NL7708183A - PROCEDURE FOR AUTOMATIC JUSTING. - Google Patents

PROCEDURE FOR AUTOMATIC JUSTING.

Info

Publication number
NL7708183A
NL7708183A NL7708183A NL7708183A NL7708183A NL 7708183 A NL7708183 A NL 7708183A NL 7708183 A NL7708183 A NL 7708183A NL 7708183 A NL7708183 A NL 7708183A NL 7708183 A NL7708183 A NL 7708183A
Authority
NL
Netherlands
Prior art keywords
justing
procedure
automatic
automatic justing
Prior art date
Application number
NL7708183A
Other languages
Dutch (nl)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7708183A publication Critical patent/NL7708183A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
NL7708183A 1976-07-23 1977-07-22 PROCEDURE FOR AUTOMATIC JUSTING. NL7708183A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762633297 DE2633297A1 (en) 1976-07-23 1976-07-23 AUTOMATIC ADJUSTMENT PROCEDURE

Publications (1)

Publication Number Publication Date
NL7708183A true NL7708183A (en) 1978-01-25

Family

ID=5983818

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7708183A NL7708183A (en) 1976-07-23 1977-07-22 PROCEDURE FOR AUTOMATIC JUSTING.

Country Status (8)

Country Link
US (1) US4127777A (en)
JP (1) JPS5315078A (en)
BE (1) BE857044R (en)
DE (1) DE2633297A1 (en)
FR (1) FR2359439A2 (en)
GB (1) GB1589285A (en)
IT (1) IT1113774B (en)
NL (1) NL7708183A (en)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54114181A (en) * 1978-02-27 1979-09-06 Canon Inc Alignment device
JPS54114182A (en) * 1978-02-27 1979-09-06 Canon Inc Alingment device
JPS54157478A (en) * 1978-06-01 1979-12-12 Canon Inc Alignment method
DE2905635A1 (en) * 1979-02-14 1980-08-21 Censor Patent Versuch METHOD AND DEVICE FOR ALIGNING THE IMAGE AND / OR OBJECT AREAS IN OPTICAL COPYING DEVICES
DE2905636C2 (en) * 1979-02-14 1985-06-20 Censor Patent- Und Versuchs-Anstalt, Vaduz Method for copying masks onto a workpiece
US4390279A (en) * 1979-07-12 1983-06-28 Nippon Kogaku K. K. Alignment device in an IC projection exposure apparatus
JPS56130707A (en) * 1980-03-18 1981-10-13 Canon Inc Photo-printing device
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS5875834A (en) * 1981-10-30 1983-05-07 Hitachi Ltd Mask alignment device
JPS58108745A (en) * 1981-12-23 1983-06-28 Canon Inc Erroneous transcription adjusting device
US4580900A (en) * 1982-04-02 1986-04-08 Eaton Corporation Auto focus alignment and measurement system and method
US4615621A (en) * 1982-04-02 1986-10-07 Eaton Corporation Auto-focus alignment and measurement system and method
JPS6021051A (en) * 1983-07-14 1985-02-02 Nippon Telegr & Teleph Corp <Ntt> Lens projection and exposure method and its device
JPH0666241B2 (en) * 1985-10-14 1994-08-24 株式会社日立製作所 Position detection method
JPS63220521A (en) * 1987-03-10 1988-09-13 Canon Inc Focusing device
US5218415A (en) * 1988-05-31 1993-06-08 Canon Kabushiki Kaisha Device for optically detecting inclination of a surface
JPH02292813A (en) * 1989-05-02 1990-12-04 Canon Inc Automatic focussing device
US6232999B1 (en) * 1999-06-25 2001-05-15 Eastman Kodak Company Method for changing focus and angle of a multichannel printhead
US7679029B2 (en) * 2005-10-28 2010-03-16 Cymer, Inc. Systems and methods to shape laser light as a line beam for interaction with a substrate having surface variations
CN104237072B (en) * 2014-09-01 2016-08-24 中华人民共和国北仑出入境检验检疫局 A kind of automatic alignment device of capillary viscometer

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2050590C2 (en) * 1970-10-15 1982-06-16 Ibm Deutschland Gmbh, 7000 Stuttgart Projection device
US4070117A (en) * 1972-06-12 1978-01-24 Kasper Instruments, Inc. Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
US3867038A (en) * 1972-11-27 1975-02-18 Baird Atomic Inc Optical alignment system
DE2460914C2 (en) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographic projection apparatus

Also Published As

Publication number Publication date
BE857044R (en) 1977-11-14
GB1589285A (en) 1981-05-07
US4127777A (en) 1978-11-28
FR2359439A2 (en) 1978-02-17
DE2633297A1 (en) 1978-01-26
JPS5315078A (en) 1978-02-10
IT1113774B (en) 1986-01-20

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Legal Events

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