart from the central portion in the first direction, the first mirror extending in the first direction from the first end along the central portion to the second end and bending along the first direction toward the second mirror with the first and second ends of the first mirror being positioned closer to the second mirror than the central portion of the first mirror, wherein the mirror surface of the first mirror is concave in a second direction transverse to the first direction.
2. The photo-neutralizer of claim 1 wherein the first and second mirrors form a photon trap in a space there between, the photon trap having a spherical, elliptical, cylindrical or toroidal shape defined by the first and second mirrors.
3. The photo-neutralizer of claim 1 wherein a space interposing the first and second mirrors forms a photon trap, wherein the photon trap comprises a confinement region adjacent a family of normals common to the mirror surfaces of the first and second mirrors.
4. The photo-neutralizer of claim 1wherein one or more of the mirror surfaces of the first and second mirrors are concave.
5. The photo-neutralizer of claim 1wherein the mirror surface of the first mirror is concave and the mirror surface of the second mirror is flat.
6. The photo-neutralizer of claim 5 wherein the first mirror comprises a mirror assembly including a central mirror and first and second outer mirrors coupled to the central mirror.
7. The photo-neutralizer of claim 6 wherein the central mirror is cylindrically shaped and the outer mirrors are conically shaped.
8. A negative ion based neutral beam injector comprising a negative ion source, and a non-resonance photo-neutralizer co-axially positioned with the negative ion source, wherein the photo-neutralizer including first and second mirrors having opposing mirror surfaces, the first and second mirrors being positioned in spaced relation and extending longitudinally in a first direction, the first mirror having a central portion and opposing first and second ends spaced apart from the central portion in the first direction, the first mirror extending in the first direction from the first end along the central portion to the second end and bending along the first direction toward the second mirror with the first and second ends of the first mirror being positioned closer to the second mirror than the central portion of the first mirror, wherein the mirror surface of the first mirror is concave in a second direction transverse to the first direction.
9. The neutral beam injector of claim 8 wherein the first and second mirrors form a photon trap in a space there between, the photon trap having a spherical, elliptical, cylindrical or toroidal shape defined by the first and second mirrors.
10. The neutral beam injector of claim 8 wherein a space interposing the first and second mirrors form a photon trap, wherein the photon trap comprises a confinement region adjacent a family of normals common to the first and second mirror surfaces.
11. The neutral beam injector of claim 8 wherein one or more of the mirror surfaces of the first and second mirrors are concave.
12. The neutral beam injector of claim 8 wherein the mirror surface of the first mirror is concave and the mirror surface of the second mirror is flat.
13. The neutral beam injector of claim 12 wherein the first mirror comprises a mirror assembly including a central mirror and first and second outer mirrors coupled to the central mirror.
14. The neutral beam injector of claim 13 wherein the central mirror is cylindrically shaped and the outer mirrors are conically shaped.
15. The photo-neutralizer of claim 1 substantially as herein described with reference to any embodiment disclosed.
16. The neutral beam injector of claim 8 substantially as herein described with reference to any embodiment disclosed.
Priority Applications (1)
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NZ769655A NZ769655A (en) | 2014-11-19 | 2015-11-18 | Photon neutralizers for neutral beam injectors |
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Application Number | Priority Date | Filing Date | Title |
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RU2014146574A RU2696268C2 (en) | 2014-11-19 | 2014-11-19 | Photon neutraliser for neutral particle beam injectors |
RU2014146574 | 2014-11-19 | ||
PCT/US2015/061356 WO2016081608A1 (en) | 2014-11-19 | 2015-11-18 | Photon neutralizers for neutral beam injectors |
Publications (2)
Publication Number | Publication Date |
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NZ731581A NZ731581A (en) | 2020-11-27 |
NZ731581B2 true NZ731581B2 (en) | 2021-03-02 |
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