NL7211136A - - Google Patents
Info
- Publication number
- NL7211136A NL7211136A NL7211136A NL7211136A NL7211136A NL 7211136 A NL7211136 A NL 7211136A NL 7211136 A NL7211136 A NL 7211136A NL 7211136 A NL7211136 A NL 7211136A NL 7211136 A NL7211136 A NL 7211136A
- Authority
- NL
- Netherlands
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/347—Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups
- C07C51/353—Preparation of carboxylic acids or their salts, halides or anhydrides by reactions not involving formation of carboxyl groups by isomerisation; by change of size of the carbon skeleton
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/58—Preparation of carboxylic acid halides
- C07C51/60—Preparation of carboxylic acid halides by conversion of carboxylic acids or their anhydrides or esters, lactones, salts into halides with the same carboxylic acid part
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/54—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D333/00—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
- C07D333/02—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings
- C07D333/04—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom
- C07D333/06—Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom not condensed with other rings not substituted on the ring sulphur atom with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to the ring carbon atoms
- C07D333/24—Radicals substituted by carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00173661A US3799915A (en) | 1971-08-20 | 1971-08-20 | Photopolymers |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7211136A true NL7211136A (xx) | 1973-02-22 |
Family
ID=22632989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7211136A NL7211136A (xx) | 1971-08-20 | 1972-08-15 |
Country Status (2)
Country | Link |
---|---|
US (1) | US3799915A (xx) |
NL (1) | NL7211136A (xx) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3923761A (en) * | 1972-07-18 | 1975-12-02 | Western Litho Plate & Supply | Photopolymers |
US3909269A (en) * | 1972-07-18 | 1975-09-30 | Western Litho Plate & Supply | Lithographic plate comprising a light-sensitive polymer |
US3993624A (en) * | 1972-11-08 | 1976-11-23 | Fuji Photo Film Co., Ltd. | Light-sensitive high molecular weight compound capable of being cross-linked by irradiation with light or an electron beam |
JPS5337902B2 (xx) * | 1973-09-04 | 1978-10-12 | ||
US4009040A (en) * | 1974-06-18 | 1977-02-22 | E. I. Du Pont De Nemours And Company | Hexaarylbiimidazole polymers |
FR2290458A1 (fr) * | 1974-11-08 | 1976-06-04 | Thomson Csf | Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques |
JPS5718174B2 (xx) * | 1974-11-15 | 1982-04-15 | ||
GB1572441A (en) * | 1975-12-23 | 1980-07-30 | Vickers Ltd | Photopolymerisable polymers with free carboxyl groups and printing plates therefrom |
US4112207A (en) * | 1976-10-29 | 1978-09-05 | The Dow Chemical Company | Radiation-curable polymers bearing quaternary nitrogen groups |
US10023758B2 (en) * | 2013-07-23 | 2018-07-17 | Empire Technology Development Llc | Photo-activated hydrophilic coatings and methods for their preparation and use |
US9081282B1 (en) | 2014-02-24 | 2015-07-14 | Eastman Kodak Company | Pattern formation using electroless plating and articles |
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1971
- 1971-08-20 US US00173661A patent/US3799915A/en not_active Expired - Lifetime
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1972
- 1972-08-15 NL NL7211136A patent/NL7211136A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
US3799915A (en) | 1974-03-26 |