NL7017481A - - Google Patents

Info

Publication number
NL7017481A
NL7017481A NL7017481A NL7017481A NL7017481A NL 7017481 A NL7017481 A NL 7017481A NL 7017481 A NL7017481 A NL 7017481A NL 7017481 A NL7017481 A NL 7017481A NL 7017481 A NL7017481 A NL 7017481A
Authority
NL
Netherlands
Application number
NL7017481A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7017481A publication Critical patent/NL7017481A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
NL7017481A 1970-05-05 1970-11-30 NL7017481A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19702022025 DE2022025C3 (de) 1970-05-05 1970-05-05 Vorrichtung zum Herstellen eines Hohlkörpers aus Halbleitermaterial

Publications (1)

Publication Number Publication Date
NL7017481A true NL7017481A (en:Method) 1971-11-09

Family

ID=5770320

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7017481A NL7017481A (en:Method) 1970-05-05 1970-11-30

Country Status (10)

Country Link
JP (1) JPS4918917B1 (en:Method)
AT (1) AT306105B (en:Method)
CH (1) CH561079A5 (en:Method)
CS (1) CS163774B2 (en:Method)
DE (1) DE2022025C3 (en:Method)
FR (1) FR2092930B2 (en:Method)
GB (1) GB1315167A (en:Method)
IT (1) IT951574B (en:Method)
NL (1) NL7017481A (en:Method)
SE (1) SE368912B (en:Method)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE789719A (fr) * 1972-05-16 1973-02-01 Siemens Ag Procede et dispositif de fabrication de corps creux en matiere semi-conductrice, en particulier des tubes en silicium
DE2618273C3 (de) * 1976-04-27 1984-04-19 Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen Verfahren zur Abscheidung von polykristallinem Silicium
JPH0166340U (en:Method) * 1987-10-21 1989-04-27

Also Published As

Publication number Publication date
DE2022025C3 (de) 1980-03-20
CS163774B2 (en:Method) 1975-11-07
IT951574B (it) 1973-07-10
DE2022025B2 (de) 1979-06-28
SE368912B (en:Method) 1974-07-29
CH561079A5 (en:Method) 1975-04-30
JPS4918917B1 (en:Method) 1974-05-14
DE2022025A1 (de) 1971-11-18
FR2092930A2 (en:Method) 1972-01-28
GB1315167A (en) 1973-04-26
AT306105B (de) 1973-03-26
FR2092930B2 (en:Method) 1973-02-02

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