NL6703637A - - Google Patents

Info

Publication number
NL6703637A
NL6703637A NL6703637A NL6703637A NL6703637A NL 6703637 A NL6703637 A NL 6703637A NL 6703637 A NL6703637 A NL 6703637A NL 6703637 A NL6703637 A NL 6703637A NL 6703637 A NL6703637 A NL 6703637A
Authority
NL
Netherlands
Application number
NL6703637A
Other versions
NL149324B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6703637A publication Critical patent/NL6703637A/xx
Publication of NL149324B publication Critical patent/NL149324B/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Particle Accelerators (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
NL676703637A 1966-06-10 1967-03-08 Afbuigsysteem voor de deeltjesbundel in een met een deeltjesbundel werkend toestel. NL149324B (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19661299088 DE1299088C2 (de) 1966-06-10 1966-06-10 Ablenkeinrichtung fuer den korpuskularstrahl in einem korpuskularstrahlgeraet, insbesondere elektronenmikroskop
DES0104241 1966-06-10

Publications (2)

Publication Number Publication Date
NL6703637A true NL6703637A (enExample) 1967-12-11
NL149324B NL149324B (nl) 1976-04-15

Family

ID=25751670

Family Applications (1)

Application Number Title Priority Date Filing Date
NL676703637A NL149324B (nl) 1966-06-10 1967-03-08 Afbuigsysteem voor de deeltjesbundel in een met een deeltjesbundel werkend toestel.

Country Status (4)

Country Link
US (1) US3644733A (enExample)
DE (1) DE1299088C2 (enExample)
GB (1) GB1171007A (enExample)
NL (1) NL149324B (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4090077A (en) * 1969-03-05 1978-05-16 Siemens Aktiengesellschaft Particle beam device with a deflection system and a stigmator
JPS4922351B1 (enExample) * 1969-12-25 1974-06-07
NL7012671A (enExample) * 1970-08-27 1972-02-29
USRE29500E (en) * 1970-08-31 1977-12-20 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Scanning charged beam particle beam microscope
US3857034A (en) * 1970-08-31 1974-12-24 Max Planck Gesellschaft Scanning charged beam particle beam microscope
US3801784A (en) * 1972-04-14 1974-04-02 Research Corp Scanning electron microscope operating in area scan and angle scan modes
US3932749A (en) * 1974-03-22 1976-01-13 Varian Associates Electron gun
US4095104A (en) * 1975-09-01 1978-06-13 U.S. Philips Corporation Electron microscope
US4795912A (en) * 1987-02-17 1989-01-03 Trw Inc. Method and apparatus for correcting chromatic aberration in charged particle beams

Also Published As

Publication number Publication date
DE1299088B (enExample) 1974-10-17
GB1171007A (en) 1969-11-19
NL149324B (nl) 1976-04-15
US3644733A (en) 1972-02-22
DE1299088C2 (de) 1974-10-17

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Legal Events

Date Code Title Description
VJC Lapsed due to non-payment of the due maintenance fee for the patent or patent application