NO874953D0 - DEVELOPING LIQUID FOR LITOGRAPHIC PLATES. - Google Patents

DEVELOPING LIQUID FOR LITOGRAPHIC PLATES.

Info

Publication number
NO874953D0
NO874953D0 NO874953A NO874953A NO874953D0 NO 874953 D0 NO874953 D0 NO 874953D0 NO 874953 A NO874953 A NO 874953A NO 874953 A NO874953 A NO 874953A NO 874953 D0 NO874953 D0 NO 874953D0
Authority
NO
Norway
Prior art keywords
litographic
plates
developing liquid
developing
liquid
Prior art date
Application number
NO874953A
Other languages
Norwegian (no)
Inventor
David S Riley
Gregory P Turner
Original Assignee
Horsell Graphic Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horsell Graphic Ind Ltd filed Critical Horsell Graphic Ind Ltd
Publication of NO874953D0 publication Critical patent/NO874953D0/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
NO874953A 1986-11-29 1987-11-27 DEVELOPING LIQUID FOR LITOGRAPHIC PLATES. NO874953D0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB868628613A GB8628613D0 (en) 1986-11-29 1986-11-29 Developing fluid for lithographic plates

Publications (1)

Publication Number Publication Date
NO874953D0 true NO874953D0 (en) 1987-11-27

Family

ID=10608204

Family Applications (1)

Application Number Title Priority Date Filing Date
NO874953A NO874953D0 (en) 1986-11-29 1987-11-27 DEVELOPING LIQUID FOR LITOGRAPHIC PLATES.

Country Status (8)

Country Link
US (1) US4945030A (en)
EP (1) EP0274044B1 (en)
DE (1) DE3776536D1 (en)
DK (1) DK625487D0 (en)
ES (1) ES2028034T3 (en)
FI (1) FI875247A0 (en)
GB (1) GB8628613D0 (en)
NO (1) NO874953D0 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4027299A1 (en) * 1990-08-29 1992-03-05 Hoechst Ag DEVELOPER COMPOSITION FOR IRRADIATED, RADIATION-SENSITIVE, POSITIVE AND NEGATIVE WORKING AND REVERSIBLE REPROGRAPHIC LAYERS AND METHOD FOR DEVELOPING SUCH LAYERS
EP0555098B1 (en) * 1992-02-07 1999-05-26 Tadahiro Ohmi Lithographic developer and lithographic process
US6007970A (en) * 1992-02-07 1999-12-28 Canon Kabushiki Kaisha Lithographic developer containing surfactant
US6107007A (en) * 1992-02-10 2000-08-22 Canon Kabushiki Kaisha Lithography process
WO1995015371A1 (en) * 1993-12-03 1995-06-08 Buckman Laboratories International, Inc. Enzyme stabilization by block-copolymers
EP0732628A1 (en) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Aqueous alkaline solution for developing offset printing plate
US5897985A (en) * 1996-10-11 1999-04-27 Kodak Polychrome Graphics, Llc Potassium silicate developing composition and method of use to process lithographic printing plates
US5766826A (en) * 1996-10-11 1998-06-16 Eastman Kodak Company Alkaline developing composition and method of use to process lithographic printing plates
US6083662A (en) * 1997-05-30 2000-07-04 Kodak Polychrome Graphics Llc Methods of imaging and printing with a positive-working infrared radiation sensitive printing plate
US5811221A (en) * 1997-05-30 1998-09-22 Kodak Polychrome Graphics, Llc Alkaline developing composition and method of use to process lithographic printing plates
DE19811331A1 (en) * 1998-03-16 1999-09-23 Du Pont Deutschland Developer and process for the production of flexographic printing forms
DE19845605A1 (en) 1998-10-05 2000-04-06 Agfa Gevaert Ag Concentrate and aqueous developer made therefrom for imagewise irradiated recording materials
US6143479A (en) * 1999-08-31 2000-11-07 Kodak Polychrome Graphics Llc Developing system for alkaline-developable lithographic printing plates
JP4689804B2 (en) * 1999-12-21 2011-05-25 コダック株式会社 Positive image forming method and developer used therefor
US6649324B1 (en) 2000-08-14 2003-11-18 Kodak Polychrome Graphics Llc Aqueous developer for lithographic printing plates
US6562555B2 (en) 2001-08-01 2003-05-13 Kodak Polychrome Graphics Llc Method for developing lithographic printing plate precursors using a coating attack-suppressing agent
GB0226101D0 (en) * 2002-11-08 2002-12-18 Rhodia Cons Spec Ltd White rust corrosion inhibitors
ITMI20040162A1 (en) * 2004-02-02 2004-05-02 Bozzetto Giovanni Spa USE OF POLYAMINOMETHYLPHOSPHONATE AS DISPERSING AGENTS
JP4166167B2 (en) * 2004-02-05 2008-10-15 富士フイルム株式会社 Photosensitive lithographic printing plate developer and lithographic printing plate making method
US20060257798A1 (en) * 2004-05-10 2006-11-16 Agfa-Gevaert Alkaline developer for radiation sensitive compositions
US20060154187A1 (en) * 2004-12-17 2006-07-13 John Wilson Development of radiation-sensitive elements
EP1722275B1 (en) 2005-05-10 2010-10-27 Agfa Graphics N.V. Method for processing lithographic printing plates
US20060257789A1 (en) * 2005-05-10 2006-11-16 Agfa-Gevaert Method for processing lithographic printing plates
US20080299491A1 (en) * 2007-05-31 2008-12-04 Miller Gary R Highly alkaline developer composition and methods of use
US7883833B2 (en) 2007-06-20 2011-02-08 Eastman Kodak Company Use of highly alkaline developer regenerator composition

