NL294779A - - Google Patents
Info
- Publication number
- NL294779A NL294779A NL294779DA NL294779A NL 294779 A NL294779 A NL 294779A NL 294779D A NL294779D A NL 294779DA NL 294779 A NL294779 A NL 294779A
- Authority
- NL
- Netherlands
Links
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/14—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using spraying techniques to apply the conductive material, e.g. vapour evaporation
- H05K3/143—Masks therefor
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
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- H10P95/00—
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- H10W20/40—
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE1962S0080503 DE1165700C2 (de) | 1962-07-20 | 1962-07-20 | Verfahren zum Herstellen von Bauelementen oder Baugruppen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL294779A true NL294779A (OSRAM) |
Family
ID=7508916
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL294779D NL294779A (OSRAM) | 1962-07-20 |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH443427A (OSRAM) |
| DE (1) | DE1165700C2 (OSRAM) |
| FR (1) | FR1378052A (OSRAM) |
| GB (1) | GB978984A (OSRAM) |
| NL (1) | NL294779A (OSRAM) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7413977A (nl) * | 1974-10-25 | 1976-04-27 | Philips Nv | Aanbrengen van een geleiderlaagpatroon met op een geringe onderlinge afstand gelegen delen, in het bijzonder bij de vervaardiging van half- geleiderinrichtingen. |
| US4100313A (en) * | 1975-10-28 | 1978-07-11 | Rca Corporation | Process for forming an optical waveguide |
| JPS54103552A (en) * | 1978-02-01 | 1979-08-15 | Hitachi Electronics | Pattern formation method |
| US4469719A (en) * | 1981-12-21 | 1984-09-04 | Applied Magnetics-Magnetic Head Divison Corporation | Method for controlling the edge gradient of a layer of deposition material |
| US4536419A (en) * | 1983-03-10 | 1985-08-20 | Hitachi, Ltd. | Method for forming tapered films |
| DE3374790D1 (en) * | 1983-03-11 | 1988-01-14 | Hitachi Ltd | Method for forming thin films |
| DE102017105379A1 (de) | 2017-03-14 | 2018-09-20 | Aixtron Se | Substrathalteranordnung mit Maskenträger |
| DE102017105374A1 (de) * | 2017-03-14 | 2018-09-20 | Aixtron Se | Vorrichtung zum Abscheiden einer strukturierten Schicht auf einem Substrat sowie Verfahren zum Einrichten der Vorrichtung |
| CN111479947A (zh) * | 2017-12-29 | 2020-07-31 | 微软技术许可有限责任公司 | 使用通过被定位的阴影掩模进行气相沉积的制造工艺 |
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0
- NL NL294779D patent/NL294779A/xx unknown
-
1962
- 1962-07-20 DE DE1962S0080503 patent/DE1165700C2/de not_active Expired
-
1963
- 1963-06-17 CH CH749663A patent/CH443427A/de unknown
- 1963-07-03 FR FR940261A patent/FR1378052A/fr not_active Expired
- 1963-07-19 GB GB28679/63A patent/GB978984A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB978984A (en) | 1965-01-01 |
| DE1165700B (de) | 1964-03-19 |
| DE1165700C2 (de) | 1964-09-24 |
| CH443427A (de) | 1967-09-15 |
| FR1378052A (fr) | 1964-11-13 |