NL48516C - - Google Patents
Info
- Publication number
- NL48516C NL48516C NL48516DA NL48516C NL 48516 C NL48516 C NL 48516C NL 48516D A NL48516D A NL 48516DA NL 48516 C NL48516 C NL 48516C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE451009X | 1934-09-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL48516C true NL48516C (ko) |
Family
ID=6538465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL48516D NL48516C (ko) | 1934-09-15 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US2174629A (ko) |
| BE (1) | BE411277A (ko) |
| GB (1) | GB451009A (ko) |
| NL (1) | NL48516C (ko) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2522771A (en) * | 1944-11-03 | 1950-09-19 | Gen Aniline & Film Corp | Photographic silver halide emulsions |
| US2423549A (en) * | 1945-01-10 | 1947-07-08 | Du Pont | Silver halide photographic emulsions sensitized by polyalkylene glycols |
| US2651583A (en) * | 1951-09-19 | 1953-09-08 | Sun Chemical Corp | Nonglare coating composition |
| GB738958A (en) * | 1953-08-03 | 1955-10-19 | William Warren Triggs | Improved method for photographically or photochemically producing a printing plate |
| US2742358A (en) * | 1953-08-03 | 1956-04-17 | Jones Graphic Products Company | Stabilized dichromated polyvinyl alcohol coating material |
| US2902390A (en) * | 1955-07-01 | 1959-09-01 | Parker Rust Proof Co | Method of coating metal surface with hexavalent chromium compound and polyacrylic acid |
| US3100150A (en) * | 1960-11-02 | 1963-08-06 | Owens Illinois Glass Co | Stencil screen coating comprising polyvinyl alcohol, polyvinyl acetate, and a light sensitizing agent |
| US3765894A (en) * | 1967-04-03 | 1973-10-16 | Polychrome Corp | Elevated image printing plate |
| US5024918A (en) * | 1976-12-23 | 1991-06-18 | Texas Instruments Incorporated | Heat activated dry development of photoresist by means of active oxygen atmosphere |
-
0
- BE BE411277D patent/BE411277A/xx unknown
- NL NL48516D patent/NL48516C/xx active
-
1935
- 1935-09-09 US US39824A patent/US2174629A/en not_active Expired - Lifetime
- 1935-09-16 GB GB25667/35A patent/GB451009A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US2174629A (en) | 1939-10-03 |
| GB451009A (en) | 1936-07-28 |
| BE411277A (ko) |