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Priority claimed from JP47089859Aexternal-prioritypatent/JPS4946643A/ja
Priority claimed from JP47089858Aexternal-prioritypatent/JPS4946642A/ja
Application filedfiledCritical
Publication of NL7312400ApublicationCriticalpatent/NL7312400A/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
G03F7/0007—Filters, e.g. additive colour filters; Components for display devices