NO20054402D0 - Method of production of trichlorosilane and silicon for use in the production of trichlorosilane - Google Patents

Method of production of trichlorosilane and silicon for use in the production of trichlorosilane

Info

Publication number
NO20054402D0
NO20054402D0 NO20054402A NO20054402A NO20054402D0 NO 20054402 D0 NO20054402 D0 NO 20054402D0 NO 20054402 A NO20054402 A NO 20054402A NO 20054402 A NO20054402 A NO 20054402A NO 20054402 D0 NO20054402 D0 NO 20054402D0
Authority
NO
Norway
Prior art keywords
silicon
trichlorosilane
bed reactor
production
reactor
Prior art date
Application number
NO20054402A
Other languages
Norwegian (no)
Other versions
NO20054402L (en
Inventor
Harry Morten Rong
Jan-Otto Hoel
Torbjorn Roe
Geir Johan Andersen
Original Assignee
Elkem As
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elkem As filed Critical Elkem As
Priority to NO20054402A priority Critical patent/NO20054402L/en
Publication of NO20054402D0 publication Critical patent/NO20054402D0/en
Priority to PCT/NO2006/000320 priority patent/WO2007035108A1/en
Publication of NO20054402L publication Critical patent/NO20054402L/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)

Abstract

Den foreliggende oppfinnelse vedrører en fremgangsmåte for fremstilling av triklorsilan ved reaksjon av silisium med silisiumtetraklorid og hydrogengass ved en temperatur mellom 400 og 800°C og ved et trykk av 0,1-30 atm i en fluidisert sengreaktor, i en omrørt sengreaktor eller i en fastsengreaktor, hvor silisium som tilsettes til reaktoren inneholder mindre enn 50 ppmw mangan. Oppfinnelsen vedrører også en fremgangsmåte for fremstilling av silisium for bruk ved fremstilling av triklorsilan ved reaksjon av silisium med silisiumtetraklorid og hydrogengass ved en temperatur mellom 400 og 800°C og ved et trykk av 0,1-30 atm i en fluidisert sengreaktor, i en omrørt sengreaktor eller i en fastsengreaktor hvor silisiumet inneholder mindre enn 50 ppmw mangan.The present invention relates to a process for the preparation of trichlorosilane by reaction of silicon with silicon tetrachloride and hydrogen gas at a temperature between 400 and 800 ° C and at a pressure of 0.1-30 atm in a fluidized bed reactor, in a stirred bed reactor or in a bed bed reactor, wherein the silicon added to the reactor contains less than 50 ppmw of manganese. The invention also relates to a process for preparing silicon for use in the preparation of trichlorosilane in reaction of silicon with silicon tetrachloride and hydrogen gas at a temperature between 400 and 800 ° C and at a pressure of 0.1-30 atm in a fluidized bed reactor, in a stirred bed reactor or in a fixed bed reactor where the silicon contains less than 50 ppmw of manganese.

NO20054402A 2005-09-22 2005-09-22 Method of production of trichlorosilane and silicon for use in the production of trichlorosilane NO20054402L (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
NO20054402A NO20054402L (en) 2005-09-22 2005-09-22 Method of production of trichlorosilane and silicon for use in the production of trichlorosilane
PCT/NO2006/000320 WO2007035108A1 (en) 2005-09-22 2006-09-20 Method for production of trichlorosilane and silicon for use in the production of trichlorosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NO20054402A NO20054402L (en) 2005-09-22 2005-09-22 Method of production of trichlorosilane and silicon for use in the production of trichlorosilane

Publications (2)

Publication Number Publication Date
NO20054402D0 true NO20054402D0 (en) 2005-09-22
NO20054402L NO20054402L (en) 2007-03-23

Family

ID=35355993

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20054402A NO20054402L (en) 2005-09-22 2005-09-22 Method of production of trichlorosilane and silicon for use in the production of trichlorosilane

Country Status (2)

Country Link
NO (1) NO20054402L (en)
WO (1) WO2007035108A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101279734B (en) * 2008-05-30 2010-06-02 广州吉必盛科技实业有限公司 Method for synthesizing polysilicon raw material trichlorosilane
US8168123B2 (en) 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon
EP2421659A1 (en) 2009-04-20 2012-02-29 Ae Polysilicon Corporation A reactor with silicide-coated metal surfaces
US8235305B2 (en) 2009-04-20 2012-08-07 Ae Polysilicon Corporation Methods and system for cooling a reaction effluent gas
US8298490B2 (en) 2009-11-06 2012-10-30 Gtat Corporation Systems and methods of producing trichlorosilane
NO20100358A1 (en) * 2010-03-12 2011-09-13 Elkem As Process for the preparation of trichlorosilane from silicon, hydrogen and silicon tetrachloride
NO334216B1 (en) * 2010-08-13 2014-01-13 Elkem As Process for the preparation of trichlorosilane and silicon for use in the preparation of trichlorosilane
US8875728B2 (en) 2012-07-12 2014-11-04 Siliken Chemicals, S.L. Cooled gas distribution plate, thermal bridge breaking system, and related methods
CN102815702B (en) * 2012-08-09 2014-03-12 浙江中宁硅业有限公司 Device and process of producing high-purity granular polycrystalline silicon by silanizing fluidized bed
CN109694077B (en) * 2017-10-24 2021-04-06 新特能源股份有限公司 Device and method for converting silicon tetrachloride into trichlorosilane
FR3075776B1 (en) * 2017-12-21 2020-10-02 Rosi SILICON GRANULES FOR THE PREPARATION OF TRICHLOROSILANE AND RELATED MANUFACTURING PROCESS

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO321276B1 (en) * 2003-07-07 2006-04-18 Elkem Materials Process for the preparation of trichlorosilane and silicon for use in the preparation of trichlorosilane
NO20043828L (en) * 2004-09-13 2006-03-14 Elkem As Process for the preparation of trichlorosilane, process for the production of silicon and silicon for use in the preparation of trichlorosilane

Also Published As

Publication number Publication date
WO2007035108A1 (en) 2007-03-29
NO20054402L (en) 2007-03-23

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