NO148794C - Lysfoelsomt polymert materiale og dets anvendelse ved tykkplatefremstilling - Google Patents
Lysfoelsomt polymert materiale og dets anvendelse ved tykkplatefremstillingInfo
- Publication number
- NO148794C NO148794C NO741505A NO741505A NO148794C NO 148794 C NO148794 C NO 148794C NO 741505 A NO741505 A NO 741505A NO 741505 A NO741505 A NO 741505A NO 148794 C NO148794 C NO 148794C
- Authority
- NO
- Norway
- Prior art keywords
- photo
- polymer material
- plate manufacturing
- sensitive polymer
- thickness plate
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002861 polymer material Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4223—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof aromatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
- C08G59/1483—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1999473A GB1466252A (en) | 1973-04-26 | 1973-04-26 | Light-sensitive material |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| NO741505L NO741505L (no) | 1974-10-29 |
| NO148794B NO148794B (no) | 1983-09-05 |
| NO148794C true NO148794C (no) | 1983-12-14 |
Family
ID=10138567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO741505A NO148794C (no) | 1973-04-26 | 1974-04-25 | Lysfoelsomt polymert materiale og dets anvendelse ved tykkplatefremstilling |
Country Status (16)
| Country | Link |
|---|---|
| JP (1) | JPS5842460B2 (de) |
| AT (1) | AT344998B (de) |
| BE (1) | BE814282A (de) |
| CA (1) | CA1023491A (de) |
| CH (2) | CH607100A5 (de) |
| DE (1) | DE2420372A1 (de) |
| FI (1) | FI62911C (de) |
| FR (1) | FR2227556B1 (de) |
| GB (1) | GB1466252A (de) |
| IE (1) | IE39231B1 (de) |
| IT (1) | IT1010118B (de) |
| LU (1) | LU69940A1 (de) |
| NL (1) | NL175631C (de) |
| NO (1) | NO148794C (de) |
| SE (1) | SE418191B (de) |
| ZA (1) | ZA742559B (de) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6841335B2 (en) | 2002-07-29 | 2005-01-11 | Kodak Polychrome Graphics Llc | Imaging members with ionic multifunctional epoxy compounds |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE758116A (fr) * | 1969-10-30 | 1971-04-01 | Fuji Photo Film Co Ltd | Compose a poids moleculaire eleve et son procede de preparation |
| JPS4944601B1 (de) * | 1970-05-15 | 1974-11-29 | ||
| BE790383A (fr) * | 1971-10-22 | 1973-02-15 | Howson Algraphy Ltd | Matière sensibles à la lumière |
-
1973
- 1973-04-26 GB GB1999473A patent/GB1466252A/en not_active Expired
-
1974
- 1974-04-22 IE IE859/74A patent/IE39231B1/xx unknown
- 1974-04-23 ZA ZA00742559A patent/ZA742559B/xx unknown
- 1974-04-23 FI FI1224/74A patent/FI62911C/fi active
- 1974-04-24 SE SE7405484A patent/SE418191B/xx unknown
- 1974-04-25 NO NO741505A patent/NO148794C/no unknown
- 1974-04-25 NL NLAANVRAGE7405575,A patent/NL175631C/xx not_active IP Right Cessation
- 1974-04-26 JP JP49046735A patent/JPS5842460B2/ja not_active Expired
- 1974-04-26 LU LU69940A patent/LU69940A1/xx unknown
- 1974-04-26 FR FR7414649A patent/FR2227556B1/fr not_active Expired
- 1974-04-26 CH CH1186877A patent/CH607100A5/xx not_active IP Right Cessation
- 1974-04-26 BE BE143702A patent/BE814282A/xx not_active IP Right Cessation
- 1974-04-26 DE DE2420372A patent/DE2420372A1/de not_active Withdrawn
- 1974-04-26 AT AT349474A patent/AT344998B/de not_active IP Right Cessation
- 1974-04-26 IT IT21939/74A patent/IT1010118B/it active
- 1974-04-26 CH CH579774A patent/CH598621A5/xx not_active IP Right Cessation
- 1974-05-27 CA CA200,931A patent/CA1023491A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2420372A1 (de) | 1974-11-07 |
| AU6823074A (en) | 1975-10-30 |
| JPS5031819A (de) | 1975-03-28 |
| FR2227556A1 (de) | 1974-11-22 |
| JPS5842460B2 (ja) | 1983-09-20 |
| LU69940A1 (de) | 1974-08-06 |
| IT1010118B (it) | 1977-01-10 |
| CA1023491A (en) | 1977-12-27 |
| NL7405575A (de) | 1974-10-29 |
| IE39231L (en) | 1974-10-26 |
| CH607100A5 (de) | 1978-11-30 |
| NO741505L (no) | 1974-10-29 |
| SE418191B (sv) | 1981-05-11 |
| FI62911B (fi) | 1982-11-30 |
| FR2227556B1 (de) | 1980-08-29 |
| GB1466252A (en) | 1977-03-02 |
| ZA742559B (en) | 1975-04-30 |
| CH598621A5 (de) | 1978-05-12 |
| NO148794B (no) | 1983-09-05 |
| NL175631B (nl) | 1984-07-02 |
| NL175631C (nl) | 1984-12-03 |
| IE39231B1 (en) | 1978-08-30 |
| AT344998B (de) | 1978-08-25 |
| FI62911C (fi) | 1983-03-10 |
| BE814282A (fr) | 1974-08-16 |
| ATA349474A (de) | 1977-12-15 |
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