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Publication of NL6617150ApublicationCriticalpatent/NL6617150A/xx
Publication of NL156968BpublicationCriticalpatent/NL156968B/xx
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/04—Chromates
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Printing Plates And Materials Therefor
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)
Manufacture Or Reproduction Of Printing Formes
(AREA)
NL6617150A1965-12-091966-12-06Werkwijze voor het vervaardigen van een lithografische drukplaat.
NL156968B
(nl)
