NL7200295A - - Google Patents

Info

Publication number
NL7200295A
NL7200295A NL7200295A NL7200295A NL7200295A NL 7200295 A NL7200295 A NL 7200295A NL 7200295 A NL7200295 A NL 7200295A NL 7200295 A NL7200295 A NL 7200295A NL 7200295 A NL7200295 A NL 7200295A
Authority
NL
Netherlands
Application number
NL7200295A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7200295A priority Critical patent/NL7200295A/xx
Priority to DE2262302A priority patent/DE2262302A1/de
Priority to IT71266/72A priority patent/IT976334B/it
Priority to US00319986A priority patent/US3811893A/en
Priority to GB73673A priority patent/GB1370584A/en
Priority to JP6673A priority patent/JPS4875172A/ja
Priority to CA160,685A priority patent/CA980464A/en
Priority to FR7300448A priority patent/FR2167794B1/fr
Publication of NL7200295A publication Critical patent/NL7200295A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1603—Process or apparatus coating on selected surface areas
    • C23C18/1605—Process or apparatus coating on selected surface areas by masking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/15—Lithographic emulsion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Chemically Coating (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • ing And Chemical Polishing (AREA)
NL7200295A 1972-01-08 1972-01-08 NL7200295A (xx)

Priority Applications (8)

Application Number Priority Date Filing Date Title
NL7200295A NL7200295A (xx) 1972-01-08 1972-01-08
DE2262302A DE2262302A1 (de) 1972-01-08 1972-12-20 Photomasken
IT71266/72A IT976334B (it) 1972-01-08 1972-12-29 Fotomaschera e procedimento per ot tenerla
US00319986A US3811893A (en) 1972-01-08 1973-01-02 Photomask
GB73673A GB1370584A (en) 1972-01-08 1973-01-05 Photomasks
JP6673A JPS4875172A (xx) 1972-01-08 1973-01-05
CA160,685A CA980464A (en) 1972-01-08 1973-01-05 Photomasks
FR7300448A FR2167794B1 (xx) 1972-01-08 1973-01-08

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7200295A NL7200295A (xx) 1972-01-08 1972-01-08

Publications (1)

Publication Number Publication Date
NL7200295A true NL7200295A (xx) 1973-07-10

Family

ID=19815115

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7200295A NL7200295A (xx) 1972-01-08 1972-01-08

Country Status (8)

Country Link
US (1) US3811893A (xx)
JP (1) JPS4875172A (xx)
CA (1) CA980464A (xx)
DE (1) DE2262302A1 (xx)
FR (1) FR2167794B1 (xx)
GB (1) GB1370584A (xx)
IT (1) IT976334B (xx)
NL (1) NL7200295A (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
JPS5779848U (xx) * 1980-10-31 1982-05-17
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US4664996A (en) * 1983-06-24 1987-05-12 Rca Corporation Method for etching a flat apertured mask for use in a cathode-ray tube
US4656107A (en) * 1983-06-24 1987-04-07 Rca Corporation Photographic printing plate for use in a vacuum printing frame
US4588676A (en) * 1983-06-24 1986-05-13 Rca Corporation Photoexposing a photoresist-coated sheet in a vacuum printing frame
US4637713A (en) * 1985-09-27 1987-01-20 Scss Instruments, Inc. Pellicle mounting apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3687668A (en) * 1970-10-07 1972-08-29 Eastman Kodak Co Palladium images by hydrogen reduction

Also Published As

Publication number Publication date
CA980464A (en) 1975-12-23
GB1370584A (en) 1974-10-16
FR2167794A1 (xx) 1973-08-24
DE2262302A1 (de) 1973-07-12
JPS4875172A (xx) 1973-10-09
IT976334B (it) 1974-08-20
FR2167794B1 (xx) 1977-04-22
US3811893A (en) 1974-05-21

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