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO121968C (en) * 1966-06-23 1977-06-13 Mo Och Domsjoe Ab
DK130844A (en) * 1969-09-03 1900-01-01
US3518201A (en) * 1969-09-04 1970-06-30 Grace W R & Co Chlorine release detergent composition with improved defoamer stability
US3705856A (en) * 1970-09-01 1972-12-12 Basf Wyandotte Corp Additives for alkali cleaning systems
DE2700938A1 (en) * 1977-01-12 1978-07-13 Agfa Gevaert Ag PHOTOGRAPHIC COLOR DEVELOPER COMPOSITION
US4340509A (en) * 1978-03-24 1982-07-20 Michael A. Canale Composition, concentrate and fountain solution for lithographic printing operations
US4244832A (en) * 1979-07-27 1981-01-13 Basf Wyandotte Corporation Phosphate-free machine dishwashing detergents useful at low temperatures
DE3100259A1 (en) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt METHOD AND DEVELOPER MIXTURE FOR DEVELOPING EXPOSED NEGATIVE DIAZONIUM SALT LAYERS
US4374920A (en) * 1981-07-27 1983-02-22 American Hoechst Corporation Positive developer containing non-ionic surfactants
US4374076A (en) * 1981-10-09 1983-02-15 Coors Porcelain Company Method for making cast epoxy resin bodies and epoxy formulation therefor
US4436807A (en) * 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
JPS5917552A (en) * 1982-07-21 1984-01-28 Toray Ind Inc Method for processing image forming laminate
US4540444A (en) * 1982-08-12 1985-09-10 Amchem Products, Inc. Aluminum cleaner and system
DE3346979A1 (en) * 1983-12-24 1985-07-04 Merck Patent Gmbh, 6100 Darmstadt DEVELOPER FOR POSITIVE PHOTO RESISTS
US4680251A (en) * 1984-04-21 1987-07-14 E. I. Du Pont De Nemours And Company Process for the ozone protection of photopolymer flexographic printing plates by treatment with liquid polyethers
DE3427556C1 (en) * 1984-07-26 1986-01-02 Merck Patent Gmbh, 6100 Darmstadt Process for the production of photoresist relief structures with an overhang character
DE3501675A1 (en) * 1985-01-19 1986-07-24 Merck Patent Gmbh, 6100 Darmstadt AGENT AND METHOD FOR REMOVING PHOTORESIST AND STRIPPER REMAINS FROM SEMICONDUCTOR SUBSTRATES
US4592992A (en) * 1985-04-11 1986-06-03 American Hoechst Corporation Developer compositions for lithographic plates

Also Published As

Publication number Publication date
FI875247A0 (en) 1987-11-27
DK625487D0 (en) 1987-11-27
GB8628613D0 (en) 1987-01-07
ES2028034T3 (en) 1992-07-01
DE3776536D1 (en) 1992-03-12
EP0274044B1 (en) 1992-01-29
US4945030A (en) 1990-07-31
EP0274044A1 (en) 1988-07-13

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