NL6603190A - - Google Patents

Info

Publication number
NL6603190A
NL6603190A NL6603190A NL6603190A NL6603190A NL 6603190 A NL6603190 A NL 6603190A NL 6603190 A NL6603190 A NL 6603190A NL 6603190 A NL6603190 A NL 6603190A NL 6603190 A NL6603190 A NL 6603190A
Authority
NL
Netherlands
Application number
NL6603190A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6603190A publication Critical patent/NL6603190A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/66—Polyesters containing oxygen in the form of ether groups
    • C08G63/668—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/676—Polyesters containing oxygen in the form of ether groups derived from polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/04—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyesters
    • C08F299/0478—Copolymers from unsaturated polyesters and low molecular monomers characterised by the monomers used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/682—Polyesters containing atoms other than carbon, hydrogen and oxygen containing halogens
    • C08G63/6824—Polyesters containing atoms other than carbon, hydrogen and oxygen containing halogens derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/6828—Polycarboxylic acids and polyhydroxy compounds in which at least one of the two components contains aliphatic unsaturation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL6603190A 1965-03-11 1966-03-11 NL6603190A (tr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1377365 1965-03-11

Publications (1)

Publication Number Publication Date
NL6603190A true NL6603190A (tr) 1966-09-12

Family

ID=11842552

Family Applications (2)

Application Number Title Priority Date Filing Date
NL129237D NL129237C (tr) 1965-03-11
NL6603190A NL6603190A (tr) 1965-03-11 1966-03-11

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL129237D NL129237C (tr) 1965-03-11

Country Status (4)

Country Link
US (1) US3556791A (tr)
DE (1) DE1522362C2 (tr)
GB (1) GB1131617A (tr)
NL (2) NL6603190A (tr)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2041411A5 (tr) * 1969-04-23 1971-01-29 Eastman Kodak Co
US3858510A (en) * 1971-03-11 1975-01-07 Asahi Chemical Ind Relief structures prepared from photosensitive compositions
US3856744A (en) * 1972-04-10 1974-12-24 Continental Can Co Ultraviolet polymerizable printing ink comprising vehicle prepared from beta-hydroxy esters and polyitaconates
DE2364183A1 (de) * 1972-12-28 1974-07-25 Sumitomo Chemical Co Originalplatte zur uebertragung eines erhabenen musters und verfahren zum uebertragen eines erhabenen musters von einer originalplatte auf ein thermoplastisches harzmaterial
DE2444118C2 (de) * 1974-09-14 1987-02-12 Basf Ag, 6700 Ludwigshafen Mehrschichtige Druckplatte sowie mehrschichtige Reliefdruckform für den Flexodruck
US4048035A (en) * 1975-12-17 1977-09-13 Mitsubishi Rayon Co., Ltd. Photopolymerizable composition
US4168173A (en) * 1977-05-27 1979-09-18 Hercules Incorporated Polymers for increasing the viscosity of photosensitive resins
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
US4308119A (en) * 1979-02-21 1981-12-29 Panelgraphic Corporation Abrasion-resistant optical coating composition containing pentaerythritol based polyacrylates and cellulose esters
US4332873A (en) * 1979-08-22 1982-06-01 Hercules Incorporated Multilayer printing plates and process for making same
US4407855A (en) * 1980-01-07 1983-10-04 Panelographic Corporation Method for forming an abrasion resistant coating from cellulose ester and pentaerythritol acrylates
US4399192A (en) * 1980-01-07 1983-08-16 Panelographic Corporation Radiation cured abrasion resistant coatings of pentaerythritol acrylates and cellulose esters on polymeric substrates
DE3010428A1 (de) * 1980-03-19 1981-09-24 Bayer Ag, 5090 Leverkusen Photopolymerisierbare polyesterharze, verfahren zu ihrer herstellung und ihre verwendung als lackbindemittel
US4403566A (en) * 1980-06-23 1983-09-13 Hercules Incorporated Apparatus for producing a printing plate
US4475810A (en) * 1980-10-06 1984-10-09 Hercules Incorporated Docking sensor system
US4373007A (en) * 1980-11-03 1983-02-08 Panelgraphic Corporation [Non-photoinitialio] non-photocatalyzed dipentaerythritol polyacrylate based coating compositions exhibiting high abrasion resistance
US4450226A (en) * 1981-10-26 1984-05-22 Hercules Incorporated Method and apparatus for producing a printing plate
US4615968A (en) * 1982-11-04 1986-10-07 Ciba-Geigy Corporation Compositions of matter which crosslink under the action of light in the presence of sensitizers
US4604342A (en) * 1984-03-17 1986-08-05 E. I. Du Pont De Nemours And Company Photopolymerizable mixture and recording material produced from it
EP0177302A3 (en) * 1984-09-28 1986-09-17 Hercules Incorporated Compressable printing plate
US5238772A (en) * 1989-06-21 1993-08-24 Hoechst Aktiengesellschaft Photopolymerizable mixture and recording material containing free-radically polymerizable compound, photosensitive polymerization initiator and polyurethane binder grafted with vinyl alcohol and vinyl acetal units
JP2944164B2 (ja) * 1990-08-08 1999-08-30 旭化成工業株式会社 フレキソ印刷版用液状感光性樹脂組成物
US5348605A (en) * 1993-09-15 1994-09-20 Hercules Incorporated Tilting bucket assembly for photopolymer platemaking
US5753414A (en) * 1995-10-02 1998-05-19 Macdermid Imaging Technology, Inc. Photopolymer plate having a peelable substrate
US6010598A (en) * 1997-05-08 2000-01-04 The Procter & Gamble Company Papermaking belt with improved life
JP2000314961A (ja) * 1999-04-28 2000-11-14 Fuji Photo Film Co Ltd ネガ型画像記録材料
KR20120080385A (ko) * 2011-01-07 2012-07-17 삼성전자주식회사 패턴 형성용 접착 필름 조성물, 이를 포함하는 접착 필름 및 이를 이용한 반도체 패키징 방법
JP5466689B2 (ja) * 2011-11-30 2014-04-09 富士フイルム株式会社 フレキソ印刷版用樹脂組成物、フレキソ印刷版原版及びその製造方法、並びに、フレキソ印刷版及びその製版方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE623613A (tr) * 1961-10-16

Also Published As

Publication number Publication date
NL129237C (tr)
DE1522362C2 (de) 1973-01-04
US3556791A (en) 1971-01-19
GB1131617A (en) 1968-10-23
DE1522362B1 (de) 1970-04-30

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