NL6919560A - - Google Patents

Info

Publication number
NL6919560A
NL6919560A NL6919560A NL6919560A NL6919560A NL 6919560 A NL6919560 A NL 6919560A NL 6919560 A NL6919560 A NL 6919560A NL 6919560 A NL6919560 A NL 6919560A NL 6919560 A NL6919560 A NL 6919560A
Authority
NL
Netherlands
Application number
NL6919560A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19691904763 external-priority patent/DE1904763C/de
Application filed filed Critical
Publication of NL6919560A publication Critical patent/NL6919560A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/165Transmutation doping
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S257/00Active solid-state devices, e.g. transistors, solid-state diodes
    • Y10S257/906Dram with capacitor electrodes used for accessing, e.g. bit line is capacitor plate
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/953Making radiation resistant device

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Bipolar Transistors (AREA)
  • Light Receiving Elements (AREA)
  • Formation Of Insulating Films (AREA)
NL6919560A 1969-01-31 1969-12-30 NL6919560A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19691904763 DE1904763C (de) 1969-01-31 Verfahren zum Behandeln von Siliziumtransistoren mit Siliziumoxid-Deckschichten

Publications (1)

Publication Number Publication Date
NL6919560A true NL6919560A (de) 1970-08-04

Family

ID=5723928

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6919560A NL6919560A (de) 1969-01-31 1969-12-30

Country Status (4)

Country Link
US (1) US3691376A (de)
FR (1) FR2029814B1 (de)
GB (1) GB1259923A (de)
NL (1) NL6919560A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5213716B2 (de) * 1971-12-22 1977-04-16
US3852612A (en) * 1972-08-31 1974-12-03 Westinghouse Electric Corp Selective low level irradiation to improve blocking voltage yield of junctioned semiconductors
US3755671A (en) * 1972-09-29 1973-08-28 Rca Corp Method of providing a semiconductor body with piezoelectric properties
US4014772A (en) * 1975-04-24 1977-03-29 Rca Corporation Method of radiation hardening semiconductor devices
US4238694A (en) * 1977-05-23 1980-12-09 Bell Telephone Laboratories, Incorporated Healing radiation defects in semiconductors
DE2755418A1 (de) * 1977-12-13 1979-06-21 Bosch Gmbh Robert Verfahren zur herstellung eines halbleiter-bauelements
US4184896A (en) * 1978-06-06 1980-01-22 The United States Of America As Represented By The Secretary Of The Air Force Surface barrier tailoring of semiconductor devices utilizing scanning electron microscope produced ionizing radiation
US4318750A (en) * 1979-12-28 1982-03-09 Westinghouse Electric Corp. Method for radiation hardening semiconductor devices and integrated circuits to latch-up effects
US4663526A (en) * 1984-12-26 1987-05-05 Emil Kamieniecki Nondestructive readout of a latent electrostatic image formed on an insulating material
US4833324A (en) * 1985-04-03 1989-05-23 Optical Diagnostic Systems, Inc. Nondestructive readout of a latent electrostatic image formed on an insulating material
FR2663160B1 (fr) * 1990-06-12 1997-01-10 Commissariat Energie Atomique Procede pour la prolongation de la duree de fonctionnement d'un circuit a composants mos soumis a un rayonnement "gamma".
US5516731A (en) * 1994-06-02 1996-05-14 Lsi Logic Corporation High-temperature bias anneal of integrated circuits for improved radiation hardness and hot electron resistance
US6958621B2 (en) * 2003-12-02 2005-10-25 International Business Machines Corporation Method and circuit for element wearout recovery
CN103945901A (zh) * 2011-10-14 2014-07-23 住友重机械工业株式会社 带电粒子束照射系统以及带电粒子束照射计划方法

Also Published As

Publication number Publication date
US3691376A (en) 1972-09-12
GB1259923A (en) 1972-01-12
DE1904763A1 (de) 1970-09-24
FR2029814A1 (de) 1970-10-23
FR2029814B1 (de) 1974-10-11
DE1904763B2 (de) 1972-08-17

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