NL272474A - - Google Patents
Info
- Publication number
- NL272474A NL272474A NL272474DA NL272474A NL 272474 A NL272474 A NL 272474A NL 272474D A NL272474D A NL 272474DA NL 272474 A NL272474 A NL 272474A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/56—Organic absorbers, e.g. of photo-resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US75566A US3228768A (en) | 1960-12-13 | 1960-12-13 | Process of diffusion printing and a structure for use therein |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL272474A true NL272474A (US07122603-20061017-C00045.png) | 1900-01-01 |
Family
ID=22126593
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL272474D NL272474A (US07122603-20061017-C00045.png) | 1960-12-13 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3228768A (US07122603-20061017-C00045.png) |
| CH (1) | CH426490A (US07122603-20061017-C00045.png) |
| GB (1) | GB932026A (US07122603-20061017-C00045.png) |
| NL (1) | NL272474A (US07122603-20061017-C00045.png) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3323917A (en) * | 1963-03-07 | 1967-06-06 | Gen Aniline & Film Corp | Photomechanical bleachout color process |
| DE1472771A1 (de) * | 1965-07-30 | 1969-01-02 | Adox Du Pont Fotowerke | Verfahren zur Herstellung von masshaltigen photographischen Filmen |
| US4550069A (en) * | 1984-06-11 | 1985-10-29 | American Hoechst Corporation | Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate |
| US5143814A (en) * | 1984-06-11 | 1992-09-01 | Hoechst Celanese Corporation | Positive photoresist compositions with o-quinone diazide, novolak and propylene glycol alkyl ether acetate |
| US4983490A (en) * | 1985-10-28 | 1991-01-08 | Hoechst Celanese Corporation | Photoresist treating composition consisting of a mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate |
| US4948697A (en) * | 1985-10-28 | 1990-08-14 | Hoechst Celanese Corporation | Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate |
| US4692398A (en) * | 1985-10-28 | 1987-09-08 | American Hoechst Corporation | Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate |
| US5039594A (en) * | 1985-10-28 | 1991-08-13 | Hoechst Celanese Corporation | Positive photoresist containing a mixture of propylene glycol alkyl ethers and propylene glycol alkyl ether acetate |
| US4806458A (en) * | 1985-10-28 | 1989-02-21 | Hoechst Celanese Corporation | Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate |
| NL1004757C2 (nl) * | 1996-12-12 | 1998-06-15 | Av Flexologic Bv | Systeem en werkwijze voor het verschaffen van fotodrukplaten en dergelijke. |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US428472A (en) * | 1890-05-20 | Photo-mechanical printing-plate | ||
| US2702243A (en) * | 1950-06-17 | 1955-02-15 | Azoplate Corp | Light-sensitive photographic element and process of producing printing plates |
| US2772971A (en) * | 1951-01-19 | 1956-12-04 | Gen Aniline & Film Corp | Production of subtractively colored photographic material |
| BE513965A (US07122603-20061017-C00045.png) * | 1951-09-19 | |||
| NL242367A (US07122603-20061017-C00045.png) * | 1953-02-18 | |||
| NL94867C (US07122603-20061017-C00045.png) * | 1955-02-25 | |||
| US2996381A (en) * | 1957-07-02 | 1961-08-15 | Kalvar Corp | Photographic materials and procedures for using same |
-
0
- NL NL272474D patent/NL272474A/xx unknown
-
1960
- 1960-12-13 US US75566A patent/US3228768A/en not_active Expired - Lifetime
-
1961
- 1961-12-11 GB GB44311/61A patent/GB932026A/en not_active Expired
- 1961-12-13 CH CH1441661A patent/CH426490A/de unknown
Also Published As
| Publication number | Publication date |
|---|---|
| CH426490A (de) | 1966-12-15 |
| US3228768A (en) | 1966-01-11 |
| GB932026A (en) | 1963-07-24 |
