NL7200295A - - Google Patents
Info
- Publication number
- NL7200295A NL7200295A NL7200295A NL7200295A NL7200295A NL 7200295 A NL7200295 A NL 7200295A NL 7200295 A NL7200295 A NL 7200295A NL 7200295 A NL7200295 A NL 7200295A NL 7200295 A NL7200295 A NL 7200295A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1603—Process or apparatus coating on selected surface areas
- C23C18/1605—Process or apparatus coating on selected surface areas by masking
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/15—Lithographic emulsion
Landscapes
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Chemically Coating (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7200295A NL7200295A (US07696358-20100413-C00002.png) | 1972-01-08 | 1972-01-08 | |
| DE2262302A DE2262302A1 (de) | 1972-01-08 | 1972-12-20 | Photomasken |
| IT71266/72A IT976334B (it) | 1972-01-08 | 1972-12-29 | Fotomaschera e procedimento per ot tenerla |
| US00319986A US3811893A (en) | 1972-01-08 | 1973-01-02 | Photomask |
| GB73673A GB1370584A (en) | 1972-01-08 | 1973-01-05 | Photomasks |
| CA160,685A CA980464A (en) | 1972-01-08 | 1973-01-05 | Photomasks |
| JP6673A JPS4875172A (US07696358-20100413-C00002.png) | 1972-01-08 | 1973-01-05 | |
| FR7300448A FR2167794B1 (US07696358-20100413-C00002.png) | 1972-01-08 | 1973-01-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7200295A NL7200295A (US07696358-20100413-C00002.png) | 1972-01-08 | 1972-01-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7200295A true NL7200295A (US07696358-20100413-C00002.png) | 1973-07-10 |
Family
ID=19815115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7200295A NL7200295A (US07696358-20100413-C00002.png) | 1972-01-08 | 1972-01-08 |
Country Status (8)
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4063812A (en) * | 1976-08-12 | 1977-12-20 | International Business Machines Corporation | Projection printing system with an improved mask configuration |
| JPS5779848U (US07696358-20100413-C00002.png) * | 1980-10-31 | 1982-05-17 | ||
| US4537813A (en) * | 1982-09-27 | 1985-08-27 | At&T Technologies, Inc. | Photomask encapsulation |
| US4664996A (en) * | 1983-06-24 | 1987-05-12 | Rca Corporation | Method for etching a flat apertured mask for use in a cathode-ray tube |
| US4656107A (en) * | 1983-06-24 | 1987-04-07 | Rca Corporation | Photographic printing plate for use in a vacuum printing frame |
| US4588676A (en) * | 1983-06-24 | 1986-05-13 | Rca Corporation | Photoexposing a photoresist-coated sheet in a vacuum printing frame |
| US4637713A (en) * | 1985-09-27 | 1987-01-20 | Scss Instruments, Inc. | Pellicle mounting apparatus |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3687668A (en) * | 1970-10-07 | 1972-08-29 | Eastman Kodak Co | Palladium images by hydrogen reduction |
-
1972
- 1972-01-08 NL NL7200295A patent/NL7200295A/xx unknown
- 1972-12-20 DE DE2262302A patent/DE2262302A1/de active Pending
- 1972-12-29 IT IT71266/72A patent/IT976334B/it active
-
1973
- 1973-01-02 US US00319986A patent/US3811893A/en not_active Expired - Lifetime
- 1973-01-05 JP JP6673A patent/JPS4875172A/ja active Pending
- 1973-01-05 GB GB73673A patent/GB1370584A/en not_active Expired
- 1973-01-05 CA CA160,685A patent/CA980464A/en not_active Expired
- 1973-01-08 FR FR7300448A patent/FR2167794B1/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1370584A (en) | 1974-10-16 |
| IT976334B (it) | 1974-08-20 |
| DE2262302A1 (de) | 1973-07-12 |
| FR2167794A1 (US07696358-20100413-C00002.png) | 1973-08-24 |
| CA980464A (en) | 1975-12-23 |
| JPS4875172A (US07696358-20100413-C00002.png) | 1973-10-09 |
| US3811893A (en) | 1974-05-21 |
| FR2167794B1 (US07696358-20100413-C00002.png) | 1977-04-22 |
