NO20072350L - Method and equipment for direct chlorination of metallurgical grade silicon - Google Patents

Method and equipment for direct chlorination of metallurgical grade silicon

Info

Publication number
NO20072350L
NO20072350L NO20072350A NO20072350A NO20072350L NO 20072350 L NO20072350 L NO 20072350L NO 20072350 A NO20072350 A NO 20072350A NO 20072350 A NO20072350 A NO 20072350A NO 20072350 L NO20072350 L NO 20072350L
Authority
NO
Norway
Prior art keywords
silicon
reactor
equipment
direct chlorination
chlorine
Prior art date
Application number
NO20072350A
Other languages
Norwegian (no)
Inventor
Oddmund Wallevik
Original Assignee
Norsk Hydro As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Norsk Hydro As filed Critical Norsk Hydro As
Priority to NO20072350A priority Critical patent/NO20072350L/en
Priority to PCT/NO2008/000154 priority patent/WO2008136681A1/en
Priority to TW97116567A priority patent/TW200906722A/en
Publication of NO20072350L publication Critical patent/NO20072350L/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
    • C01B33/10721—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of tetrachloride
    • C01B33/10726—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of tetrachloride from silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/0015—Feeding of the particles in the reactor; Evacuation of the particles out of the reactor
    • B01J8/0045—Feeding of the particles in the reactor; Evacuation of the particles out of the reactor by means of a rotary device in the flow channel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • B01J8/067—Heating or cooling the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/08—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles
    • B01J8/12—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with moving particles moved by gravity in a downward flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
    • B01J2208/00212—Plates; Jackets; Cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00106—Controlling the temperature by indirect heat exchange
    • B01J2208/00168—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles
    • B01J2208/00256—Controlling the temperature by indirect heat exchange with heat exchange elements outside the bed of solid particles in a heat exchanger for the heat exchange medium separate from the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/0053—Controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00743—Feeding or discharging of solids
    • B01J2208/00752—Feeding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00743—Feeding or discharging of solids
    • B01J2208/00761—Discharging

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)

Abstract

Fremgangsmåte og utstyr for direkte klorering av metallurgisk silisium for å produsere silisiumtetraklorid, som omfatter en reaktor med organ for tilførsel av silisium og innsprøyting av klor og organ for å ta ut reaksjonsproduktet silisiumtetraklorid og eventuell restsubstans. Kloreringen skjer i en forbruksskiktsreaktor der reaktoren er av den loddrette rørformede typen og der silisium tilføres kontinuerlig øverst i reaktoren og klor sprøytes inn med eller mot silisiumstrømmen på en kontrollert måte, mens varmen som oppstår under reaksjonen samtidig trekkes ut for å holde reaksjonstemperaturen mellom 300 og 700 ºC. Oppfinnelsen tilveiebringer en billig, effektiv og lett kontrollerbar fremgangsmåte og utstyr for produksjon av det omtalte produktet.Process and equipment for direct chlorination of metallurgical silicon to produce silicon tetrachloride, which comprises a reactor with a silicon supply means and injection of chlorine and a means for extracting the reaction product silicon tetrachloride and any residual substance. The chlorination takes place in a consumption layer reactor where the reactor is of the vertical tubular type and where silicon is continuously supplied at the top of the reactor and chlorine is injected with or against the silicon stream in a controlled manner, while the heat generated during the reaction is simultaneously extracted to maintain the reaction temperature between 300 and 700 ºC. The invention provides an inexpensive, efficient and easily controllable method and equipment for the production of said product.

NO20072350A 2007-05-07 2007-05-07 Method and equipment for direct chlorination of metallurgical grade silicon NO20072350L (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
NO20072350A NO20072350L (en) 2007-05-07 2007-05-07 Method and equipment for direct chlorination of metallurgical grade silicon
PCT/NO2008/000154 WO2008136681A1 (en) 2007-05-07 2008-05-02 Method and equipment for direct chlorination of metallurgical grade silicon
TW97116567A TW200906722A (en) 2007-05-07 2008-05-06 Method and equipment for direct chlorination of metallurgical grade silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NO20072350A NO20072350L (en) 2007-05-07 2007-05-07 Method and equipment for direct chlorination of metallurgical grade silicon

Publications (1)

Publication Number Publication Date
NO20072350L true NO20072350L (en) 2008-11-10

Family

ID=39943706

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20072350A NO20072350L (en) 2007-05-07 2007-05-07 Method and equipment for direct chlorination of metallurgical grade silicon

Country Status (3)

Country Link
NO (1) NO20072350L (en)
TW (1) TW200906722A (en)
WO (1) WO2008136681A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2530052A1 (en) * 2011-06-01 2012-12-05 HEI Eco Technology Method for producing silicon tetrachloride and method for producing solar silicon
DE102014103694A1 (en) * 2014-03-18 2015-09-24 Basf Se Reactor system and use thereof
CN105833805A (en) * 2016-05-25 2016-08-10 江苏科圣化工机械有限公司 Gas distribution device of organic silicon fluidized bed reactor
CN112313174B (en) * 2018-06-26 2023-11-21 株式会社力森诺科 Method for producing boron trichloride

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR8006892A (en) * 1980-10-27 1982-07-06 Brasilia Telecom DEVICE FOR THE PRODUCTION OF CHLORASILANS BY FLUIDIZED BED

Also Published As

Publication number Publication date
WO2008136681A1 (en) 2008-11-13
TW200906722A (en) 2009-02-16

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Legal Events

Date Code Title Description
FC2A Withdrawal, rejection or dismissal of laid open patent application